Patents by Inventor Jeffrey H. Tokie

Jeffrey H. Tokie has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10618266
    Abstract: The present disclosure describes articles, such as medical articles, containing a substrate having disposed thereon a hydrophilic gel material (e.g., a shaped hydrophilic gel material or a coating of a hydrophilic gel material) and methods for making such articles. Methods are provided for making hydrophilic gel materials from a precursor composition that contains a polar solvent and a polymerizable material that is miscible with the polar solvent.
    Type: Grant
    Filed: October 15, 2014
    Date of Patent: April 14, 2020
    Assignee: 3M Innovative Properties Company
    Inventors: Robin E. Wright, Stephen E. Krampe, Richard L. Walter, Caroline M. Ylitalo, William A. Eibner, Jeffrey H. Tokie, Matthew T. Scholz
  • Patent number: 9873276
    Abstract: A method includes providing an elastomeric stamp including a stamping surface with a first pattern element having a fill factor of 20 to 99 percent and including a continuous region and at least one discontinuous region, the discontinuous region including at least one of: (1) one or more elongated concavities, and (2) one or more interior voids. A second pattern element of the stamping surface has a fill factor of 0.25 to 10 percent, and includes traces with a width from 0.1 micrometers to 50 micrometers. The stamping surface is inked with an ink composition including a functionalizing molecule with a functional group selected to bind to a surface of the ink-receptive material. The inked stamping surface is contacted with an ink-receptive material selected from a sheet or a web for a contact time sufficient to bind the functional group with the surface of the ink-receptive material to form a self-assembled monolayer (SAM) of the functionalizing material.
    Type: Grant
    Filed: October 30, 2014
    Date of Patent: January 23, 2018
    Assignee: 3M INNOVATIVE PROPERTIES COMPANY
    Inventors: Catherine P. Tarnowski, David A. Johnson, Roger W. Barton, Larry L. Johnson, Jonathan J. O'Hare, Tyler J. Rattray, Daniel M. Lentz, Jeffrey H. Tokie, Matthew H. Frey, Mikhail L. Pekurovsky
  • Patent number: 9592161
    Abstract: A method includes contact printing an active composition onto a surface of a release substrate to form a printed surface. The active composition spontaneously dewets the surface of the release substrate to form active deposits on the surface of the release substrate. The active composition comprises an active agent dissolved or dispersed in an aqueous liquid vehicle. A pressure-sensitive adhesive layer is disposed on the printed surface.
    Type: Grant
    Filed: December 10, 2012
    Date of Patent: March 14, 2017
    Assignee: 3M Innovative Properties Company
    Inventors: Joseph D. Rule, Jeffrey H. Tokie, Kim B. Saulsbury, Deena M. Conrad-Vlasak, Kanta Kumar
  • Patent number: 9465304
    Abstract: A system for making flexible circuit films includes an inelastic conveyor, a web handling apparatus configured to pass a flexible substrate around the inelastic conveyor, an image acquisition apparatus configured to measure positions of a first set of alignment marks on the flexible substrate at a first conveyor location, an exposure apparatus configured to patternwise expose a photosensitive material on the flexible substrate at a second conveyor location, and an image processor configured to receive the measured positions of the first set of alignment marks, and to compare the measured positions with reference positions of the first set of alignment marks. The exposure apparatus is configured to patternwise expose the photosensitive material based on the comparison between the measured positions and the reference positions.
    Type: Grant
    Filed: June 27, 2013
    Date of Patent: October 11, 2016
    Assignee: 3M Innovative Properties Company
    Inventors: Michael A. Haase, Jeffrey H. Tokie, Daniel J. Theis, Brian K. Nelson
  • Publication number: 20160250875
    Abstract: A method includes providing an elastomeric stamp including a stamping surface with a first pattern element having a fill factor of 20 to 99 percent and including a continuous region and at least one discontinuous region, the discontinuous region including at least one of: (1) one or more elongated concavities, and (2) one or more interior voids. A second pattern element of the stamping surface has a fill factor of 0.25 to 10 percent, and includes traces with a width from 0.1 micrometers to 50 micrometers. The stamping surface is inked with an ink composition including a functionalizing molecule with a functional group selected to bind to a surface of the ink-receptive material. The inked stamping surface is contacted with an ink-receptive material selected from a sheet or a web for a contact time sufficient to bind the functional group with the surface of the ink-receptive material to form a self-assembled monolayer (SAM) of the functionalizing material.
