Patents by Inventor Jeffrey Winfield Scott
Jeffrey Winfield Scott has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240112882Abstract: A charged particle buncher includes a series of spaced apart electrodes arranged to generate a shaped electric field. The series includes a first electrode, a last electrode and one- or more intermediate electrodes. The charged particle buncher includes a waveform device attached to the electrodes and configured to apply a periodic potential waveform to each electrode independently in a manner so as to form a quasi-electrostatic time varying potential gradient between adjacent electrodes and to cause spatial distribution of charged particles that form a plurality of nodes and antinodes. The nodes have a charged particle density and the antinodes have substantially no charged particle density, and the nodes and the antinodes are formed from a charged particle beam configured to hit the target.Type: ApplicationFiled: June 12, 2023Publication date: April 4, 2024Inventors: Mark Joseph Bennahmias, Michael John Zani, Jeffrey Winfield Scott
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Patent number: 11699568Abstract: A charged particle buncher includes a series of spaced apart electrodes arranged to generate a shaped electric field. The series includes a first electrode, a last electrode and one or more intermediate electrodes. The charged particle buncher includes a waveform device attached to the electrodes and configured to apply a periodic potential waveform to each electrode independently in a manner so as to form a quasi-electrostatic time varying potential gradient between adjacent electrodes and to cause spatial distribution of charged particles that form a plurality of nodes and antinodes. The nodes have a charged particle density and the antinodes have substantially no charged particle density, and the nodes and the antinodes are formed from a charged particle beam configured to hit the target.Type: GrantFiled: April 19, 2022Date of Patent: July 11, 2023Assignee: NextGen Semi Holding, Inc.Inventors: Mark Joseph Bennahmias, Michael John Zani, Jeffrey Winfield Scott
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Patent number: 11605522Abstract: A charged particle buncher includes a series of spaced apart electrodes arranged to generate a shaped electric field. The series includes a first electrode, a last electrode and one or more intermediate electrodes. The charged particle buncher includes a waveform device attached to the electrodes and configured to apply a periodic potential waveform to each electrode independently in a manner so as to form a quasi-electrostatic time varying potential gradient between adjacent electrodes and to cause spatial distribution of charged particles that form a plurality of nodes and antinodes. The nodes have a charged particle density and the antinodes have substantially no charged particle density, and the nodes and the antinodes are formed from a charged particle beam with an energy less than or equal to 500 keV.Type: GrantFiled: February 14, 2020Date of Patent: March 14, 2023Assignee: NexGen Semi Holding, Inc.Inventors: Mark Joseph Bennahmias, Michael John Zani, Jeffrey Winfield Scott
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Publication number: 20220254603Abstract: A charged particle buncher includes a series of spaced apart electrodes arranged to generate a shaped electric field. The series includes a first electrode, a last electrode and one or more intermediate electrodes. The charged particle buncher includes a waveform device attached to the electrodes and configured to apply a periodic potential waveform to each electrode independently in a manner so as to form a quasi-electrostatic time varying potential gradient between adjacent electrodes and to cause spatial distribution of charged particles that form a plurality of nodes and antinodes. The nodes have a charged particle density and the antinodes have substantially no charged particle density, and the nodes and the antinodes are formed from a charged particle beam configured to hit the target.Type: ApplicationFiled: April 19, 2022Publication date: August 11, 2022Inventors: Mark Joseph Bennahmias, Michael John Zani, Jeffrey Winfield Scott
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Patent number: 11335537Abstract: A charged particle buncher includes a series of spaced apart electrodes arranged to generate a shaped electric-field. The series includes a first electrode, a last electrode and one or more intermediate electrodes. The charged particle buncher includes a waveform device attached to the electrodes and configured to apply a periodic potential waveform to each electrode independently in a manner so as to form a quasi-electrostatic time varying potential gradient between adjacent electrodes and to cause spatial distribution of charged particles that form a plurality of nodes and antinodes. The nodes have a charged particle density and the antinodes have substantially no charged particle density, and the nodes and the antinodes are formed from a charged particle beam with an energy greater than 500 keV.Type: GrantFiled: April 5, 2021Date of Patent: May 17, 2022Assignee: NexGen Semi Holding, Inc.Inventors: Mark Joseph Bennahmias, Michael John Zani, Jeffrey Winfield Scott
