Abstract: A chemical vapor deposition system for coating one or more workpieces is described herein. The deposition system includes a plurality of processing chambers which may be operated independently to increase throughput of the deposition system. Each chamber includes a modular fixture that is configured to maintain the workpieces in a predetermined arrangement which allows for a hollow cathode effect to be maintained in an Interior space of the chamber. The deposition system achieves significantly faster, higher-quality deposition and more complete, conformal coverage.

Abstract: Systems, methods and apparatus for fractioning mixtures comprising combinations of volatiles, essentially non-volatiles and non-volatile solutes are disclosed. Embodiments of a burst atomization fractionation apparatus comprises an atomization chamber into which a liquid mixture is atomized across a pressure gradient. In various embodiments, a mixture for fractionation comprises mixtures of solvents, solvents and oils, used engine oil, or salt water. In various examples, a solute undergoes a chemical transformation during the fractionation process, such as dehydrogenation, dehydration, or decarboxylation.

Abstract: A chemical vapor deposition system for coating one or more workpieces is described herein. The deposition system includes a plurality of processing chambers which may be operated independently to increase throughput of the deposition system. Each chamber includes a modular fixture that is configured to maintain the workpieces in a predetermined arrangement which allows for a hollow cathode effect to be maintained in an Interior space of the chamber. The deposition system achieves significantly faster, higher-quality deposition and more complete, conformal coverage.

Abstract: A modular, offset In-line vacuum processing system is disclosed. The system comprises a plurality of independently operable process chambers each configured to accommodate a given number of carriers, where each carrier may hold a set of independently biased substrates. Further, each process chamber may be configured to execute one or more steps in one or more processes performed on each set of substrates. A plurality of Independently operable transfer chambers may be configured to transfer each carrier to and from process chambers for completing each step in the one or more processes. As a result, the system is able to: simultaneously coat the sets of substrates via a designated coating process (i.e., unique to each set of carriers); obtain a set of desired coating properties for each set of parts; perform processes having varying process step lengths; coat parts of multiple geometries; shut down individual chambers without interrupting production capacity.

Abstract: A rotary magnetron is provided with an end block for rotatably supporting a target on an axis of rotation. An elongate magnetic bar assembly is disposed within the target. A stator shaft is affixed in the end block; one end of the stator shaft is coupled to the elongate magnetic bar assembly to support the elongate magnetic bar assembly. The target has a target shaft extending over the stator shaft and rotatable thereon around the axis of rotation. The rotary magnetron is characterized by a rotating coolant seal disposed inside the target shaft proximate the one end of the stator shaft and proximate to the elongate magnetic bar assembly.