Abstract: A system and method for integrating a wireless charging device with a display is provided herein. The system includes an information receiver to receive information from the wireless charging device; an information processor to process the information, and the processed information being about a wireless charging device or an electronic device on the wireless charging device; and an information communicator to communicate the processed information to a display coupled to the system.

Abstract: A system is described for presenting information relating to lifting and moving a load object with a vehicle. Upon the lifting, a dimensioner determines a size and a shape of the load object, computes a corresponding spatial representation, and generates a corresponding video signal. During the moving, an imager observes a scene in front of the vehicle, relative to its forward motion direction, and generates a video signal corresponding to the observed scene. The imager has at least one element moveable vertically, relative to the lifting. A display renders a real time visual representation of the scene observed in front of the vehicle based on the corresponding video signal and superimposes a representation of the computed spatial representation of the load object.

Abstract: The disclosure concerns a camera mouth mount including a mouth piece coupled to a camera mount and configured for holding the camera mount with the mouth of a user. The mouth piece includes a pair of opposing bite supports extending from a proximal end to a distal end, the bite supports being connected at a junction disposed at the distal end. The camera mount is coupled to the junction of the bite supports. Various embodiments are described wherein a mouth piece is coupled to a camera mount. The camera mouth piece is used to hold a camera in ones mouth for the purpose of obtaining media while performing an activity such as surfing or another action sport.

Abstract: Provided herein are methods and related apparatus that facilitate patterning by performing highly non-conformal (directional) deposition on patterned structures. The methods involve depositing films on a patterned structure, such as a hard mask. The deposition may be both substrate-selective such that the films have high etch selectivity with respect to an underlying material to be etched and pattern-selective such that the films are directionally deposited to replicate the pattern of the patterned structure. In some embodiments, the deposition is performed in the same chamber as a subsequent etch is performed. In some embodiments, the deposition may be performed in a separate chamber (e.g., a PECVD deposition chamber) that is connected to the etch chamber by a vacuum transfer chamber. The deposition may be performed prior to or at selected intermittences during at etch process. In some embodiments, the deposition involves multiple cycles of a deposition and treatment process.

Abstract: A method for calibrating a biological instrument is provided. The method comprises the steps of acquiring an image of at least one biological sample array, determining a first region of interest within the image, wherein the first region of interest comprises a first plurality of locations on the at least one biological array; and identifying within the first region of interest, a plurality of image elements associated with each of the first plurality of locations on the at least one biological array.

Abstract: A method for determining a dip of a geological structure in a subterranean formation, involves generating, using a 3D resistivity analyzer, a first intermediate result describing the dip of the geological structure based on 3D resistivity data collected from a borehole penetrating the subterranean formation. The method further involves generating, using a borehole image analyzer, a second intermediate result describing the dip of the geological structure based on a borehole image collected from the borehole. The method further involves generating, by a computer processor combining the first intermediate result and the second intermediate result based on a pre-determined criterion, an integrated result describing the dip of the geological structure.

Abstract: Methods are provided for integrating atomic layer etch and atomic layer deposition by performing both processes in the same chamber or reactor. Methods involve sequentially alternating between atomic layer etch and atomic layer deposition processes to prevent feature degradation during etch, improve selectivity, and encapsulate sensitive layers of a semiconductor substrate.

Abstract: An air system (50) for an agricultural harvester (10) includes an air flow splitter component (52) configured to be coupled to the agricultural harvester (10). The air flow splitter component (52) has an inlet (56) configured to receive air and a plurality of air outlets (58) configured to distribute the air. The air system also includes a plurality of air flow paths (60). Each air flow path of the plurality of air flow paths extends from a respective one of the plurality of air outlets and is configured to extend to a corresponding drum (12) of the agricultural harvester. Additionally, each air flow path includes a discharge outlet (80) that is configured to be disposed between a bottom surface (81) of the corresponding drum (12) and a bottom disc (85) of a doffer (42) of the corresponding drum (12) while the air system (50) is coupled to the agricultural harvester.

Abstract: Methods of etching and smoothening films by exposing to a halogen-containing plasma and an inert plasma within a bias window in cycles are provided. Methods are suitable for etching and smoothening films of various materials in the semiconductor industry and are also applicable to applications in optics and other industries.

Abstract: Provided herein are methods of atomic layer etching (ALE) of metals including tungsten (W) and cobalt (Co). The methods disclosed herein provide precise etch control down to the atomic level, with etching a low as 1 ? to 10 ? per cycle in some embodiments. In some embodiments, directional control is provided without damage to the surface of interest. The methods may include cycles of a modification operation to form a reactive layer, followed by a removal operation to etch only this modified layer. The modification is performed without spontaneously etching the surface of the metal.

