Patents by Inventor Jeffrey Varner

Jeffrey Varner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220348644
    Abstract: The present invention relates to an isolated chimeric molecule comprising a degradation domain including a eukaryotic U-box motif and a targeting domain capable of immunospecifically directing the degradation domain to a substrate where the targeting domain is heterologous to the degradation domain. A linker couples the degradation domain to the targeting domain. Also disclosed are compositions as well as methods of treating a disease, substrate silencing, screening agents for therapeutic efficacy against a disease, and methods of screening for disease biomarkers.
    Type: Application
    Filed: November 23, 2021
    Publication date: November 3, 2022
    Inventors: Matthew DELISA, Jeffrey VARNER, Alyse PORTNOFF
  • Patent number: 11192942
    Abstract: The present invention relates to an isolated chimeric molecule comprising a degradation domain including a eukaryotic U-box motif and a targeting domain capable of immunospecifically directing the degradation domain to a substrate where the targeting domain is heterologous to the degradation domain. A linker couples the degradation domain to the targeting domain. Also disclosed are compositions as well as methods of treating a disease, substrate silencing, screening agents for therapeutic efficacy against a disease, and methods of screening for disease biomarkers.
    Type: Grant
    Filed: April 9, 2019
    Date of Patent: December 7, 2021
    Assignee: Cornell University
    Inventors: Matthew DeLisa, Jeffrey Varner, Alyse Portnoff
  • Publication number: 20190233507
    Abstract: The present invention relates to an isolated chimeric molecule comprising a degradation domain including a eukaryotic U-box motif and a targeting domain capable of immunospecifically directing the degradation domain to a substrate where the targeting domain is heterologous to the degradation domain. A linker couples the degradation domain to the targeting domain. Also disclosed are compositions as well as methods of treating a disease, substrate silencing, screening agents for therapeutic efficacy against a disease, and methods of screening for disease biomarkers.
    Type: Application
    Filed: April 9, 2019
    Publication date: August 1, 2019
    Inventors: Matthew DeLisa, Jeffrey Varner, Alyse Portnoff
  • Publication number: 20140112922
    Abstract: The present invention relates to an isolated chimeric molecule comprising a degradation domain including a eukaryotic U-box motif and a targeting domain capable of immuno specifically directing the degradation domain to a substrate where the targeting domain is heterologous to the degradation domain. A linker couples the degradation domain to the targeting domain. Also disclosed are compositions as well as methods of treating a disease, substrate silencing, screening agents for therapeutic efficacy against a disease, and methods of screening for disease biomarkers.
    Type: Application
    Filed: March 28, 2012
    Publication date: April 24, 2014
    Applicant: CORNELL UNIVERSITY
    Inventors: Matthew Delisa, Jeffrey Varner, Alyse Portnoff
  • Patent number: 5847959
    Abstract: An electron beam pattern generating system for exposing a pattern on a substrate using a raster scan method. The system stores a rasterized representation of the pattern as a plurality of regular pixel dose exposure levels. These pixel dose exposure levels are evaluated by the system for one or more proximity effects and corrections to the dose exposure level and/or pixel location are calculated. The system includes apparatus for both calculation and storage of intermediate and final results as required. As they are calculated, the corrections are provided to an exposure dose modulator wherein they are applied to forming the pattern. Thus corrections for both long range and short range proximity effects due to both electron scattering and heating as well as for proximity effects due to global thermal expansion can be calculated and provided during run-time and a corrected pattern exposed.
    Type: Grant
    Filed: January 28, 1997
    Date of Patent: December 8, 1998
    Assignee: Etec Systems, Inc.
    Inventors: Lee H. Veneklasen, Robert Innes, Sergey Babin, David Trost, Jeffrey Varner