    Type: Application
    Filed: October 30, 2014
    Publication date: September 1, 2016
    Inventors: Catherine P. Tarnowski, David A. Johnson, Roger W. Barton, Larry L. Johnson, Jonathan J. O'Hare, Tyler J. Rattray, Daniel M. Lentz, Jeffrey H. Tokie, Matthew H. Frey, Mikhail L. Pekurovsky
  • Patent number: 9301397
    Abstract: Metalized web substrate is wet etched in a reaction vessel by contacting with oxidizing and metal complexing agent to remove metal from unpatterned region. Following etching, substrate is rinsed, and rinse is at least partly recycled. Concentrations of oxidizing and metal complexing agents in the etchant bath are maintained by delivering replenishment feeds of each. Concentration of metal in the etchant bath is maintained by discharging some of the etchant bath. Replenishment rates of oxidizing and metal complexing agents and etchant removal rate are determined based at least in part on rate that metal etched from the substrate enters the etchant bath.
    Type: Grant
    Filed: September 19, 2012
    Date of Patent: March 29, 2016
    Assignee: 3M INNOVATIVE PROPERTIES COMPANY
    Inventors: Jeffrey H. Tokie, Joseph W. Woody, V, Thomas M. Lynch, Daniel M. Lentz, Robert S. Davidson, Cristin E. Moran, Lijun Zu
  • Publication number: 20150027625
    Abstract: The present disclosure describes articles, such as medical articles, containing a substrate having disposed thereon a hydrophilic gel material (e.g., a shaped hydrophilic gel material or a coating of a hydrophilic gel material) and methods for making such articles. Methods are provided for making hydrophilic gel materials from a precursor composition that contains a polar solvent and a polymerizable material that is miscible with the polar solvent.
    Type: Application
    Filed: October 15, 2014
    Publication date: January 29, 2015
    Inventors: Robin E. WRIGHT, Stephen E. KRAMPE, Richard L. WALTER, Caroline M. YLITALO, William A. EIBNER, Jeffrey H. TOKIE, Matthew T. SCHOLZ
  • Publication number: 20140363564
    Abstract: A method includes contact printing an active composition onto a surface of a release substrate to form a printed surface. The active composition spontaneously dewets the surface of the release substrate to form active deposits on the surface of the release substrate. The active composition comprises an active agent dissolved or dispersed in an aqueous liquid vehicle. A pressure-sensitive adhesive layer is disposed on the printed surface.
    Type: Application
    Filed: December 10, 2012
    Publication date: December 11, 2014
    Inventors: Joseph D. Rule, Jeffrey H. Tokie, Kim B. Saulsbury, Deena M. Conrad-Vlasak, Kanta Kumar
  • Publication number: 20140231381
    Abstract: Metalized web substrate is wet etched in a reaction vessel by contacting with oxidizing and metal complexing agent to remove metal from unpatterned region. Following etching, substrate is rinsed, and rinse is at least partly recycled. Concentrations of oxidizing and metal complexing agents in the etchant bath are maintained by delivering replenishment feeds of each. Concentration of metal in the etchant bath is maintained by discharging some of the etchant bath. Replenishment rates of oxidizing and metal complexing agents and etchant removal rate are determined based at least in part on rate that metal etched from the substrate enters the etchant bath.
    Type: Application
    Filed: September 19, 2012
    Publication date: August 21, 2014
    Inventors: Jeffrey H. Tokie, Joseph W. Woody, V, Thomas M. Lynch, Daniel M. Lentz, Robert S. Davidson, Cristin E. Moran, Lijun Zu
  • Patent number: 8647522
    Abstract: Method of patterning a substrate are described including a method of providing a substrate comprising a metalized surface having a self-assembled monolayer patterned region and unpatterned region; and wet etching the metalized surface in a liquid etchant agitated with bubbling gas to remove metal from the unpatterned regions to form a metal pattern. Also described are metal patterned article including an article comprising a substrate and an etched microcontact printed metal pattern disposed on the substrate wherein the pattern has a thickness of at least 100 nanometers and a pattern feature uniformity of at least 50% for an area of at least 25 cm2.
