Patents by Inventor Jeffrey M. Lauerhaas
Jeffrey M. Lauerhaas has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 10748788Abstract: A system and method for treating a substrate is described. In particular, the system and method for treating a substrate include techniques for removing particles from the surface of a microelectronic substrate. The system includes: a vacuum process chamber; a substrate stage for supporting a microelectronic substrate within the vacuum process chamber; a cryogenic fluid supply system that can provide a fluid or fluid mixture through one or more nozzles arranged within the vacuum process chamber to inject a fluid spray into the process chamber in a direction towards an upper surface of the microelectronic substrate; and a process monitoring system coupled to the vacuum process chamber, and arranged to collect fluid spray data corresponding to at least one measured attribute of the injected fluid spray downstream of an exit of the one or more nozzles.Type: GrantFiled: March 15, 2018Date of Patent: August 18, 2020Assignee: TEL FSI, INC.Inventors: Brent D. Schwab, Chimaobi W. Mbanaso, Gregory P. Thomes, Kevin Rolf, Jeffrey M. Lauerhaas
-
Publication number: 20180269080Abstract: A system and method for treating a substrate is described. In particular, the system and method for treating a substrate include techniques for removing particles from the surface of a microelectronic substrate. The system includes: a vacuum process chamber; a substrate stage for supporting a microelectronic substrate within the vacuum process chamber; a cryogenic fluid supply system that can provide a fluid or fluid mixture through one or more nozzles arranged within the vacuum process chamber to inject a fluid spray into the process chamber in a direction towards an upper surface of the microelectronic substrate; and a process monitoring system coupled to the vacuum process chamber, and arranged to collect fluid spray data corresponding to at least one measured attribute of the injected fluid spray downstream of an exit of the one or more nozzles.Type: ApplicationFiled: March 15, 2018Publication date: September 20, 2018Inventors: Brent D. Schwab, Chimaobi W. Mbanaso, Gregory P. Thomes, Kevin Rolf, Jeffrey M. Lauerhaas
-
Publication number: 20180190517Abstract: An apparatus for cleaning a microelectronic workpiece and a method of operating is described. The apparatus includes a workpiece holding mechanism to support and hold a workpiece, a chemical supply mechanism configured to supply multiple chemical fluids including gas-phase components and liquid-phase components, a dispense mechanism arranged to dispense one or more chemical compositions onto the workpiece, and a valve mechanism fluidically disposed between the chemical supply mechanism and the dispense mechanism. A control circuit is coupled to the valve mechanism, and configured to (i) flow at least one gas-phase chemical component to a first nozzle array and at least one liquid-phase chemical component to a second nozzle array, and (ii) flow at least one gas-phase chemical component from the chemical supply mechanism to the second nozzle array and at least one liquid-phase chemical component from the chemical supply mechanism to the first nozzle array.Type: ApplicationFiled: December 20, 2017Publication date: July 5, 2018Inventors: David DeKraker, Jeffrey M. Lauerhaas, Jeffery W. Butterbaugh, Alan D. Rose
-
Publication number: 20160284535Abstract: A method for stripping material from a microelectronic workpiece is described. The method includes receiving a workpiece having a surface exposing a layer composed of silicon and organic material, and placing the workpiece in a wet clean chamber. In the wet clean chamber, the layer composed of silicon and organic material is removed from the workpiece by exposing the surface of the workpiece to a first stripping agent containing a sulfuric acid composition, and then optionally exposing the surface of the workpiece to a second stripping agent containing dilute hydrofluoric acid (dHF).Type: ApplicationFiled: March 27, 2015Publication date: September 29, 2016Inventors: Jeffrey M. Lauerhaas, Anthony S. Ratkovich, Erik R. Berg, Jeffery W. Butterbaugh, Robert Thomas John Matz, David DeKraker
-
