Patents by Inventor Jeffrey Thomas Wetzel

Jeffrey Thomas Wetzel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Dual in-laid integrated circuit structure with selectively positioned low-K dielectric isolation and method of formation
    Patent number: 6143646
    Abstract: A method for forming a dual inlaid contact structure (damascene) begins by etching dual inlaid contact structures (32, 34, and 36). Masking layers (28) are (228) and the deposition of low-K dielectric material 26 is used to selectively form low-K regions (30) only in critical areas where low-K dielectric material is absolutely needed. Other portions of the wafer remain covered with conventional oxide (24) so that adverse impacts of low-K dielectric material is minimized. Conductive material (38, 40, and 42) is then formed to complete dual inlaid contact structures whereby low-K dielectric plugs (30) reduce cross talk and capacitance within the final structure.
    Type: Grant
    Filed: June 3, 1997
    Date of Patent: November 7, 2000
    Assignee: Motorola Inc.
    Inventor: Jeffrey Thomas Wetzel