Patents by Inventor Jeffrey D. Weinhold

Jeffrey D. Weinhold has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240075720
    Abstract: The present disclosure provides a multilayer film. The multilayer film includes at least two layers including a sealant layer and a second layer in contact with the sealant layer. The sealant layer contains (A) a first ethylene-based polymer having a density from 0.900 g/cc to 0.925 g/cc and a melt index from 0.5 g/10 min to 30 g/10 min; and (B) a polyethylene-polydimethylsiloxane block copolymer having a weight average molecular weight from 1,000 g/mol to 10,000 g/mol. The second layer contains a second ethylene-based polymer.
    Type: Application
    Filed: October 25, 2023
    Publication date: March 7, 2024
    Inventors: Rahul Sharma, Jeffrey D. Weinhold, Phillip D. Hustad, Megan E. Donaldson, Xiaoyong Li, Joseph C. Neuman, Yang Yang
  • Patent number: 11466147
    Abstract: The present disclosure provides a composition containing a polymeric blend. The polymeric blend contains (A) from 50 wt % to 90 wt % of a first ethylene-based polymer having a density from 0.895 g/cc to 0.905 g/cc; and a melt index from 0.1 g/10 min to 50 g/10 min; (B) from 8 wt % to 48 wt % of a second ethylene-based polymer having a density from 0.935 g/cc to 0.967 g/cc; and a melt index from 0.1 g/10 min to 180 g/10 min; and from 0.01 wt % to 2.0 wt % of a slip agent, based on the total weight of the polymeric blend. The polymeric blend has (i) an overall density from 0.900 g/cc to 0.925 g/cc; and (ii) a coefficient of friction (COF) after aging for 1 week at 60° C. from 0.001 to 0.400. The present disclosure also provides a multilayer film with a first layer containing the composition.
    Type: Grant
    Filed: June 4, 2018
    Date of Patent: October 11, 2022
    Assignee: Dow Global Technologies LLC
    Inventors: Rahul Sharma, Jong-Young Lee, Jeffrey D. Weinhold, Mridula Babli Kapur
  • Publication number: 20220049377
    Abstract: Disclosed is a curly fiber having a fiber centroid and comprising a first region having a first centroid and a second region wherein the first region comprises an ethylene/alpha olefin interpolymer composition in an amount of at least 75 weight percent based on total weight of the first region and wherein the ethylene/alpha olefin interpolymer composition is characterized by a low temperature peak and a high temperature peak on an elution profile via improved comonomer composition distribution (ICCD) procedure, and a full width at half maximum of the high temperature peak is less than 6.0° C. and the second region is a material comprising a polymer which is different from the ethylene/alpha-olefin interpolymer of the first region and wherein the regions are arranged such that at least one of the first centroid and the second centroid is not the same as the fiber centroid.
    Type: Application
    Filed: November 20, 2019
    Publication date: February 17, 2022
    Inventors: Yinglong CHEN, Akanksha GARG, Yijian LIN, Sanjib BISWAS, Jeffrey D. WEINHOLD, Pavan Kumar VALAVALA, Fabricio Arteaga LARIOS, Jill MARTIN, Didem ONER-DELIORMANLI, Mehmet DEMIRORS
  • Publication number: 20220032588
    Abstract: The present disclosure provides a multilayer film. The multilayer film includes at least two layers including a sealant layer and a second layer in contact with the sealant layer. The sealant layer contains (A) a first ethylene-based polymer having a density from 0.900 g/cc to 0.925 g/cc and a melt index from 0.5 g/10 min to 30 g/10 min; and (B) a polyethylene-polydimethylsiloxane block copolymer having a weight average molecular weight from 1,000 g/mol to 10,000 g/mol. The second layer contains a second ethylene-based polymer.