Patent number: 9039840Abstract: Strategies for tool designs and their uses wherein the tools can operate in either closed or open modes of operation. The tools easily transition between open and closed modes on demand. According to one general strategy, environmentally controlled pathway(s) couple the ambient to one or more process chambers. Air amplification capabilities upstream from the process chamber(s) allow substantial flows of air to be introduced into the process chamber(s) on demand. Alternatively, the fluid pathways are easily closed, such as by simple valve actuation, to block egress to the ambient through these pathways. Alternative flows of nonambient fluids can then be introduced into the process chamber(s) via pathways that are at least partially in common with the pathways used for ambient air introduction. In other strategies, gap(s) between moveable components are sealed at least with flowing gas curtains rather than by relying only upon direct physical contact for sealing.Type: GrantFiled: April 1, 2013Date of Patent: May 26, 2015Assignee: TEL FSI, INC.Inventors: Jeffrey M. Lauerhaas, Jimmy D. Collins, Tracy A. Gast, Alan D. Rose
-
Publication number: 20140332034Abstract: A method of treating a substrate comprises removing material from a substrate using a treatment protocol to provide a treated substrate followed by a rinsing step. In the rinsing step at least one stream comprising a rinsing fluid is introduced and water vapor is caused to collide with and atomize the rinsing fluid. The atomized rinsing fluid is caused to rinsingly contact the treated substrate.Type: ApplicationFiled: April 17, 2014Publication date: November 13, 2014Applicant: TEL FSI, Inc.Inventors: Jeffrey M. Lauerhaas, Don Kahaian
-
Patent number: 8871108Abstract: A method of removing carbon materials, preferably amorphous carbon, from a substrate includes dispensing a liquid sulfuric acid composition including sulfuric acid and/or its desiccating species and precursors and having a water/sulfuric acid molar ratio of no greater than 5:1 onto an material coated substrate in an amount effective to substantially uniformly coat the carbon material coated substrate. The liquid sulfuric acid composition is exposed to water vapor in an amount effective to increase the temperature of the liquid sulfuric acid composition above the temperature of the liquid sulfuric acid composition prior to exposure to the water vapor. In preferred embodiments, amorphous carbon is selectively removed as compared to a silicon oxide (e.g., silicon dioxide) and/or silicon nitride.Type: GrantFiled: March 15, 2013Date of Patent: October 28, 2014Assignee: TEL FSI, Inc.Inventor: Jeffrey M. Lauerhaas
-
Publication number: 20140206195Abstract: A method of removing carbon materials, preferably amorphous carbon, from a substrate includes dispensing a liquid sulfuric acid composition including sulfuric acid and/or its desiccating species and precursors and having a water/sulfuric acid molar ratio of no greater than 5:1 onto an material coated substrate in an amount effective to substantially uniformly coat the carbon material coated substrate. The liquid sulfuric acid composition is exposed to water vapor in an amount effective to increase the temperature of the liquid sulfuric acid composition above the temperature of the liquid sulfuric acid composition prior to exposure to the water vapor. In preferred embodiments, amorphous carbon is selectively removed as compared to a silicon oxide (e.g., silicon dioxide) and/or silicon nitride.Type: ApplicationFiled: March 15, 2013Publication date: July 24, 2014Applicant: TEL FSI, Inc.Inventor: Jeffrey M. Lauerhaas
-
Patent number: 8684015Abstract: Strategies for tool designs and their uses wherein the tools can operate in either closed or open modes of operation. The tools easily transition between open and closed modes on demand. According to one general strategy, environmentally controlled pathway(s) couple the ambient to one or more process chambers. Air amplification capabilities upstream from the process chamber(s) allow substantial flows of air to be introduced into the process chamber(s) on demand. Alternatively, the fluid pathways are easily closed, such as by simple valve actuation, to block egress to the ambient through these pathways. Alternative flows of nonambient fluids can then be introduced into the process chamber(s) via pathways that are at least partially in common with the pathways used for ambient air introduction. In other strategies, gap(s) between moveable components are sealed at least with flowing gas curtains rather than by relying only upon direct physical contact for sealing.Type: GrantFiled: July 13, 2012Date of Patent: April 1, 2014Assignee: Tel FSI, Inc.Inventors: Jeffrey M. Lauerhaas, Jimmy D. Collins, Tracy A. Gast, Alan D. Rose
-
Publication number: 20120272893Abstract: Strategies for tool designs and their uses wherein the tools can operate in either closed or open modes of operation. The tools easily transition between open and closed modes on demand. According to one general strategy, environmentally controlled pathway(s) couple the ambient to one or more process chambers. Air amplification capabilities upstream from the process chamber(s) allow substantial flows of air to be introduced into the process chamber(s) on demand. Alternatively, the fluid pathways are easily closed, such as by simple valve actuation, to block egress to the ambient through these pathways. Alternative flows of nonambient fluids can then be introduced into the process chamber(s) via pathways that are at least partially in common with the pathways used for ambient air introduction. In other strategies, gap(s) between moveable components are sealed at least with flowing gas curtains rather than by relying only upon direct physical contact for sealing.Type: ApplicationFiled: July 13, 2012Publication date: November 1, 2012Inventors: Jeffrey M. Lauerhaas, Jimmy D. Collins, Tracy A. Gast, Alan D. Rosa
