Patents by Inventor Jeffrey Michael Kowalski

Jeffrey Michael Kowalski has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System for and method of microwave annealing semiconductor material
    Patent number: 7928021
    Abstract: A system for and method of processing, i.e., annealing semiconductor materials. By controlling the time, frequency, variance of frequency, microwave power density, wafer boundary conditions, ambient conditions, and temperatures (including ramp rates), it is possible to repair localized damage lattices of the crystalline structure of a semiconductor material that may occur during the ion implantation of impurities into the material, electrically activate the implanted dopant, and substantially minimize further diffusion of the dopant into the silicon. The wafer boundary conditions may be controlled by utilizing susceptor plates (4) or a water chill plate (12). Ambient conditions may be controlled by gas injection (10) within the microwave chamber (3).
    Type: Grant
    Filed: September 17, 2008
    Date of Patent: April 19, 2011
    Assignee: DSGI, Inc.
    Inventors: Jeffrey Michael Kowalski, Jeffrey Edward Kowalski
  • SYSTEM FOR AND METHOD OF MICROWAVE ANNEALING SEMICONDUCTOR MATERIAL
    Publication number: 20090184399
    Abstract: A system for and method of processing, i.e., annealing semiconductor materials. By controlling the time, frequency, variance of frequency, microwave power density, wafer boundary conditions, ambient conditions, and temperatures (including ramp rates), it is possible to repair localized damage lattices of the crystalline structure of a semiconductor material that may occur during the ion implantation of impurities into the material, electrically activate the implanted dopant, and substantially minimize further diffusion of the dopant into the silicon. The wafer boundary conditions may be controlled by utilizing susceptor plates (4) or a water chill plate (12). Ambient conditions may be controlled by gas injection (10) within the microwave chamber (3).
    Type: Application
    Filed: September 17, 2008
    Publication date: July 23, 2009
    Inventors: Jeffrey Michael Kowalski, Jeffrey Edward Kowalski