Abstract: A semiconductor structure having: semiconductor devices formed in an inner region of a semiconductor chip; a seal ring formed in the chip and disposed about the inner region; and, a plurality of trenches formed along a surface of the chip. The trenches are disposed in a corner region of the chip. A portion of the seal ring is disposed between the trenches and the inner region of the chip. The trenches are disposed along axes oblique to outer edges of the chip. A method is provided for encapsulating a semiconductor chip. The method includes the steps of: providing a semiconductor chip having active semiconductor devices in an inner region of the semiconductor chip and a seal ring in the chip about the inner region; and, forming a plurality of trenches in the chip, a portion of the seal ring being formed between the trenches and the inner region of the chip. A cover is formed having bottom portions in the trenches and on the passivation layer.