Patents by Inventor Jeffrey E. McAninch

Jeffrey E. McAninch has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7227637
    Abstract: The subject invention relates to a broadband optical metrology system that segregates the broadband radiation into multiple sub-bands to improve overall performance. Each sub-band includes only a fraction of the original bandwidth. The optical path—the light path that connects the illuminator, the sample and the detector—of each sub-band includes a unique sub-band optical system designed to optimize the performance over the spectral range spanned by the sub-band radiation. All of the sub-band optical systems are arranged to provide small-spot illumination at the same measurement position. Optional purging of the individual sub-band optical paths further improves performance.
    Type: Grant
    Filed: April 7, 2006
    Date of Patent: June 5, 2007
    Assignee: Therma-Wave, Inc.
    Inventors: David Y. Wang, Lawrence Rotter, Jeffrey T. Fanton, Jeffrey E. McAninch
  • Patent number: 7061614
    Abstract: The subject invention relates to a broadband optical metrology system that segregates the broadband radiation into multiple sub-bands to improve overall performance. Each sub-band includes only a fraction of the original bandwidth. The optical path—the light path that connects the illuminator, the sample and the detector—of each sub-band includes a unique sub-band optical system designed to optimize the performance over the spectral range spanned by the sub-band radiation. All of the sub-band optical systems are arranged to provide small-spot illumination at the same measurement position. Optional purging of the individual sub-band optical paths further improves performance.
    Type: Grant
    Filed: May 8, 2002
    Date of Patent: June 13, 2006
    Assignee: Therma-Wave, Inc.
    Inventors: David Y. Wang, Lawrence Rotter, Jeffrey T. Fanton, Jeffrey E. McAninch
  • Patent number: 6813026
    Abstract: A purge system for an optical metrology tool is disclosed. The metrology tool includes an optics plate for supporting the measurement optics. A movable stage supports a wafer below the optics plate. Inert purge gas is injected between the lower surface of the optics plate and the upper surface of the wafer. The gas flow functions to stabilize and homogenize the ambient in the measurement region. The gas flow also serves to clear the measurement area of absorbing species which is particular useful for measurements using vacuum ultraviolet light.
    Type: Grant
    Filed: December 21, 2001
    Date of Patent: November 2, 2004
    Assignee: Therma-Wave, Inc.
    Inventor: Jeffrey E. McAninch
  • Publication number: 20030071996
    Abstract: The subject invention relates to a broadband optical metrology system that segregates the broadband radiation into multiple sub-bands to improve overall performance. Each sub-band includes only a fraction of the original bandwidth. The optical path—the light path that connects the illuminator, the sample and the detector—of each sub-band includes a unique sub-band optical system designed to optimize the performance over the spectral range spanned by the sub-band radiation. All of the sub-band optical systems are arranged to provide small-spot illumination at the same measurement position. Optional purging of the individual sub-band optical paths further improves performance.
    Type: Application
    Filed: May 8, 2002
    Publication date: April 17, 2003
    Inventors: David Y. Wang, Lawrence Rotter, Jeffrey T. Fanton, Jeffrey E. McAninch
  • Publication number: 20020149774
    Abstract: A purge system for an optical metrology tool is disclosed. The metrology tool includes an optics plate for supporting the measurement optics. A movable stage supports a wafer below the optics plate. Inert purge gas is injected between the lower surface of the optics plate and the upper surface of the wafer. The gas flow functions to stabilize and homogenize the ambient in the measurement region. The gas flow also serves to clear the measurement area of absorbing species which is particular useful for measurements using vacuum ultraviolet light.
    Type: Application
    Filed: December 21, 2001
    Publication date: October 17, 2002
    Inventor: Jeffrey E. McAninch