Patents by Inventor Jeffrey Zabinski

Jeffrey Zabinski has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190091768
    Abstract: Rapid additive sintering of materials using electric fields includes a pair of electrodes including a first and second electrode, a power supply operatively connected to the pair of electrodes, and an area in between the pair of electrodes that holds a material. The first electrode is configured for flash sintering the material. The first electrode may be movable and may include a stylus. The material may include powder and may include any of metallic and ceramic material. Multiple layers of materials may be flash sintered by the first electrode. The first electrode may generate an electric field between the first electrode and the material causes the flash sintering. A nozzle may supply the material at variable speeds. The first electrode may be configured to move at variable speeds and in variable directions. The flash sintering may occur at an electric field between 10-50000 V/cm and an electric current between 0-30A.
    Type: Application
    Filed: September 27, 2017
    Publication date: March 28, 2019
    Inventors: Brandon A. McWilliams, Jian H. Yu, Jeffrey Zabinski
  • Publication number: 20070187229
    Abstract: A filtered cathodic-arc plasma source of lower plasma losses and higher output plasma current to input current efficiency is disclosed. Plasma filtering is accomplished in a right angle bend magnetic filter arranged to include the effects of at least three added magnetic coils located at the right angle bend of the filter path. These magnetic coils and other filter attributes, including an array of transverse fins and a magnetic cusp trap in the filter path, achieve desirable magnetic flux paths, lower plasma collision losses and reduced undesired particle output from the plasma filter. Multiple cathode sources, multiple plasma output ports, Larmour radius influence, equipotential magnetic flux lines and electron/ion interaction considerations are also included in the plasma source. Application of the plasma source to film coating processes is included.
    Type: Application
    Filed: October 21, 2003
    Publication date: August 16, 2007
    Inventors: Ivan Aksenov, Volodymyr Strelnytskiy, Volodymyr Vasylyev, Andrey Voevodin, John Jones, Jeffrey Zabinski