Patents by Inventor Jeffrey W. McKown

Jeffrey W. McKown has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • HF etching and oxide scale removal
    Patent number: 6670281
    Abstract: Methods for etching or removing oxide scale from a substrate by applying a composition containing a polymer and an effective amount of hydrofluoric acid and maintaining the composition on the substrate until the substrate is etched or the oxide scale is removed.
    Type: Grant
    Filed: December 30, 1998
    Date of Patent: December 30, 2003
    Assignee: Honeywell International Inc.
    Inventors: Matthew H. Luly, Rajiv R. Singh, Charles L. Redmon, Jeffrey W. McKown, Robert Pratt
  • HF ETCHING AND OXIDE SCALE REMOVAL
    Publication number: 20020063106
    Abstract: Methods for etching or removing oxide scale from a substrate by applying a composition containing a polymer and an effective amount of hydrofluoric acid and maintaining the composition on the substrate until the substrate is etched or the oxide scale is removed.
    Type: Application
    Filed: December 30, 1998
    Publication date: May 30, 2002
    Inventors: MATTHEW H. LULY, RAJIV R. SINGH, CHARLES L. REDMON, JEFFREY W. MCKOWN, ROBERT PRATT