Patents by Inventor Jen-Chien Shih

Jen-Chien Shih has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Immersion lithography apparatus and method
    Patent number: 7268357
    Abstract: Disclosed is an immersion lithography system comprising a liquid crystal media. The liquid crystal is positioned between an objective lens and a substrate stage. A liquid crystal controller having a first electrode and a second electrode is configured to control the liquid crystal during an exposure process.
    Type: Grant
    Filed: May 16, 2005
    Date of Patent: September 11, 2007
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chin-Hsiang Lin, Jen-Chien Shih
  • Immersion lithography apparatus and method
    Publication number: 20060256306
    Abstract: Disclosed is an immersion lithography system comprising a liquid crystal media. The liquid crystal is positioned between an objective lens and a substrate stage. A liquid crystal controller having a first electrode and a second electrode is configured to control the liquid crystal during an exposure process.
    Type: Application
    Filed: May 16, 2005
    Publication date: November 16, 2006
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chin-Hsiang Lin, Jen-Chien Shih