Abstract: An array substrate, a display apparatus applying the same and the assembly method thereof are provided, wherein the array substrate includes a substrate having a plurality of pixels, each of the pixels at least includes a thin film transistor (TFT) device, a first electrode, a second electrode separated from the first electrode all of which are disposed on the substrate. at least one of the first electrode and the second electrode is electrically contacted to the TFT device, and either the first electrode or the second electrode has a magnetic force generator used to generate a magnetic force substantially ranging from 10 gauss to 1000 gauss.

Abstract: An array substrate, a display apparatus applying the same and the assembly method thereof are provided, wherein the array substrate includes a substrate having a plurality of pixels, each of the pixels at least includes a thin film transistor (TFT) device, a first electrode, a second electrode separated from the first electrode all of which are disposed on the substrate. at least one of the first electrode and the second electrode is electrically contacted to the TFT device, and either the first electrode or the second electrode has a magnetic force generator used to generate a magnetic force substantially ranging from 10 gauss to 1000 gauss.

Abstract: A control element of an organic electro-luminescent display includes a first transistor, a second transistor and a capacitor. The first gate electrode of the first transistor is electrically connected to a scan line, and the first source/drain electrode of the first transistor is electrically connected to a data line. The second gate electrode of the second transistor is electrically connected to the second source/drain electrode of the first transistor. The third source/drain electrode of the second transistor is electrically connected to a working voltage, and the fourth source/drain electrode of the second transistor is electrically connected to a light emitting diode. One end of the capacitor is electrically connected to the second gate electrode. The material of the dielectric layer of the capacitor is different from the material of the gate dielectric of one of the first transistor and the second transistor.

Abstract: A Thin Film Transistor comprises a gate electrode formed on a substrate; a gate insulation layer covering the gate electrode; an amorphous silicon (a-Si) region disposed on the gate insulation layer and above the gate electrode; a doped a-Si region formed on the a-Si region; the source and drain metal regions separately formed on the doped a-Si region and above the gate electrode, and isolated from the a-Si region; a passivation layer formed on the gate insulation layer and covering the source, drain and data-line (DL) metal regions; and a conductive layer formed on the passivation layer. The passivation layer has a first, second and third vias for respectively exposing the partial surfaces of the source, drain and DL metal regions. The first, second and third vias are filled with the conductive layer, so that the DL and source metal regions are connected via the conductive layer.

Abstract: A control element of an organic electro-luminescent display includes a first transistor, a second transistor and a capacitor. The first gate electrode of the first transistor is electrically connected to a scan line, and the first source/drain electrode of the first transistor is electrically connected to a data line. The second gate electrode of the second transistor is electrically connected to the second source/drain electrode of the first transistor. The third source/drain electrode of the second transistor is electrically connected to a working voltage, and the fourth source/drain electrode of the second transistor is electrically connected to a light emitting diode. One end of the capacitor is electrically connected to the second gate electrode. The material of the dielectric layer of the capacitor is different from the material of the gate dielectric of one of the first transistor and the second transistor.

Abstract: A control element of an organic electro-luminescent display includes a first transistor, a second transistor and a capacitor. The first gate electrode of the first transistor is electrically connected to a scan line, and the first source/drain electrode of the first transistor is electrically connected to a data line. The second gate electrode of the second transistor is electrically connected to the second source/drain electrode of the first transistor. The third source/drain electrode of the second transistor is electrically connected to a working voltage, and the fourth source/drain electrode of the second transistor is electrically connected to a light emitting diode. One end of the capacitor is electrically connected to the second gate electrode. The material of the dielectric layer of the capacitor is different from the material of the gate dielectric of one of the first transistor and the second transistor.

Abstract: A control element of an organic electro-luminescent display includes a first transistor, a second transistor and a capacitor. The first gate electrode of the first transistor is electrically connected to a scan line, and the first source/drain electrode of the first transistor is electrically connected to a data line. The second gate electrode of the second transistor is electrically connected to the second source/drain electrode of the first transistor. The third source/drain electrode of the second transistor is electrically connected to a working voltage, and the fourth source/drain electrode of the second transistor is electrically connected to a light emitting diode. One end of the capacitor is electrically connected to the second gate electrode. The material of the dielectric layer of the capacitor is different from the material of the gate dielectric of one of the first transistor and the second transistor.

Abstract: A Thin Film Transistor comprises a gate electrode formed on a substrate; a gate insulation layer covering the gate electrode; an amorphous silicon (a-Si) region disposed on the gate insulation layer and above the gate electrode; a doped a-Si region formed on the a-Si region; the source and drain metal regions separately formed on the doped a-Si region and above the gate electrode, and isolated from the a-Si region; a passivation layer formed on the gate insulation layer and covering the source, drain and data-line (DL) metal regions; and a conductive layer formed on the passivation layer. The passivation layer has a first, second and third vias for respectively exposing the partial surfaces of the source, drain and DL metal regions. The first, second and third vias are filled with the conductive layer, so that the DL and source metal regions are connected via the conductive layer.

Abstract: A method for manufacturing a thin film transistor of the invention comprises steps of: forming a gate electrode on a substrate; forming a gate insulating layer on the gate electrode; forming a polysilicon layer on the gate insulating layer; forming an etching-stop layer on the polysilicon layer and corresponding to the gate electrode; forming a heavily doped polysilicon layer on the etching-stop layer and the polysilicon layer, the heavily doped polysilicon layer exposing a part of the etching-stop layer; and forming a source electrode and a drain electrode on the heavily doped polysilicon layer, and the source and drain electrode relatively positioned above the two sides of the gate electrode.