Abstract: A data analytics system is disclosed that can include a data repository configured to store data for multiple clients, a metadata repository separate from the data store, an access control system, and a policy store. The data analytics system can automatically generate metadata for data in the data repository using a metadata engine, the metadata including technical metadata and usage metadata, and store the metadata in the metadata repository. The data analytics system can obtain a client policy governing access to the data. The data analytics system can receive a request to provide the data, the request including instructions to create a pipeline to provide the data. The data analytics system can authorize, by the access control system, the request using the policy and usage metadata; create the pipeline using the technical metadata; and provide the data using the pipeline.

Abstract: A data analytics system is disclosed that can include a data repository configured to store data for multiple clients, a metadata repository separate from the data store, an access control system, and a policy store. The data analytics system can automatically generate metadata for data in the data repository using a metadata engine, the metadata including technical metadata and usage metadata, and store the metadata in the metadata repository. The data analytics system can obtain a client policy governing access to the data. The data analytics system can receive a request to provide the data, the request including instructions to create a pipeline to provide the data. The data analytics system can authorize, by the access control system, the request using the policy and usage metadata; create the pipeline using the technical metadata; and provide the data using the pipeline.

Abstract: A data analytics system configured to perform operations is disclosed. The operations can include creating, in response to instructions received from a user, a first pipeline. This pipeline can be configured to extract data from an append-only first data store, extract identifying characteristics from the extracted data, provide the identifying characteristics to an identity service, and receive a tenancy identifier from the identity service. The pipeline can further be configured to create a data object in a second data store using the extracted data; create a tenancy object in a metadata store, the tenancy object associated with the data object, the metadata store implementing a hierarchical data object ownership graph; and associate the tenancy object with a parent object in the hierarchical data object ownership graph. The data analytics system can then tear down the first pipeline.

Abstract: A data analytics system configured to perform operations is disclosed. The operations can include creating, in response to instructions received from a user, a first pipeline. This pipeline can be configured to extract data from an append-only first data store, extract identifying characteristics from the extracted data, provide the identifying characteristics to an identity service, and receive a tenancy identifier from the identity service. The pipeline can further be configured to create a data object in a second data store using the extracted data; create a tenancy object in a metadata store, the tenancy object associated with the data object, the metadata store implementing a hierarchical data object ownership graph; and associate the tenancy object with a parent object in the hierarchical data object ownership graph. The data analytics system can then tear down the first pipeline.

Abstract: A data analytics system is disclosed that is configured to perform operations comprising creating at least one data storage, creating a metadata store separate from the at least one data storage, creating a flow storage, and configuring a flow service using first received instructions. The flow service is configured to obtain a first flow from the flow storage, obtain metadata from the metadata storage, and execute the flow. The flow execution can include obtaining input data from the at least one data storage, generating output data at least in part by validating, transforming, and serializing the input data using the metadata, and generating additional metadata describing the output data. The flow execution can further include providing the output data for storage in the at least one data storage and providing the additional metadata for storage in the metadata storage.

Abstract: A data analytics system including an append-only first data store accessible to multiple clients and a second data store is disclosed. The data analytics system can be configurable to, in response to receiving first instructions from a first target system of a first client, the first target system separate from the data analytics system, create a first pipeline between the append-only first data store and the second data store. The first pipeline can be configured according to the first instructions to generate a client-specific data object and store the client-specific data object in the second data store. The data analytics system can be configurable to tear down the first pipeline upon completion of storing the client-specific data object in the second data store.

Abstract: A data analytics system configured to perform operations is disclosed. The operations can include creating, in response to instructions received from a user, a first pipeline. This pipeline can be configured to extract data from an append-only first data store, extract identifying characteristics from the extracted data, provide the identifying characteristics to an identity service, and receive a tenancy identifier from the identity service. The pipeline can further be configured to create a data object in a second data store using the extracted data; create a tenancy object in a metadata store, the tenancy object associated with the data object, the metadata store implementing a hierarchical data object ownership graph; and associate the tenancy object with a parent object in the hierarchical data object ownership graph. The data analytics system can then tear down the first pipeline.

Abstract: A data analytics system is disclosed that is configured to perform operations including receiving input data at a first storage location and configuring a flow service to execute a flow. The flow execution can include creating a pipeline using the flow and metadata associated with the flow, the pipeline configured to perform a data transformation specified in the flow. The flow execution can further include determining a tenancy associated with the input data using the flow. The flow execution can also include generating, using the pipeline, output data from the input data and storing, using the pipeline, the output data in a second storage location associated with the tenancy.

Abstract: A data analytics system is disclosed that can include a data repository configured to store data for multiple clients, a metadata repository separate from the data store, an access control system, and a policy store. The data analytics system can automatically generate metadata for data in the data repository using a metadata engine, the metadata including technical metadata and usage metadata, and store the metadata in the metadata repository. The data analytics system can obtain a client policy governing access to the data. The data analytics system can receive a request to provide the data, the request including instructions to create a pipeline to provide the data. The data analytics system can authorize, by the access control system, the request using the policy and usage metadata; create the pipeline using the technical metadata; and provide the data using the pipeline.

Abstract: Methods of forming interconnects and structures for interconnects. A hardmask layer is patterned to form a plurality of first trenches arranged with a first pattern, and sidewall spacers are formed inside the first trenches on respective sidewalls of the hardmask layer bordering the first trenches. An etch mask is formed over the hardmask layer. The etch mask includes an opening exposing a portion of the hardmask layer between a pair of the sidewall spacers. The portion of the hardmask layer exposed by the opening in the etch mask is removed to define a second trench in the hardmask layer.

