Abstract: A method for forming an electrical interconnect on an integrated lead suspension or suspension component of the type having a stainless steel layer, a conductive lead layer and an insulator layer separating the stainless steel and conductive lead layers. An aperture is formed through only the insulator layer to expose the stainless steel layer at an interconnect site. An interconnect mask is applied around the interconnect site. A first conductive material is electroplated onto the stainless steel layer at the interconnect site to form a plated interconnect between the spring metal layer and the conductive lead layer. The mask is then removed. An electrical interconnect between the stainless steel and conductive lead layers including an aperture only through the insulator layer and an electroplated conductive material interconnect extending between both the spring metal layer and the conductive lead layer.