    Type: Grant
    Filed: June 17, 2010
    Date of Patent: February 11, 2014
    Assignee: 3M Innovative Properties Company
    Inventors: Lijun Zu, Matthew H. Frey, Myungchan Kang, Jeffrey H. Tokie
  • Publication number: 20130286367
    Abstract: A system for making flexible circuit films includes an inelastic conveyor, a web handling apparatus configured to pass a flexible substrate around the inelastic conveyor, an image acquisition apparatus configured to measure positions of a first set of alignment marks on the flexible substrate at a first conveyor location, an exposure apparatus configured to patternwise expose a photosensitive material on the flexible substrate at a second conveyor location, and an image processor configured to receive the measured positions of the first set of alignment marks, and to compare the measured positions with reference positions of the first set of alignment marks. The exposure apparatus is configured to patternwise expose the photosensitive material based on the comparison between the measured positions and the reference positions.
    Type: Application
    Filed: June 27, 2013
    Publication date: October 31, 2013
    Inventors: Michael A. Haase, Jeffrey H. Tokie, Daniel J. Theis, Brian K. Nelson
  • Patent number: 8486593
    Abstract: Methods of making flexible circuit films include providing a polymer film or other flexible substrate having a plurality of alignment marks and a photosensitive material thereon. The substrate passes around a suitable roller, belt, or other inelastic conveyor such that the substrate and the conveyor move together at least from a first location to a second location. Positions of a first set of the alignment marks on a first portion of the substrate are measured when such portion is at the first location, and the measured positions can be used to calculate a distortion of the substrate. The photosensitive material is then patternwise exposed when the first portion of the substrate has moved to the second location. The patternwise exposing is based on the measured positions of the first set of alignment marks, and may include exposing the web with a distortion-adjusted pattern. Related systems and articles are also disclosed.
    Type: Grant
    Filed: December 17, 2009
    Date of Patent: July 16, 2013
    Assignee: 3M Innovative Properties Company
    Inventors: Michael A. Haase, Jeffrey H. Tokie, Daniel J. Theis, Brian K. Nelson
  • Patent number: 8339573
    Abstract: A method includes providing a substrate having a layer of photosensitive material thereon and a mask having contiguous first, second, and third portions; and sequentially: i) scanning the first portion with a light beam at a first rate and subsequently impinges on the photosensitive material at an exposure zone; ii) fixing the scanning within the second portion; and iii) resuming scanning through the third portion. Throughout the process the substrate moves through the exposure zone. An apparatus for carrying out the process includes a light beam source, a mask mount, a mask stage, a conveyor assembly, and at least one optical element for manipulating the light beam into a rectangular light beam.
    Type: Grant
    Filed: May 27, 2009
    Date of Patent: December 25, 2012
    Assignee: 3M Innovative Properties Company
    Inventors: Daniel J. Theis, Levent Biyikli, Jeffrey H. Tokie, David L. Hofeldt
  • Patent number: 8318552
    Abstract: A process for forming gate structures is described. A web comprises a substrate, a plurality of conductive elements disposed on the substrate, and a conductive anodization bus. The web is moved through an anodization station to form a plurality of gate structures comprising a plurality of gate dielectrics adjacent to a plurality of gate electrodes. A process for forming electronic devices further providing a semiconductor, a source electrode, and a drain electrode is described.
    Type: Grant
    Filed: May 20, 2008
    Date of Patent: November 27, 2012
    Assignee: 3M Innovative Properties Company
    Inventors: Jeffrey H. Tokie, Michael A. Haase, Robert J. Schubert, Michael W. Bench, Donald J. McClure, Grace L. Ho
  • Publication number: 20120082825
    Abstract: Method of patterning a substrate are described including a method of providing a substrate comprising a metalized surface having a self-assembled monolayer patterned region and unpatterned region; and wet etching the metalized surface in a liquid etchant agitated with bubbling gas to remove metal from the unpatterned regions to form a metal pattern. Also described are metal patterned article including an article comprising a substrate and an etched microcontact printed metal pattern disposed on the substrate wherein the pattern has a thickness of at least 100 nanometers and a pattern feature uniformity of at least 50% for an area of at least 25 cm2.