Abstract: Methods of forming interconnects and structures for interconnects. A hardmask layer is patterned to form a plurality of first trenches arranged with a first pattern, and sidewall spacers are formed inside the first trenches on respective sidewalls of the hardmask layer bordering the first trenches. An etch mask is formed over the hardmask layer. The etch mask includes an opening exposing a portion of the hardmask layer between a pair of the sidewall spacers. The portion of the hardmask layer exposed by the opening in the etch mask is removed to define a second trench in the hardmask layer.

Abstract: A method, FET structure and gate cut structure are disclosed. The method forms a gate cut opening in a dummy gate in a gate material layer, the gate cut opening extending into a space separating a semiconductor structures on a substrate under the gate material layer. A source/drain region is formed on the semiconductor structure(s), and a gate cut isolation is formed in the gate cut opening. The gate cut isolation may include an oxide body. During forming of a contact, a mask has a portion covering an upper end of the gate cut isolation to protect it. The gate cut structure includes a gate cut isolation including a nitride liner contacting the end of the first metal gate conductor and the end of the second metal gate conductor, and an oxide body inside the nitride liner.

Abstract: A method, FET structure and gate cut structure are disclosed. The method forms a gate cut opening in a dummy gate in a gate material layer, the gate cut opening extending into a space separating a semiconductor structures on a substrate under the gate material layer. A source/drain region is formed on the semiconductor structure(s), and a gate cut isolation is formed in the gate cut opening. The gate cut isolation may include an oxide body. During forming of a contact, a mask has a portion covering an upper end of the gate cut isolation to protect it. The gate cut structure includes a gate cut isolation including a nitride liner contacting the end of the first metal gate conductor and the end of the second metal gate conductor, and an oxide body inside the nitride liner.

Abstract: According to various embodiments, a dock may be provided. The dock may include: a first attachment member configured to attach to an external item; a second attachment member configured to receive a computing device; and a scroll wheel configured to provide user input to the computing device.

Abstract: Structures that include a metal-insulator-metal (MIM) capacitor and methods for fabricating a structure that includes a MIM capacitor. The MIM capacitor includes a first electrode, a second electrode, and a third electrode. A conductive via is arranged in a via opening extending in a vertical direction through at least the first electrode. The first electrode has a surface arranged inside the via opening in a plane transverse to the vertical direction, and the conductive via contacts the first electrode over an area of the surface.

Abstract: Structures that include a metal-insulator-metal (MIM) capacitor and methods for fabricating a structure that includes a MIM capacitor. The MIM capacitor includes a first electrode, a second electrode, and a third electrode. A conductive via is arranged in a via opening extending in a vertical direction through at least the first electrode. The first electrode has a surface arranged inside the via opening in a plane transverse to the vertical direction, and the conductive via contacts the first electrode over an area of the surface.

Abstract: Disclosed are a method of forming an integrated circuit (IC) structure with robust metal plugs and the resulting IC structure. In the method, openings are formed in an interlayer dielectric layer to expose semiconductor device surfaces. The openings are lined with a two-layer liner, which includes conformal metal and barrier layers, and subsequently filled with a metal layer. However, instead of waiting until after the liner is formed to perform a silicidation anneal, as is conventionally done, the silicidation anneal is performed between deposition of the two liner layers. This is particularly useful because, as determined by the inventors, performing the silicidation anneal prior to depositing the conformal barrier layer prevents the formation of microcracks in the conformal barrier layer. Prevention of such microcracks, in turn, prevents any metal from the metal layer from protruding into the area between the two liner layers and/or completely through the liner.

Abstract: According to various embodiments, a dock may be provided. The dock may include: a first attachment member configured to attach to an external item; a second attachment member configured to receive a computing device; and a scroll wheel configured to provide user input to the computing device.

Abstract: Disclosed are a method of forming an integrated circuit (IC) structure with robust metal plugs and the resulting IC structure. In the method, openings are formed in an interlayer dielectric layer to expose semiconductor device surfaces. The openings are lined with a two-layer liner, which includes conformal metal and barrier layers, and subsequently filled with a metal layer. However, instead of waiting until after the liner is formed to perform a silicidation anneal, as is conventionally done, the silicidation anneal is performed between deposition of the two liner layers. This is particularly useful because, as determined by the inventors, performing the silicidation anneal prior to depositing the conformal barrier layer prevents the formation of microcracks in the conformal barrier layer. Prevention of such microcracks, in turn, prevents any metal from the metal layer from protruding into the area between the two liner layers and/or completely through the liner.

Abstract: Disclosed are a field effect transistor (FET) and a FET formation method. In the FET, an interlayer dielectric (ILD) layer is positioned laterally adjacent to a sidewall spacer of a replacement metal gate and a cap layer covers the ILD layer, the sidewall spacer and the gate. However, during processing after the gate is formed but before the cap layer is formed, the ILD layer is polished and then recessed such that the top surface of the ILD layer is lower than the top surfaces of the sidewall spacer and the gate. The cap layer is then deposited such that the cap layer is, not only above the top surfaces of the ILD layer, sidewall spacer and gate, but also positioned laterally adjacent to a vertical surface of the sidewall spacer. Recessing the ILD layer prevents shorts between the gate and subsequently formed contacts to the FET source/drain regions.