Patents by Inventor Jeffrey M. Dysard

Jeffrey M. Dysard has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8741009
    Abstract: The inventive chemical-mechanical polishing system comprises a polishing component, a liquid carrier, and a polyether amine. The inventive method comprises chemically-mechanically polishing a substrate with the aforementioned polishing system.
    Type: Grant
    Filed: July 29, 2009
    Date of Patent: June 3, 2014
    Assignee: Cabot Microelectronics Corporation
    Inventors: Jeffrey M. Dysard, Paul M. Feeney, Sriram P. Anjur, Timothy P. Johns, Yun-Biao Xin, Li Wang
  • Patent number: 8138091
    Abstract: The invention provides a chemical-mechanical polishing composition comprising a cationic abrasive, a cationic polymer, an inorganic halide salt, and an aqueous carrier. The invention further provides a method of chemically-mechanically polishing a substrate with the aforementioned polishing composition. The polishing composition exhibits selectivity for removal of silicon nitride over removal of silicon oxide and polysilicon.
    Type: Grant
    Filed: April 2, 2009
    Date of Patent: March 20, 2012
    Assignee: Cabot Microelectronics Corporation
    Inventors: Jeffrey M. Dysard, Timothy P. Johns
  • Patent number: 7837888
    Abstract: The invention provides a method of chemically-mechanically polishing a substrate having at least one feature defined thereon, wherein the feature has at least one dimension with a size W, with a chemical-mechanical polishing composition. The polishing composition comprises particles of an abrasive wherein the particles have a mean particle diameter DM wherein the mean particle diameter of the particles satisfies the equation: DM>W. The invention further provides a method of preparing the chemical-mechanical polishing composition.
    Type: Grant
    Filed: November 13, 2006
    Date of Patent: November 23, 2010
    Assignee: Cabot Microelectronics Corporation
    Inventors: Paul M. Feeney, Sriram Anjur, Jeffrey M. Dysard
  • Patent number: 7799210
    Abstract: A three-step process of removing sulfur from naphtha feeds. The steps include a first hydrotreating step, a mercaptan removal agent and an adsorbent containing a reactive metal on an inorganic support. Step one removes at least 95 wt. % of the sulfur compounds while preserving at least 50 wt. % of the olefins. Treatment with the mercaptan removal agent lowers the sulfur content to 30 wppm total sulfur and final naphtha product contains leas than 10 wppm total sulfur.
    Type: Grant
    Filed: April 6, 2005
    Date of Patent: September 21, 2010
    Assignee: ExxonMobil Research and Engineering Company
    Inventors: Jeffrey M. Dysard, Gordon F. Stuntz, Thomas R. Halbert, Andrzej Malek
  • Publication number: 20090289033
    Abstract: The inventive chemical-mechanical polishing system comprises a polishing component, a liquid carrier, and a polyether amine. The inventive method comprises chemically-mechanically polishing a substrate with the aforementioned polishing system.
    Type: Application
    Filed: July 29, 2009
    Publication date: November 26, 2009
    Inventors: Jeffrey M. Dysard, Paul M. Feeney, Sriram P. Anjur, Timothy P. Johns, Yun-Biao Xin, Li Wang
  • Patent number: 7585340
    Abstract: The inventive chemical-mechanical polishing system comprises a polishing component, a liquid carrier, and a polyether amine. The inventive method comprises chemically-mechanically polishing a substrate with the aforementioned polishing system.
    Type: Grant
    Filed: April 27, 2006
    Date of Patent: September 8, 2009
    Assignee: Cabot Microelectronics Corporation
    Inventors: Jeffrey M. Dysard, Paul M. Feeney, Sriram P. Anjur, Timothy P. Johns, Yun-Biao Xin, Li Wang
  • Patent number: 7585808
    Abstract: The present invention is directed to processes for preparing supported metal catalysts comprising one or more catalytically active metals applied to a porous catalyst support and to processes that use such catalysts. The process requires the formation of an organic complex during the manufacture of the catalyst which after its formation is either partially or fully decomposed before reduction if the metal to form the catalyst. The catalysts have high levels of metal dispersion and uniform distribution of catalytically active metals on the support. The catalysts obtained form the processes are particularly effective in catalysing Fischer-Tropsch reactions and as adsorbants for the removal or organosulfur compounds from hydrocarbons.
    Type: Grant
    Filed: November 18, 2003
    Date of Patent: September 8, 2009
    Assignee: ExxonMobil Research and Engineering Company
    Inventors: Andrzel Malek, James Clarke Vartuli, Stuart Leon Soled, Sabato Miseo, Jennifer Schaefer Feeley, Gary L. Casty, Gabor Kiss, Jeffrey M. Dysard, Joseph Ernest Baumgartner, Christine E. Kliewer, Steven T Ragomo
  • Publication number: 20090215271
    Abstract: The invention provides a chemical-mechanical polishing composition comprising a cationic abrasive, a cationic polymer, an inorganic halide salt, and an aqueous carrier. The invention further provides a method of chemically-mechanically polishing a substrate with the aforementioned polishing composition. The polishing composition exhibits selectivity for removal of silicon nitride over removal of silicon oxide and polysilicon.
    Type: Application
    Filed: April 2, 2009
    Publication date: August 27, 2009
    Inventors: Jeffrey M. Dysard, Timothy P. Johns
  • Patent number: 7531105
    Abstract: The invention provides a chemical-mechanical polishing composition comprising a cationic abrasive, a cationic polymer, an inorganic halide salt, and an aqueous carrier. The invention further provides a method of chemically-mechanically polishing a substrate with the aforementioned polishing composition. The polishing composition exhibits selectivity for removal of silicon nitride over removal of silicon oxide and polysilicon.
    Type: Grant
    Filed: December 6, 2005
    Date of Patent: May 12, 2009
    Assignee: Cabot Microelectronics Corporation
    Inventors: Jeffrey M. Dysard, Timothy P. Johns
  • Patent number: 7507327
    Abstract: Refractory or hard sulfur found in a hydrocarbon stream containing refractory sulfur heterocycle compounds, particularly those exhibiting steric hindrance, is removed from the stream by contacting it with a sodium reagent comprising a sodium component, having free sodium, supported on a solid support component. If the hydrocarbon stream contains more labile or easy sulfur, then it is treated, typically by hydrodesulfurization, to remove at least most of the labile sulfur before it is contacted with the sodium reagent. This is useful for bringing the sulfur level of middle distillate fuel streams, such as diesel and jet fuel fractions, down to a level of less than about 10 wppm, employing conventional hydrodesulfurizing catalysts and conditions.
    Type: Grant
    Filed: September 14, 2005
    Date of Patent: March 24, 2009
    Assignee: ExxonMobil Research and Engineering Company
    Inventors: Jeffrey M. Dysard, Zhigou Hou, Jonathan M. McConnachie, Andrzej Malek, Ramesh Gupta, William E. Lewis
  • Publication number: 20080067109
    Abstract: The instant invention relates to a method for producing low-sulfur, low-nitrogen diesel boiling range products involving contacting a diesel boiling range feedstream with an acidic solution to selectively remove heterocyclic nitrogen-containing compounds before hydrotreating.
    Type: Application
    Filed: December 1, 2004
    Publication date: March 20, 2008
    Applicant: EXXONMOBIL RESEARCH AND ENGINEERING COMPANY
    Inventors: Mark A. Greaney, Peter W. Jacobs, John N. Begasse, Jeffrey M. Dysard