Patents by Inventor Jeffrey Sercel

Jeffrey Sercel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070298587
    Abstract: A lift off process is used to separate a layer of material from a substrate by irradiating an interface between the layer of material and the substrate. According to one exemplary process, the layer is separated into a plurality of sections corresponding to dies on the substrate and a homogeneous beam spot is shaped to cover an integer number of the sections.
    Type: Application
    Filed: June 13, 2007
    Publication date: December 27, 2007
    Applicant: J.P. SERCEL ASSOCIATES INC.
    Inventors: Jongkook Park, Jeffrey Sercel, Patrick Sercel
  • Publication number: 20070017908
    Abstract: A laser machining system and method uses a shaped laser beam, such as a long, narrow beam, and effectively scans the beam in the narrow direction across a mask having an aperture pattern. The pattern on the mask is imaged onto a moving workpiece and the patterned laser beam selectively removes material from the workpiece. The workpiece may be moved using a coordinated synchronized rotational motion. The laser may use a longer wavelength (e.g., 248 nm) and the beam may be scanned at a high rate of speed to reduce the dissipation of the residual thermal energy in the material being machined. In one embodiment, this system and method may be used to machine a complex pattern into a curved surface with relatively high resolution and high speeds.
    Type: Application
    Filed: August 2, 2005
    Publication date: January 25, 2007
    Inventors: Patrick Sercel, Jeffrey Sercel
  • Publication number: 20060003553
    Abstract: A lift off process is used to separate a layer of material from a substrate by irradiating an interface between the layer of material and the substrate. According to one exemplary process, the layer is separated into a plurality of sections corresponding to dies on the substrate and a homogeneous beam spot is shaped to cover an integer number of the sections.
    Type: Application
    Filed: August 30, 2005
    Publication date: January 5, 2006
    Inventors: Jongkook Park, Jeffrey Sercel, Patrick Sercel
  • Publication number: 20050227455
    Abstract: A lift off process is used to separate a layer of material from a substrate by irradiating an interface between the layer of material and the substrate. According to one exemplary process, the layer is separated into a plurality of sections corresponding to dies on the substrate and a homogeneous beam spot is shaped to cover an integer number of the sections.
    Type: Application
    Filed: December 9, 2004
    Publication date: October 13, 2005
    Inventors: Jongkook Park, Jeffrey Sercel, Patrick Sercel