Patents by Inventor Jeffrey Gelpey

Jeffrey Gelpey has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6451713
    Abstract: The oxynitride or oxide layer formed on a semiconductor substrate is pre-treated with UV-excited gas (such as chlorine or nitrogen) to improve the layer surface condition and increase the density of nucleation sites for subsequent silicon nitride deposition. The pre-treatment is shown to reduce the root mean square surface roughness of thinner silicon nitride films (with physical thicknesses below 36 Å, or even below 20 Å that are deposited on the oxynitride layer by chemical vapor deposition (CVD).
    Type: Grant
    Filed: April 17, 2001
    Date of Patent: September 17, 2002
    Assignee: Mattson Technology, Inc.
    Inventors: Sing-Pin Tay, Yao Zhi Hu, Sagy Levy, Jeffrey Gelpey