Patents by Inventor Jeffrey K. Wong

Jeffrey K. Wong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11644480
    Abstract: A probe assembly for a surface analysis instrument such as an atomic force microscope (AFM) that accommodates potential thermal drift effects includes a substrate defining a base of the probe assembly, a cantilever extending from the base and having a distal end, and a reflective pad disposed at or near the distal end. The reflective pad has a lateral dimension (e.g., length) between about twenty-five (25) microns, and can be less than a micron. Ideally, the reflective pad is patterned on the cantilever using photolithography. A corresponding method of manufacture of the thermally stable, drift resistant probe is also provided.
    Type: Grant
    Filed: August 3, 2018
    Date of Patent: May 9, 2023
    Assignee: Bruker Nano, Inc.
    Inventors: Jeffrey K. Wong, Deepkishore Mukhopadhyay
  • Publication number: 20200241038
    Abstract: A probe assembly for a surface analysis instrument such as an atomic force microscope (AFM) that accommodates potential thermal drift effects includes a substrate defining a base of the probe assembly, a cantilever extending from the base and having a distal end, and a reflective pad disposed at or near the distal end. The reflective pad has a lateral dimension (e.g., length) between about twenty-five (25) microns, and can be less than a micron. Ideally, the reflective pad is patterned on the cantilever using photolithography. A corresponding method of manufacture of the thermally stable, drift resistant probe is also provided.
    Type: Application
    Filed: August 3, 2018
    Publication date: July 30, 2020
    Inventors: Jeffrey K. Wong, Deepkishore Mukhopadhyay
  • Patent number: 6008113
    Abstract: A jig for a fusion bonding process includes a sealable chamber having a first station for a first wafer and a second station for a second wafer. The wafers are initially separated from each other while a vacuum is created in the chamber. In one embodiment of the invention, movably mounted spacers separate the wafers while the vacuum is formed. The spacers are then moved to allow the wafers to come into contact and form an initial bond. In another embodiment, wafers in the first and second stations are tilted away from each other so that gravity keeps the wafers separated while the vacuum is formed. After the vacuum is formed, the chamber is rotated so that gravity pushes the two wafers together. In either embodiment, a mechanical pushing system or vibrational energy can apply force to induce or improve the initial bond. The initial bond seals cavities formed between the wafers.
    Type: Grant
    Filed: May 19, 1998
    Date of Patent: December 28, 1999
    Assignee: Kavlico Corporation
    Inventors: M. Salleh Ismail, Jeffrey K. Wong