Abstract: Methods are provided for integrating atomic layer etch and atomic layer deposition by performing both processes in the same chamber or reactor. Methods involve sequentially alternating between atomic layer etch and atomic layer deposition processes to prevent feature degradation during etch, improve selectivity, and encapsulate sensitive layers of a semiconductor substrate.

Abstract: An improved hand tool includes an improved handle apparatus. The handle apparatus includes an elongated handle having a non-circular external cross-section and further includes an elongated support that comprises an elongated end extending from the handle and having a substantially circular cross-sectional shape. A tool apparatus includes a tool and a socket, with the socket having an opening formed therein. The end of the handle apparatus is received with an interference fit in the opening formed in the socket to retain the handle apparatus and the tool apparatus together. A collar can additionally be provided about the socket to improve the aesthetic properties of the connection between the socket and handle and to increase the toughness of the connection therebetween.

Abstract: A system and method for using an augmented reality interface to adjust the results from a dimensioning system are disclosed. The augmented reality interface allows users to easily correct dimensioning errors, improve dimensioning results, and guide dimensioning analysis. In one embodiment, the user may adjust/select the results via hand gesturing/positioning within the system's field of view. In another embodiment, the user may use virtual tools, enabled by hand gesturing/positioning, to adjust the results. In still another embodiment, the user may shine a light into the system's field of view to adjust the results. The augmented reality interface embraced by the present invention provides the user with an easier, more-intuitive means for interacting with dimensioning system results.

Abstract: Provided herein are ALE methods of removing III-V materials such as gallium nitride (GaN) and related apparatus. In some embodiments, the methods involve exposing the III-V material to a chlorine-containing plasma without biasing the substrate to form a modified III-V surface layer; and applying a bias voltage to the substrate while exposing the modified III-V surface layer to a plasma to thereby remove the modified III-V surface layer. The disclosed methods are suitable for a wide range of applications, including etching processes for trenches and holes, fabrication of HEMTs, fabrication of LEDs, and improved selectivity in etching processes.

Abstract: A method and apparatus for supporting a portable computer appliance. The invention may comprise rotating a computer appliance to convert between mouse-based use and a touch-based use, or other orientations and applications. The apparatus may be attached to a microphone stand or similar mechanism to aid viewing the computer appliance. To assist coordination with public performances, the apparatus may hold and support a computer appliance to display notes, music, video, or other expressions for assisting a performer, such as for public speeches, concerts, plays, stand-up comedy, and the like.

Abstract: Certain aspects of the present disclosure provide methods and apparatus for implementing a fully differential charge pump circuit that eliminates a source of noise and power consumption by using a low-noise switched-capacitor common-mode feedback (CMFB) circuit, rather than a continuous-time amplifier-based CMFB circuit. The fully differential charge pump circuit presented in this disclosure includes the switched-capacitor CMFB (SC-CMFB) unit connected to differential output nodes of the charge pump and provides a feedback signal to the charge pump to control a common-mode voltage of the differential signals based on a reference common-mode voltage. In certain aspects, a replica phase-frequency detector (PFD), a frequency divider, and a non-overlapping clock generator provides control signals for the SC-CMFB circuit.

Abstract: A method for calibrating a biological instrument is provided. The method comprises the steps of acquiring an image of at least one biological sample array, determining a first region of interest within the image, wherein the first region of interest comprises a first plurality of locations on the at least one biological array; and identifying within the first region of interest, a plurality of image elements associated with each of the first plurality of locations on the at least one biological array.

Abstract: Methods of etching metal by depositing a material reactive with a metal to be etched and a halogen to form a volatile species and exposing the substrate to a halogen-containing gas and activation gas to etch the substrate are provided. Deposited materials may include silicon, germanium, titanium, carbon, tin, and combinations thereof. Methods are suitable for fabricating MRAM structures and may involve integrating ALD and ALE processes without breaking vacuum.

Abstract: An apparatus, system, and method are disclosed for context-sensitive password generation. The inspection module may accept entry of at least a new portion of a password by a user into a security mechanism and determine a dynamic parameter candidate within the password. The analysis module may recommend to the user a context-sensitive interpretation of the dynamic parameter candidate. The confirmation module may receive a selection by the user of the context-sensitive interpretation.

Abstract: Certain aspects of the present disclosure provide a high-speed AC-coupled inverter-based buffer, which may be used as a buffer for a voltage-controlled oscillator (VCO), for example. One example buffer for a VCO generally includes a first inverter stage having an input node configured to receive a first complementary signal of a differential pair, a second inverter stage having an input node configured to receive a second complementary signal of the differential pair, a biasing stage replicating the first inverter stage or the second inverter stage, wherein an output node of the biasing stage is connected with an input node of the biasing stage, a first impedance coupled between the input node of the first inverter stage and the input node of the biasing stage, and a second impedance coupled between the input node of the second inverter stage and the input node of the biasing stage.