Abstract: An electrosurgical unit configured to regulate a RF input signal applied to an electrosurgical device, the electrosurgical unit including a PWM circuit to produce a DC voltage responsive to a control signal; an RF waveform generator configured to generate an RF waveform based at least in part on the DC voltage; a transformer configured to transform the RF waveform to the RF input signal in a forward direction across the isolation barrier and transform a leakage current to a feedback current in a reverse direction across the isolation barrier; and a control circuit configured to generate the control signal based at least in part on the first input signal and the second input signal, the control signal controlling a pulse width modulation of the PWM circuit to produce the RF input signal.

Abstract: An electrosurgical unit having power monitoring circuitry for reducing leakage current in an electrosurgical unit. The electrosurgical unit includes a power source configured to produce direct current, an RF waveform generator configured to convert the direct current into an RF signal, a voltage sensor configured to measure DC input voltage to the RF waveform generator, a current sensor configured to measure output current feedback, and a processor. The processor is configured to estimate output voltage feedback based at least upon the measured DC input voltage and the measured output current feedback, and output a control signal to control the DC input voltage to the RF waveform generator, the control signal based at least upon the estimated output voltage and the output current feedback.

Abstract: An electrosurgical unit having power monitoring circuitry for reducing leakage current in an electrosurgical unit. The electrosurgical unit includes a power source configured to produce direct current, an RF waveform generator configured to convert the direct current into an RF signal, a voltage sensor configured to measure DC input voltage to the RF waveform generator, a current sensor configured to measure output current feedback, and a processor. The processor is configured to estimate output voltage feedback based at least upon the measured DC input voltage and the measured output current feedback, and output a control signal to control the DC input voltage to the RF waveform generator, the control signal based at least upon the estimated output voltage and the output current feedback.

Abstract: An electrosurgical unit having power monitoring circuitry for reducing leakage current in an electrosurgical unit. The electrosurgical unit includes a power source configured to produce direct current, an RF waveform generator configured to convert the direct current into an RF signal, a voltage sensor configured to measure DC input voltage to the RF waveform generator, a current sensor configured to measure output current feedback, and a processor. The processor is configured to estimate output voltage feedback based at least upon the measured DC input voltage and the measured output current feedback, and output a control signal to control the DC input voltage to the RF waveform generator, the control signal based at least upon the estimated output voltage and the output current feedback.

Abstract: An electrosurgical unit having power monitoring circuitry for reducing leakage current in an electrosurgical unit. The electrosurgical unit includes a power source configured to produce direct current, an RF waveform generator configured to convert the direct current into an RF signal, a voltage sensor configured to measure DC input voltage to the RF waveform generator, a current sensor configured to measure output current feedback, and a processor. The processor is configured to estimate output voltage feedback based at least upon the measured DC input voltage and the measured output current feedback, and output a control signal to control the DC input voltage to the RF waveform generator, the control signal based at least upon the estimated output voltage and the output current feedback.