Patents by Inventor Jeffrey C. Carapella

Jeffrey C. Carapella has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Deposition of device quality low H content, amorphous silicon films
    Patent number: 5397737
    Abstract: A high quality, low hydrogen content, hydrogenated amorphous silicon (a-Si:H) film is deposited by passing a stream of silane gas (SiH.sub.4) over a high temperature, 2000.degree. C., tungsten (W) filament in the proximity of a high temperature, 400.degree. C., substrate within a low pressure, 8 mTorr, deposition chamber. The silane gas is decomposed into atomic hydrogen and silicon, which in turn collides preferably not more than 20-30 times before being deposited on the hot substrate. The hydrogenated amorphous silicon films thus produced have only about one atomic percent hydrogen, yet have device quality electrical, chemical, and structural properties, despite this lowered hydrogen content.
    Type: Grant
    Filed: June 3, 1994
    Date of Patent: March 14, 1995
    Assignee: The United States of America as represented by the United States Department of Energy
    Inventors: Archie H. Mahan, Jeffrey C. Carapella, Alan C. Gallagher