Abstract: A skin measuring apparatus measures skin characteristics. The apparatus comprises: a mover attached to a housing to allow the mover to move in a first direction and a second direction relative to the housing; a position sensor attached to the housing for measuring a position of the mover as the mover moves relative the housing between first and second positions; a force sensor for measuring a force applied to the mover; a latch fixed to the mover; a releasable catch attached to the housing, the releasable catch engageable with the latch to prevent movement of the mover in the second direction from the second position until the releasable catch is released. The first direction is opposite the second direction; a first end of the mover is releasably attachable to a skin sample.

Abstract: A polishing pad comprising particles having an average diameter between 1 nanometer and 100 nanometers, wherein the total weight of the particles is greater than about 3% of the total weight of the pad. Also, a method of manufacturing a polishing pad comprises the steps of: mixing a pre-polymer and abrasive particles together; wherein the abrasive particles have an average diameter of between 1 nanometer and 100 nanometers in diameter, and wherein the abrasive particles comprise more than about 3% by weight of the polishing pad; mixing a curative with the mixed pre-polymer and particles; and pouring the mixture of pre-polymer, particles and curative into a mold. In one exemplary embodiment the particles are silica and the pre-polymer is a polyurethane pre-polymer.