Patents by Inventor Jeffery L. Vincent

Jeffery L. Vincent has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Positive acting bilayer photoresist development
    Patent number: 4806453
    Abstract: The invention is for a developer for a bilayer photoresist film comprising a first relatively thick layer of a polyglutarimide and a second relatively thin layer of a diazo sensitized novolak resin. The developer is an aqueous solution of a tetra alkyl ammonium hydroxide where at least two of the alkyl groups have two or more carbon atoms. The developer of the invention permits development of the bottom resist layer without erosion of the top resist layer.
    Type: Grant
    Filed: May 7, 1986
    Date of Patent: February 21, 1989
    Assignee: Shipley Company Inc.
    Inventors: David A. Vidusek, Michael Legenza, Jeffery L. Vincent