    Type: Application
    Filed: June 17, 2010
    Publication date: April 5, 2012
    Inventors: Lijun Zu, Matthew H. Frey, Myungchan Kang, Jeffrey H. Tokie
  • Publication number: 20110253425
    Abstract: Methods of making flexible circuit films include providing a polymer film or other flexible substrate having a plurality of alignment marks and a photosensitive material thereon. The substrate passes around a suitable roller, belt, or other inelastic conveyor such that the substrate and the conveyor move together at least from a first location to a second location. Positions of a first set of the alignment marks on a first portion of the substrate are measured when such portion is at the first location, and the measured positions can be used to calculate a distortion of the substrate. The photosensitive material is then patternwise exposed when the first portion of the substrate has moved to the second location. The patternwise exposing is based on the measured positions of the first set of alignment marks, and may include exposing the web with a distortion-adjusted pattern. Related systems and articles are also disclosed.
    Type: Application
    Filed: December 17, 2009
    Publication date: October 20, 2011
    Inventors: Michael A. Haase, Jeffrey H. Tokie, Daniel J. Theis, Brian K. Nelson
  • Publication number: 20100304309
    Abstract: A method includes providing a substrate having a layer of photosensitive material thereon and a mask having contiguous first, second, and third portions; and sequentially: i) scanning the first portion with a light beam at a first rate and subsequently impinges on the photosensitive material at an exposure zone; ii) fixing the scanning within the second portion; and iii) resuming scanning through the third portion. Throughout the process the substrate moves through the exposure zone. An apparatus for carrying out the process includes a light beam source, a mask mount, a mask stage, a conveyor assembly, and at least one optical element for manipulating the light beam into a rectangular light beam.
    Type: Application
    Filed: May 27, 2009
    Publication date: December 2, 2010
    Inventors: Daniel J. Theis, Levent Biyikli, Jeffrey H. Tokie, David L. Hofeldt
  • Publication number: 20100266794
    Abstract: The present disclosure describes articles, such as medical articles, containing a substrate having disposed thereon a hydrophilic gel material (e.g., a shaped hydrophilic gel material or a coating of a hydrophilic gel material) and methods for making such articles. Methods are provided for making hydrophilic gel materials from a precursor composition that contains a polar solvent and a polymerizable material that is miscible with the polar solvent.
    Type: Application
    Filed: December 12, 2008
    Publication date: October 21, 2010
    Inventors: Robin E. Wright, Stephen E. Krampe, Richard L. Walter, Caroline M. Ylitalo, William A. Eibner, Jeffrey H. Tokie, Matthew T. Scholz
  • Publication number: 20100252176
    Abstract: A process for forming gate structures is described. A web comprises a substrate, a plurality of conductive elements disposed on the substrate, and a conductive anodization bus. The web is moved through an anodization station to form a plurality of gate structures comprising a plurality of gate dielectrics adjacent to a plurality of gate electrodes. A process for forming electronic devices further providing a semiconductor, a source electrode, and a drain electrode is described.
    Type: Application
    Filed: May 20, 2008
    Publication date: October 7, 2010
    Inventors: Jeffrey H. Tokie, Michael A. Haase, Robert J. Schubert, Michael W. Bench, Donald J. McClure, Grace L. Ho
  • Patent number: 7763114
    Abstract: An aperture mask assembly includes a rotatable frame and a mask having apertures. A clamping arrangement is used to tension the mask and to conform the mask to a shape defined by the frame. Tension is applied to the mask in a direction substantially parallel to an axis of the frame and/or around the circumference of the shape defined by the frame. Deposition material emanating from a deposition source located within the rotatable frame is deposited through the mask apertures onto a web.
    Type: Grant
    Filed: December 28, 2005
    Date of Patent: July 27, 2010
    Assignee: 3M Innovative Properties Company
    Inventors: Jeffrey H. Tokie, Donald J. McClure