Abstract: Nickel salicide processing is implemented by forming a non-stoicheiometric mediating layer, such as ozonated SiOx, to control the reaction of Ni and Si during annealing to form a NiSi layer on the polysilicon gate electrodes and source/drain regions without conductive bridging between the metal silicide layer on the gate electrode and the metal silicide layers on associated source/drain regions. Embodiments of the present invention comprise forming silicon nitride sidewall spacers on the side surfaces of the gate electrode.

Abstract: An improved silicon nitride etch bath system is provided. The improved etch bath system includes a silicon dioxide condensing system formed of a heat exchanger and a secondary filter. The heat exchanger is provided for removing a small portion of phosphoric acid from an etching bath and for cooling of the same. The secondary filter is used for extracting silicon dioxide particles in the small portion of the phosphoric acid and is operatively connected to the heat exchanger before returning the same to the etching bath. In this manner, the concentration of silicon dioxide in the etching bath will be prevented from being saturated.

Abstract: A method and system for preventing a source of ultra-purified water from being contaminated with chemicals includes a source of ultra-purified water and a reservoir containing a chemical source. The reservoir has a chemical delivery valve and a chemical outlet pipe coupled to a chemical delivery line for supplying chemicals to a process chamber during a chemical delivery mode of operation. A first controllable inlet valve has its outlet coupled to the chemical delivery line and the source of ultra-purified water for supplying the ultra-purified water from the source of ultra-purified water to the process chamber during a flushing mode of operation. A second controllable inlet valve has an outlet coupled to the inlet of the first controllable inlet valve and an inlet coupled to the source of ultra-purified water. A source of gas under pressure is coupled between the outlet of the second controllable inlet valve and the inlet of said first controllable inlet valve for creating a virtual air gap.

Abstract: A handler attachment device used for loading and unloading of wafer cassettes into and out of a spray processing tool is comprised of a rectangularly-shaped main body member, two U-shaped gripping members, and two L-shaped bracket members all interconnected together. The main body member includes a narrow middle section and opposed first and second end sections having angled mounting areas disposed therein. The two U-shaped gripping members are mounted to the corresponding first and second mounting areas on the body member. The two L-shaped bracket members are mounted to opposed side edges of the body member for engaging with the wafer cassette. The U-shaped gripping members are grasped by the corresponding hands of an operator in a manner so as to reduce and minimize fatigue and stress to his hands, wrists and arms.

Abstract: A method and apparatus for wetting, flushing and performing integrity checks on encapsulated PTFE filters includes an integral filter housing (112) encapsulating a PTFE filter (114) therein. The filter housing has an inlet pipe (116), a filter outlet pipe (118), and a vent pipe (122). First controllable inlet valve (126) is coupled to the inlet pipe of the filter housing for supplying a solvent solution to pre-wet the encapsulated PTFE filter. A second controllable inlet valve (117) is also coupled to the inlet pipe of the filter housing for supplying gas from a source under pressure to check the integrity of the pre-wetted PTFE filter. A third controllable inlet valve (119) is also coupled to the inlet pipe of the filter housing for supplying a source of water to flush the pre-wetted filter after checking its integrity.