Patents by Inventor Jeffery Ramer

Jeffery Ramer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Cross flow CVD reactor
    Patent number: 8506754
    Abstract: A cross flow chemical vapor deposition chamber can comprise an inlet duct having a generally rectangular cross-section and an outlet duct having a generally rectangular cross-section. The rectangular inlet duct and the rectangular outlet duct can facilitate laminar flow of reactant gases over a susceptor. Movable partitions can be configured to define a plurality of zones within the chamber. Each zone can contain a different reactant gas, concentration of reactant gas, and/or flow rate of reactant gas. Enhanced laminar flow can be provided, undesirable depletion of reactant gas can be mitigated, and enhanced control of reactant gases can be facilitated.
    Type: Grant
    Filed: December 27, 2010
    Date of Patent: August 13, 2013
    Assignee: Toshiba Techno Center Inc.
    Inventors: Vahid S. Moshtagh, Heng Liu, Jeffery Ramer, Michael Solomensky
  • CROSS FLOW CVD REACTOR
    Publication number: 20110089437
    Abstract: A cross flow chemical vapor deposition chamber can comprise an inlet duct having a generally rectangular cross-section and an outlet duct having a generally rectangular cross-section. The rectangular inlet duct and the rectangular outlet duct can facilitate laminar flow of reactant gases over a susceptor. Movable partitions can be configured to define a plurality of zones within the chamber. Each zone can contain a different reactant gas, concentration of reactant gas, and/or flow rate of reactant gas. Enhanced laminar flow can be provided, undesirable depletion of reactant gas can be mitigated, and enhanced control of reactant gases can be facilitated.
    Type: Application
    Filed: December 27, 2010
    Publication date: April 21, 2011
    Applicant: Bridgelux, Inc.
    Inventors: Vahid S. Moshtagh, Heng Liu, Jeffery Ramer, Michael Solomensky
  • CROSS FLOW CVD REACTOR
    Publication number: 20090096349
    Abstract: A cross flow chemical vapor deposition chamber can comprise an inlet duct having a generally rectangular cross-section and an outlet duct having a generally rectangular cross-section. The rectangular inlet duct and the rectangular outlet duct can facilitate laminar flow of reactant gases over a susceptor. Movable partitions can be configured to define a plurality of zones within the chamber. Each zone can contain a different reactant gas, concentration of reactant gas, and/or flow rate of reactant gas. Enhanced laminar flow can be provided, undesirable depletion of reactant gas can be mitigated, and enhanced control of reactant gases can be facilitated.
    Type: Application
    Filed: October 28, 2008
    Publication date: April 16, 2009
    Inventors: Vahid S. Moshtagh, Heng Liu, Jeffery Ramer, Michael Solomensky