    Type: Application
    Filed: December 10, 2019
    Publication date: February 3, 2022
    Inventors: Rahul Sharma, Jeffrey D. Weinhold, Phillip D. Hustad, Megan E. Donaldson, Xiaoyong Li, Joseph C. Neuman, Yang Yang
  • Publication number: 20200131351
    Abstract: The present disclosure provides a composition containing a polymeric blend. The polymeric blend contains (A) from 50 wt % to 90 wt % of a first ethylene-based polymer having a density from 0.895 g/cc to 0.905 g/cc; and a melt index from 0.1 g/10 min to 50 g/10 min; (B) from 8 wt % to 48 wt % of a second ethylene-based polymer having a density from 0.935 g/cc to 0.967 g/cc; and a melt index from 0.1 g/10 min to 180 g/10 min; and from 0.01 wt % to 2.0 wt % of a slip agent, based on the total weight of the polymeric blend. The polymeric blend has (i) an overall density from 0.900 g/cc to 0.925 g/cc; and (ii) a coefficient of friction (COF) after aging for 1 week at 60° C. from 0.001 to 0.400. The present disclosure also provides a multilayer film with a first layer containing the composition.
    Type: Application
    Filed: June 4, 2018
    Publication date: April 30, 2020
    Inventors: Rahul Sharma, Jong-Young Lee, Jeffrey D. Weinhold, Mridula Babli Kapur
  • Patent number: 10287455
    Abstract: Disclosed herein is an article comprising a substrate; upon which is disposed a composition comprising: a first block copolymer that comprises a first block and a second block; where the first block has a higher surface energy than the second block; a second block copolymer that comprises a first block and a second block; where the first block of the first block copolymer is chemically the same as or similar to the first block of the second block copolymer and the second block of the first block copolymer is chemically the same as or similar to the second block of the second block copolymer; where the first and the second block copolymer have a chi parameter greater than 0.04 at a temperature of 200° C.
    Type: Grant
    Filed: April 24, 2017
    Date of Patent: May 14, 2019
    Assignees: DOW GLOBAL TECHNOLOGIES LLC, ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Jieqian Zhang, Phillip D. Hustad, Peter Trefonas, III, Mingqi Li, Valeriy V. Ginzburg, Jeffrey D. Weinhold
  • Patent number: 10208193
    Abstract: Embodiments of the invention provide a reinforced polypropylene comprising a multi-modal molecular weight distribution elastomer and a block composite.
    Type: Grant
    Filed: June 24, 2013
    Date of Patent: February 19, 2019
    Assignee: Dow Global Technologies LLC
    Inventors: Yi Jin, Kim L. Walton, Edmund M. Carnahan, Gary R. Marchand, Xuming Chen, Jeffrey D. Weinhold, Jerzy Klosin, A. Willem Degroot, Philip P. Fontaine
  • Publication number: 20180340045
    Abstract: The present invention provides polymer compositions of one or more phosphorus acid group containing, polymers of six-membered cyclic methacrylic acid imide comprising a backbone polymer having one or more one methacrylic acid in polymerized form or its salt, quaternary ammonium group, ester side chain group or amide side chain group, wherein the backbone polymers comprise from 60 to 100 wt. %, based on the total weight of monomers used to make the backbone polymer, of total methacrylic acid polymerized units, regardless of their form, and wherein a total of from 7.5 to 95 wt. %, or, preferably, less than 70 wt. % of the methacrylic acid polymerized units comprise methacrylic anhydride groups or six-membered cyclic methacrylic imide groups. The polymer can be readily tailored to boost modulus and modify surface energies when added to polymers like polyolefins, and to make them compatible with other polymers, like polyamide.
    Type: Application
    Filed: December 9, 2015
    Publication date: November 29, 2018
    Inventors: Charles J. Rand, Ryan J. DePuit, William J. Harris, Thomas Oswald, C. Damien Rodowski, Jeffrey D. Weinhold
  • Publication number: 20170369371
    Abstract: The present invention provides comb polymer compositions comprising phosphorus acid group containing backbone polymers of six-membered cyclic methacrylic imide having one or more side chain ether group containing N-substituent chosen from an ether group, a polyether group, an etheramine group, a polyetheramine group, an ether group crosslinking the backbone polymer chains, and a polyether group crosslinking the backbone polymer chains. The backbone polymers comprise from 60 to 100 wt. %, based on the total weight of monomers used to make the backbone polymer, of methacrylic acid polymerized units, regardless of their form, and from 7.5 to 95 wt. % of such polymerized units as methacrylic anhydride groups or six-membered cyclic methacrylic imide groups.