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Publication number: 20220059319Abstract: A charged particle buncher includes a series of spaced apart electrodes arranged to generate a shaped electric-field. The series includes a first electrode, a last electrode and one or more intermediate electrodes. The charged particle buncher includes a waveform device attached to the electrodes and configured to apply a periodic potential waveform to each electrode independently in a manner so as to form a quasi-electrostatic time varying potential gradient between adjacent electrodes and to cause spatial distribution of charged particles that form a plurality of nodes and antinodes. The nodes have a charged particle density and the antinodes have substantially no charged particle density, and the nodes and the antinodes are formed from a charged particle beam with an energy greater than 500 keV.Type: ApplicationFiled: April 5, 2021Publication date: February 24, 2022Inventors: Mark Joseph Bennahmias, Michael John Zani, Jeffrey Winfield Scott
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Patent number: 10991545Abstract: A charged particle buncher includes a series of spaced apart electrodes arranged to generate a shaped electric field. The series includes a first electrode, a last electrode and one or more intermediate electrodes. The charged particle buncher includes a waveform device attached to the electrodes and configured to apply a periodic potential waveform to each electrode independently in a manner so as to form a quasi-electrostatic time varying potential gradient between adjacent electrodes and to cause spatial distribution of charged particles that form a plurality of nodes and antinodes. The nodes have a charged particle density and the antinodes have substantially no charged particle density, and the nodes and the antinodes are formed from a charged particle beam with an energy greater than 500 keV.Type: GrantFiled: August 5, 2019Date of Patent: April 27, 2021Assignee: NexGen Semi Holding, Inc.Inventors: Mark Joseph Bennahmias, Michael John Zani, Jeffrey Winfield Scott
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Patent number: 10566169Abstract: A charged particle buncher includes a series of spaced apart electrodes arranged to generate a shaped electric field. The series includes a first electrode, a last electrode and one or more intermediate electrodes. The charged particle buncher includes a waveform device attached to the electrodes and configured to apply a periodic potential waveform to each electrode independently in a manner so as to form a quasi-electrostatic time varying potential gradient between adjacent electrodes and to cause spatial distribution of charged particles that form a plurality of nodes and antinodes. The nodes have a charged particle density and the antinodes have substantially no charged particle density, and the nodes and the antinodes are formed from a charged particle beam with an energy less than or equal to 500 keV.Type: GrantFiled: June 30, 2009Date of Patent: February 18, 2020Assignee: NexGen Semi Holding, Inc.Inventors: Mark Joseph Bennahmias, Michael John Zani, Jeffrey Winfield Scott
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Publication number: 20200035452Abstract: A charged particle buncher includes a series of spaced apart electrodes arranged to generate a shaped electric field. The series includes a first electrode, a last electrode and one or more intermediate electrodes. The charged particle buncher includes a waveform device attached to the electrodes and configured to apply a periodic potential waveform to each electrode independently in a manner so as to form a quasi-electrostatic time varying potential gradient between adjacent electrodes and to cause spatial distribution of charged particles that form a plurality of nodes and antinodes. The nodes have a charged particle density and the antinodes have substantially no charged particle density, and the nodes and the antinodes are formed from a charged particle beam with an energy greater than 500 keV.Type: ApplicationFiled: August 5, 2019Publication date: January 30, 2020Inventors: Mark Joseph Bennahmias, Michael John Zani, Jeffrey Winfield Scott
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Patent number: 8658994Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.Type: GrantFiled: January 20, 2012Date of Patent: February 25, 2014Assignee: Nexgen Semi Holding, Inc.Inventors: Michael John Zani, Mark Joseph Bennahmias, Jeffrey Winfield Scott
