Patents by Inventor Jeffrey Klug

Jeffrey Klug has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Controlling the emissive properties of materials-improved lasers and upconversion materials
    Publication number: 20130223469
    Abstract: Systems and methods for producing crystalline materials by atomic layer deposition, allowing for high control of localized doping. Such materials may be fibers or films suitable for use in optoelectronics and lasers.
    Type: Application
    Filed: February 29, 2012
    Publication date: August 29, 2013
    Inventors: Thomas Proslier, Nicholas G. Becker, Michael J. Pellin, Jeffrey Klug, Jeffrey W. Elam
  • Controlling the emissive properties of materials-improved lasers and upconversion materials
    Patent number: 8518179
    Abstract: Systems and methods for producing crystalline materials by atomic layer deposition, allowing for high control of localized doping. Such materials may be fibers or films suitable for use in optoelectronics and lasers.
    Type: Grant
    Filed: February 29, 2012
    Date of Patent: August 27, 2013
    Assignee: UChicago Argonne, LLC
    Inventors: Thomas Proslier, Nicholas G. Becker, Michael J. Pellin, Jeffrey Klug, Jeffrey W. Elam
  • ATOMIC LAYER DEPOSITION OF SUPER-CONDUCTING NIOBIUM SILICIDE
    Publication number: 20120219824
    Abstract: A method of preparing a superconducting thin film of niobium silicide using atomic layer deposition (ALD) where the superconducting critical temperature of the film is controllable by modulating the thickness of the thin film. The film is formed by exposing a substrate within an ALD reactor to alternating exposures of a niobium halide (NbQx) and a reducing precursor, for example, disilane (Si2H6) or silane (SiH4). A number of ALD cycles are performed to obtain the film thickness and establish the desired superconducting critical temperature between 0.4 K and 3.1 K.
    Type: Application
    Filed: February 28, 2011
    Publication date: August 30, 2012
    Inventors: Thomas Prolier, Jeffrey Elam, Jeffrey Klug, Michael J. Pellin