-
Patent number: 8235062Abstract: Strategies for tool designs and their uses wherein the tools can operate in either closed or open modes of operation. The tools easily transition between open and closed modes on demand. According to one general strategy, environmentally controlled pathway(s) couple the ambient to one or more process chambers. Air amplification capabilities upstream from the process chamber(s) allow substantial flows of air to be introduced into the process chamber(s) on demand. Alternatively, the fluid pathways are easily closed, such as by simple valve actuation, to block egress to the ambient through these pathways. Alternative flows of nonambient fluids can then be introduced into the process chamber(s) via pathways that are at least partially in common with the pathways used for ambient air introduction. In other strategies, gap(s) between moveable components are sealed at least with flowing gas curtains rather than by relying only upon direct physical contact for sealing.Type: GrantFiled: May 5, 2009Date of Patent: August 7, 2012Assignee: FSI International, Inc.Inventors: Jeffrey M. Lauerhaas, Jimmy D. Collins, Tracy A. Gast, Alan D. Rose
-
Publication number: 20090280235Abstract: Strategies for tool designs and their uses wherein the tools can operate in either closed or open modes of operation. The tools easily transition between open and closed modes on demand. According to one general strategy, environmentally controlled pathway(s) couple the ambient to one or more process chambers. Air amplification capabilities upstream from the process chamber(s) allow substantial flows of air to be introduced into the process chamber(s) on demand. Alternatively, the fluid pathways are easily closed, such as by simple valve actuation, to block egress to the ambient through these pathways. Alternative flows of nonambient fluids can then be introduced into the process chamber(s) via pathways that are at least partially in common with the pathways used for ambient air introduction. In other strategies, gap(s) between moveable components are sealed at least with flowing gas curtains rather than by relying only upon direct physical contact for sealing.Type: ApplicationFiled: May 5, 2009Publication date: November 12, 2009Inventors: Jeffrey M. Lauerhaas, Jimmy D. Collins, Tracy A. Gast, Alan D. Rose
-
Patent number: 7100304Abstract: An apparatus for drying a generally flat substrate that has been cleaned has a rotatable support for supporting the substrate, a substrate drying assembly, and a controller. The substrate drying assembly includes a substrate drying assembly support arm, an outlet for applying liquid to an upper surface of the substrate, and an outlet for applying a drying vapor to the upper surface of the substrate. The substrate drying assembly is configured to position the liquid applying outlet and to position the vapor applying outlet above a portion of the substrate. The controller causes the substrate drying assembly to be retracted over the upper surface of the substrate at a faster rate near a center of the substrate than near a periphery of the substrate.Type: GrantFiled: June 10, 2004Date of Patent: September 5, 2006Assignee: Akrion Technologies, Inc.Inventors: Jeffrey M. Lauerhaas, Thomas J. Nicolosi, Jr., Paul Mertens, William Fyen
-
Patent number: 6928751Abstract: An apparatus includes a rotatable chuck for supporting a substrate and a splash guard. The splash guard surrounds the chuck and surrounds a substrate mounted on the chuck. The splash guard has a portion that deflects fluid being flung off the substrate by centrifugal action in a manner so as to not splash back onto the substrate. The splash guard is moveable between a process position in which the upper annular edge of the splash guard extends above the chuck and a substrate on the chuck, and a load/unload position in which the splash guard is tilted so that one side of the upper annular edge is below an upper edge of the chuck. The movement of the splash guard facilitates loading and unloading of a substrate.Type: GrantFiled: June 12, 2002Date of Patent: August 16, 2005Assignees: Goldfinger Technologies, LLC, Interuniversitair Microelektronica Centrum (IMEC)Inventors: Chad M. Hosack, Jeffrey M. Lauerhaas, Mario E. Bran, Raoul Standt, Paul Patel, Yi Wu, Geert Doumen, Paul Mertens
