Abstract: The arrangement and method for sputtering material onto a workpiece and cleaning a target of the sputtering chamber includes exposing a target to an electromagnetic field of a strength sufficient to remove particles from the target. The electromagnetic field is generated by an electromagnetic device that is positioned in proximity to the target and generates a strength greater than a strength of a cathode magnetic field behind the target to safely remove the contaminating particulates from the target, which may be made of a strong magnetic material.

Abstract: A method of forming a layer of a magnetic material with radially oriented magnetic anisotropy, comprising sequential steps of providing a circular, annular disk-shaped substrate having an inner diameter and an outer diameter, forming a layer of a magnetic material with non-radially oriented magnetic anisotropy over at least one surface of the substrate, and re-orienting the magnetic anisotropy in a radial direction. Preferably, the re-orientation is performed magnetically and the radially oriented layer serves as a magnetically soft underlayer (SUL) of a magnetic recording medium. Also disclosed is a multi-chamber apparatus for performing the disclosed process.

Abstract: A system and methods are provided for calibrating timing in a remote device to timing in a source device. The source device dictates timing signals to be generated in the remote device. A calibration routine is processed to calibrate timing in the remote device to timing in the source device. The source device provides a reference signal that dictates a period of time to the remote device. The remote device tracks a number of local clock cycles generated for the duration of the dictated period of time. The remote device then establishes a time base for translating a number of clock cycles dictated by the source device to a number of clock cycles generated within the remote device.

Abstract: A method for treating/processing substrates/workpieces in a multi-chamber treatment/processing apparatus, comprising: providing a multi-chamber treatment/processing apparatus comprising at least a pair of operatively interconnected upstream and downstream treatment/processing chambers; providing each of the chambers with at least one substrate/workpiece; treating/processing the at least one substrate/workpiece positioned in each of the chambers; evacuating process gas from each of the chambers during or upon completion of the treating/processing of the at least one substrate/workpiece positioned therein; removing the at least one substrate/workpiece from the downstream treatment/processing chamber and initiating transport of the at least one substrate/workpiece from the upstream treatment/processing chamber to the downstream treatment/processing chamber, comprising initiating a flow of the process gas to the evacuated downstream treatment/processing chamber prior to completion of transport of the substrate/wo

Abstract: A method of treating or processing at least one substrate/workpiece in a plasma comprises steps of: (a) providing an apparatus comprising a chamber defining an interior space; (b) mounting/positioning at least one substrate/workpiece in the interior space; (c) injecting gas(es) into the interior space by means of an electrically isolated gas supply means having at least one outlet orifice; (d) generating a plasma in the interior space; (e) applying a bias potential to the gas supply means to suppress plasma formation at the at least one outlet orifice; and (f) treating/processing the at least one substrate/workpiece in the plasma.

Abstract: A method of forming a uniform thickness layer of a selected material on a surface of a substrate comprises steps of: (a) providing a multi-stage cathode sputtering apparatus comprising a group of spaced-apart cathode/target assemblies and a means for transporting at least one substrate/workpiece past each cathode/target assembly, each cathode/target assembly comprising a sputtering surface oriented substantially parallel to the first surface of the substrate during transport past the group of cathode/target assemblies, the group of cathode/target assemblies adapted for providing different angular sputtered film thickness profiles; and (b) transporting the substrate past each cathode/target assembly while providing different sputtered film thickness profiles from at least some of the cathode/target assemblies, such that a plurality of sub-layers is deposited on the surface of the substrate/workpiece which collectively form a uniform thickness layer of the selected material.

Abstract: A method of manufacturing magnetic recording media, comprising sequential steps of: (a) providing an apparatus for manufacturing the media; (b) supplying the apparatus with at least one substrate for the media; (c) forming a magnetic recording layer on the at least one substrate in a first portion of the apparatus, the magnetic recording layer including a surface; (d) treating the surface of the magnetic recording layer with an ionized oxygen-containing plasma in a second portion of the apparatus to form a plasma oxidized surface layer; and (e) forming a protective overcoat layer on the plasma oxidized surface layer of the magnetic recording layer in a third portion of the apparatus.

Abstract: Stepped rotary motion is imparted to the rotor of a stepping motor by alternately driving at least first and second coils which interact with a plurality of magnetic poles on the rotor. When each of the coils transitions from a driven to a non-driven state, the continued motion of the rotor causes a back electro-motive force to be generated in the coil. The electro-motive forces produced by the coils are rectified, integrated, and then compared with a threshold to determine if a motor stall condition exists.

Abstract: In one embodiment, the invention involves a method for controlling a stepper motor. The method includes creating an information set that defines a first acceleration profile of a stepper motor and a first deceleration profile of the stepper motor; and directing the stepper motor to follow either a second acceleration profile or a second deceleration profile after the stepper motor begins to follow either the first acceleration profile or the first deceleration profile. In another embodiment, the invention is a stepper motor controller that includes a circuit configured to store an information set that defines a first acceleration profile of a stepper motor and a first deceleration profile of the stepper motor; and direct the stepper motor to follow either a second acceleration profile or a second deceleration profile after the stepper motor begins to follow either the first acceleration profile or the first deceleration profile.

Abstract: In one embodiment, the invention involves a method for controlling a stepper motor. The method includes creating an information set that defines a first acceleration profile of a stepper motor and a first deceleration profile of the stepper motor; and directing the stepper motor to follow either a second acceleration profile or a second deceleration profile after the stepper motor begins to follow either the first acceleration profile or the first deceleration profile. In another embodiment, the invention is a stepper motor controller that includes a circuit configured to store an information set that defines a first acceleration profile of a stepper motor and a first deceleration profile of the stepper motor; and direct the stepper motor to follow either a second acceleration profile or a second deceleration profile after the stepper motor begins to follow either the first acceleration profile or the first deceleration profile.

Abstract: Stepped rotary motion is imparted to the rotor of a stepping motor by alternately driving at least first and second coils which interact with a plurality of magnetic poles on the rotor. When each of the coils transitions from a driven to a non-driven state, the continued motion of the rotor causes a back electro-motive force to be generated in the coil. The electro-motive forces produced by the coils are rectified, integrated, and then compared with a threshold to determine if a motor stall condition exists.

Abstract: A system and methods are provided for calibrating timing in a remote device to timing in a source device. The source device dictates timing signals to be generated in the remote device. A calibration routine is processed to calibrate timing in the remote device to timing in the source device. The source device provides a reference signal that dictates a period of time to the remote device. The remote device tracks a number of local clock cycles generated for the duration of the dictated period of time. The remote device then establishes a time base for translating a number of clock cycles dictated by the source device to a number of clock cycles generated within the remote device.