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Patent number: 8502271Abstract: A barrier-type photo-detector is provided with a Barrier between first and second layers. One of the layers is delineated into pixels without fully removing the non-pixel portions of the delineated layer. Delineation may be accomplished through material modification techniques such as ion damage, selective doping, ion induced disordering or layer material growth. Some variations may employ partial material removal techniques.Type: GrantFiled: October 22, 2010Date of Patent: August 6, 2013Assignee: Lockheed Martin CorporationInventor: Jeffrey Winfield Scott
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Patent number: 8409984Abstract: Certain embodiments disclosed herein relate to the formation of multi-component oxide heterostructures (MCOH) using surface nucleation to pattern the atomic layer deposition (ALD) of perovskite material followed by patterned etch and metallization to produce ultra-high density MCOH nano-electronic devices. Applications include ultra-high density MCOH memory and logic, as well as electronic functionality based on single electrons, for example a novel flash memory cell Floating-Gate (FG) transistor with LaAlO3 as a gate tunneling dielectric. Other types of memory devices (DIMMS, DRAM, and DDR) made with patterned ALD of LaAlO3 as a gate dielectric are also possible.Type: GrantFiled: June 10, 2010Date of Patent: April 2, 2013Assignee: NexGen Semi Holding, Inc.Inventors: Mark Joseph Bennahmias, Michael John Zani, Jeffrey Winfield Scott
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Publication number: 20120112323Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.Type: ApplicationFiled: January 20, 2012Publication date: May 10, 2012Applicant: NEXGEN SEMI HOLDING, INC.Inventors: Michael John Zani, Mark Joseph Bennahmias, Mark Anthony Mayse, Jeffrey Winfield Scott
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Publication number: 20110065237Abstract: Certain embodiments disclosed herein relate to the formation of multi-component oxide heterostructures (MCOH) using surface nucleation to pattern the atomic layer deposition (ALD) of perovskite material followed by patterned etch and metallization to produce ultra-high density MCOH nano-electronic devices. Applications include ultra-high density MCOH memory and logic, as well as electronic functionality based on single electrons, for example a novel flash memory cell Floating-Gate (FG) transistor with LaAlO3 as a gate tunneling dielectric. Other types of memory devices (DIMMS, DRAM, and DDR) made with patterned ALD of LaAlO3 as a gate dielectric are also possible.Type: ApplicationFiled: June 10, 2010Publication date: March 17, 2011Applicant: NEXGEN SEMI HOLDING, INC.Inventors: Mark Joseph Bennahmias, Michael John Zani, Jeffrey Winfield Scott
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Publication number: 20100098922Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.Type: ApplicationFiled: December 18, 2009Publication date: April 22, 2010Applicant: NEXGEN SEMI HOLDING, INC.Inventors: Michael John Zani, Mark Joseph Bennahmias, Mark Anthony Mayse, Jeffrey Winfield Scott
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Patent number: 7659526Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.Type: GrantFiled: August 20, 2007Date of Patent: February 9, 2010Assignee: NexGen Semi Holding, Inc.Inventors: Michael John Zani, Mark Joseph Bennahmias, Mark Anthony Mayse, Jeffrey Winfield Scott
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Patent number: 7507960Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.Type: GrantFiled: August 17, 2007Date of Patent: March 24, 2009Assignee: NexGen Semi Holding, Inc.Inventors: Michael John Zani, Mark Joseph Bennahmias, Mark Anthony Mayse, Jeffrey Winfield Scott
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Patent number: 7501644Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.Type: GrantFiled: August 20, 2007Date of Patent: March 10, 2009Assignee: NexGen Semi Holding, Inc.Inventors: Michael John Zani, Mark Joseph Bennahmias, Mark Anthony Mayse, Jeffrey Winfield Scott
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Patent number: 7495245Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.Type: GrantFiled: August 20, 2007Date of Patent: February 24, 2009Assignee: NexGen Semi Holding, Inc.Inventors: Michael John Zani, Mark Joseph Bennahmias, Mark Anthony Mayse, Jeffrey Winfield Scott
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Patent number: 7495244Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.Type: GrantFiled: August 20, 2007Date of Patent: February 24, 2009Assignee: NexGen Semi Holding, Inc.Inventors: Michael John Zani, Mark Joseph Bennahmias, Mark Anthony Mayse, Jeffrey Winfield Scott