-
Publication number: 20040231188Abstract: An apparatus for drying a generally flat substrate that has been cleaned has a rotatable support for supporting the substrate, a substrate drying assembly, and a controller. The substrate drying assembly includes a substrate drying assembly support arm, an outlet for applying liquid to an upper surface of the substrate, and an outlet for applying a drying vapor to the upper surface of the substrate. The substrate drying assembly is configured to position the liquid applying outlet and to position the vapor applying outlet above a portion of the substrate. The controller causes the substrate drying assembly to be retracted over the upper surface of the substrate at a faster rate near a center of the substrate than near a periphery of the substrate.Type: ApplicationFiled: June 10, 2004Publication date: November 25, 2004Inventors: Jeffrey M. Lauerhaas, Thomas J. Nicolosi, Paul Mertens, William Fyen
-
Publication number: 20040221473Abstract: An apparatus for drying a generally flat substrate that has been cleaned has a rotatable support for supporting the substrate, a substrate drying assembly, and a controller. The substrate drying assembly includes a substrate drying assembly support arm, an outlet for applying liquid to an upper surface of the substrate, and an outlet for applying a drying vapor to the upper surface of the substrate. The substrate drying assembly is configured to position the liquid applying outlet and to position the vapor applying outlet above a portion of the substrate. The controller causes the substrate drying assembly to be retracted over the upper surface of the substrate at a faster rate near a center of the substrate than near a periphery of the substrate.Type: ApplicationFiled: June 10, 2004Publication date: November 11, 2004Inventors: Jeffrey M. Lauerhaas, Thomas J. Nicolosi, Paul Mertens, William Fyen
-
Patent number: 6754980Abstract: An apparatus for drying a generally flat substrate that has been cleaned has a rotatable support for supporting the substrate, a substrate drying assembly, and a controller. The substrate drying assembly includes a substrate drying assembly support arm, an outlet for applying liquid to an upper surface of the substrate, and an outlet for applying a drying vapor to the upper surface of the substrate. The substrate drying assembly is configured to position the liquid applying outlet and to position the vapor applying outlet above a portion of the substrate. The controller causes the substrate drying assembly to be retracted over the upper surface of the substrate at a faster rate near a center of the substrate than near a periphery of the substrate.Type: GrantFiled: June 12, 2002Date of Patent: June 29, 2004Assignee: Goldfinger Technologies, LLCInventors: Jeffrey M. Lauerhaas, Thomas J. Nicolosi, Jr., Paul Mertens, William Fyen
-
Publication number: 20020185154Abstract: An apparatus includes a rotatable chuck for supporting a substrate and a splash guard. The splash guard surrounds the chuck and surrounds a substrate mounted on the chuck. The splash guard has a portion that deflects fluid being flung off the substrate by centrifugal action in a manner so as to not splash back onto the substrate. The splash guard is moveable between a process position in which the upper annular edge of the splash guard extends above the chuck and a substrate on the chuck, and a load/unload position in which the splash guard is tilted so that one side of the upper annular edge is below an upper edge of the chuck. The movement of the splash guard facilitates loading and unloading of a substrate.Type: ApplicationFiled: June 12, 2002Publication date: December 12, 2002Inventors: Chad M. Hosack, Jeffrey M. Lauerhaas, Mario E. Bran, Raoul Standt, Pankaj T. Patel, Yi Wu, Geert Doumen, Paul Mertens
-
Publication number: 20020185152Abstract: An apparatus for drying a generally flat substrate that has been cleaned has a rotatable support for supporting the substrate, a substrate drying assembly, and a controller. The substrate drying assembly includes a substrate drying assembly support arm, an outlet for applying liquid to an upper surface of the substrate, and an outlet for applying a drying vapor to the upper surface of the substrate. The substrate drying assembly is configured to position the liquid applying outlet and to position the vapor applying outlet above a portion of the substrate. The controller causes the substrate drying assembly to be retracted over the upper surface of the substrate at a faster rate near a center of the substrate than near a periphery of the substrate.Type: ApplicationFiled: June 12, 2002Publication date: December 12, 2002Inventors: Jeffrey M. Lauerhaas, Thomas J. Nicolosi, Paul Mertens, William Fyen