    Type: Application
    Filed: December 22, 2014
    Publication date: December 28, 2017
    Inventors: William J. Harris, Thomas Oswald, Charles J. Rand, Jeffrey D. Weinhold
  • Publication number: 20170362365
    Abstract: The present invention provides amphiphilic comb polymer compositions of phosphorus acid group containing backbone polymers of methacrylic anhydride having hydrophobic alkyl, aryl, cycloalkyl or polyolefin ester or amide side chain groups formed on the backbone polymers and comprising from 75 to 100 wt. %, based on the total weight of monomers used to make the backbone polymer, of methacrylic acid polymerized units, wherein in the backbone polymer from 20 to less than 70 wt. %, preferably from 50 to 67 wt. % of the methacrylic acid polymerized units comprise methacrylic anhydride groups as determined by titration of the backbone polymer. As polymeric additives, the polymers can compatibilize polyolefins and polar polymers like polyesters.
    Type: Application
    Filed: December 9, 2015
    Publication date: December 21, 2017
    Inventors: Charles J. Rand, Kebede Beshah, William J. Harris, Thomas Oswald, Jeffrey D. Weinhold
  • Patent number: 9735023
    Abstract: Disclosed herein is a composition comprising a first block copolymer that comprises a first block and a second block; where the first block has a higher surface energy than the second block; a second block copolymer that comprises a first block and a second block; where the first block of the first block copolymer is chemically the same as or similar to the first block of the second block copolymer and the second block of the first block copolymer is chemically the same as or similar to the second block of the second block copolymer; where the weight percent based on total solids of the first block of the second block copolymer is greater than that of the first block of the first block copolymer; where the first block copolymer phase separates into a first morphology of cylindrical or lamellar domains when disposed singly on a substrate.
    Type: Grant
    Filed: June 22, 2015
    Date of Patent: August 15, 2017
    Assignees: DOW GLOBAL TECHNOLOGIES LLC, ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Jieqian Zhang, Phillip D. Hustad, Peter Trefonas, III, Mingqi Li, Valeriy V. Ginzburg, Jeffrey D. Weinhold
  • Publication number: 20170226379
    Abstract: Disclosed herein is an article comprising a substrate; upon which is disposed a composition comprising: a first block copolymer that comprises a first block and a second block; where the first block has a higher surface energy than the second block; a second block copolymer that comprises a first block and a second block; where the first block of the first block copolymer is chemically the same as or similar to the first block of the second block copolymer and the second block of the first block copolymer is chemically the same as or similar to the second block of the second block copolymer; where the first and the second block copolymer have a chi parameter greater than 0.04 at a temperature of 200° C.
    Type: Application
    Filed: April 24, 2017
    Publication date: August 10, 2017
    Inventors: Jieqian Zhang, Phillip D. Hustad, Peter Trefonas, III, Mingqi Li, Valeriy V. Ginzburg, Jeffrey D. Weinhold
  • Patent number: 9663682
    Abstract: Disclosed herein is an article comprising a substrate; upon which is disposed a composition comprising: a first block copolymer that comprises a first block and a second block; where the first block has a higher surface energy than the second block; a second block copolymer that comprises a first block and a second block; where the first block of the first block copolymer is chemically the same as or similar to the first block of the second block copolymer and the second block of the first block copolymer is chemically the same as or similar to the second block of the second block copolymer; where the first and the second block copolymer have a chi parameter greater than 0.04 at a temperature of 200° C.
    Type: Grant
    Filed: June 22, 2015
    Date of Patent: May 30, 2017
    Assignees: DOW GLOBAL TECHNOLOGIES LLC, ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Jieqian Zhang, Phillip D. Hustad, Peter Trefonas, III, Mingqi Li, Valeriy V. Ginzburg, Jeffrey D. Weinhold
  • Patent number: 9475928
    Abstract: The present disclosure provides a composition comprising: a) a polypropylene; b) a polyolefin elastomer; and c) a block composite. The polyolefin elastomer has an I10/I2 from greater than 7.5 to 15.0. The composition may optionally include a filler.
    Type: Grant
    Filed: December 31, 2013
    Date of Patent: October 25, 2016
    Assignee: Dow Global Technologies LLC
    Inventors: Yi Jin, Xuming X. Chen, Kim L. Walton, Gary R. Marchand, Jeffrey D. Weinhold, Sylvie Vervoort
  • Publication number: 20160251505
    Abstract: Embodiments of the invention provide a reinforced polypropylene comprising a multi-modal molecular weight distribution elastomer and a block composite.
    Type: Application
    Filed: June 24, 2013
    Publication date: September 1, 2016
    Applicant: Dow Global Technologies LLC
    Inventors: Yi Jin, Kim L. Walton, Edmund M. Carnahan, Gary R. Marchand, Xuming Chen, Jeffrey D. Weinhold, Jerzy Klosin, A. Willem Degroot, Philip P. Fontaine
  • Publication number: 20150376454
    Abstract: Disclosed herein is an article comprising a substrate; upon which is disposed a composition comprising: a first block copolymer that comprises a first block and a second block; where the first block has a higher surface energy than the second block; a second block copolymer that comprises a first block and a second block; where the first block of the first block copolymer is chemically the same as or similar to the first block of the second block copolymer and the second block of the first block copolymer is chemically the same as or similar to the second block of the second block copolymer; where the first and the second block copolymer have a chi parameter greater than 0.04 at a temperature of 200° C.
    Type: Application
    Filed: June 22, 2015
    Publication date: December 31, 2015
    Inventors: Jieqian Zhang, Phillip D. Hustad, Peter Trefonas, III, Mingqi Li, Valeriy V. Ginzburg, Jeffrey D. Weinhold
  • Publication number: 20150376408
    Abstract: Disclosed herein is a composition comprising a first block copolymer that comprises a first block and a second block; where the first block has a higher surface energy than the second block; a second block copolymer that comprises a first block and a second block; where the first block of the first block copolymer is chemically the same as or similar to the first block of the second block copolymer and the second block of the first block copolymer is chemically the same as or similar to the second block of the second block copolymer; where the weight percent based on total solids of the first block of the second block copolymer is greater than that of the first block of the first block copolymer; where the first block copolymer phase separates into a first morphology of cylindrical or lamellar domains when disposed singly on a substrate.
    Type: Application
    Filed: June 22, 2015
    Publication date: December 31, 2015
    Inventors: Jieqian Zhang, Phillip D. Hustad, Peter Trefonas, III, Mingqi Li, Valeriy V. Ginzburg, Jeffrey D. Weinhold
  • Patent number: 8961918
    Abstract: A method for processing a substrate is provided; wherein the method comprises applying a film of a copolymer composition, comprising a poly(styrene)-b-poly(dimethylsiloxane) block copolymer component to a surface of the substrate; optionally, baking the film; subjecting the film to a high temperature annealing process under particularized atmospheric conditions for a specified period of time; followed by a treatment of the annealed film to remove the poly(styrene) from the annealed film and to convert the poly(dimethylsiloxane) in the annealed film to SiOx.
    Type: Grant
    Filed: February 10, 2012
    Date of Patent: February 24, 2015
    Assignees: Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
    Inventors: Shih-Wei Chang, Jeffrey D. Weinhold, Phillip D. Hustad, Peter Trefonas
  • Publication number: 20140378601
    Abstract: The present disclosure provides a composition comprising: a) a polypropylene; b) a polyolefin elastomer; and c) a block composite. The polyolefin elastomer has an I10/I2 from greater than 7.5 to 15.0. The composition may optionally include a filler.
    Type: Application
    Filed: December 31, 2013
    Publication date: December 25, 2014
    Applicant: Dow Global Technologies LLC
    Inventors: Yi Jin, Xuming X. Chen, Kim L. Walton, Gary R. Marchand, Jeffrey D. Weinhold, Sylvie Veroort
  • Patent number: 8821739
    Abstract: A method for processing a substrate is provided; wherein the method comprises applying a film of a copolymer composition, comprising a poly(styrene)-b-poly(siloxane) block copolymer component; and, an antioxidant to a surface of the substrate; optionally, baking the film; subjecting the film to a high temperature annealing process under a gaseous atmosphere for a specified period of time; followed by a treatment of the annealed film to remove the poly(styrene) from the annealed film and to convert the poly(siloxane) in the annealed film to SiOx.
    Type: Grant
    Filed: July 12, 2012
    Date of Patent: September 2, 2014
    Assignees: Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
    Inventors: Xinyu Gu, Shih-Wei Chang, Phillip D. Hustad, Jeffrey D. Weinhold, Peter Trefonas