Patents by Inventor Jen-Ping CHANG

Jen-Ping CHANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240192455
    Abstract: The semiconductor structure includes a die, a dielectric layer surrounding the die, a photoelectric device disposed adjacent to the die and surrounded by the dielectric layer, a first opening extending through the redistribution layer and configured to receive a light-conducting member, and a metallic shield extending at least partially through the redistribution layer and surrounding the first opening. A method for forming a semiconductor structure includes receiving a die; forming a dielectric layer to surround the die; and disposing a photoelectric device surrounded by the dielectric layer; forming a redistribution layer over the die, the dielectric layer and the photoelectric device; and removing a portion of the redistribution layer to form a first opening over the photoelectric device. A metallic shield extending at least partially through the redistribution layer and surrounding the first opening is formed during the formation of the redistribution layer.
    Type: Application
    Filed: February 20, 2024
    Publication date: June 13, 2024
    Inventors: JEN-YUAN CHANG, CHIA-PING LAI
  • Patent number: 12009405
    Abstract: A deep trench capacitor includes at least one deep trench and a layer stack including at least three metallic electrode layers interlaced with at least two node dielectric layers and continuously extending over the top surface of a substrate and into each of the at least one deep trench. A contact-level dielectric layer overlies the substrate and the layer stack. Contact assemblies extend through the contact-level dielectric layer. A subset of the contact assemblies vertically extend through a respective metallic electrode layer. For example, a first contact assembly includes a first tubular insulating spacer that laterally surrounds a first contact via structure and contacts a cylindrical sidewall of a topmost metallic electrode layer.
    Type: Grant
    Filed: August 28, 2021
    Date of Patent: June 11, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company Limited
    Inventors: Jen-Yuan Chang, Chia-Ping Lai, Chien-Chang Lee
  • Patent number: 12009349
    Abstract: A semiconductor package includes a first connection die including a semiconductor substrate and an interconnect structure, and a first die stack disposed on the first connection die and including stacked dies, each of the stacked dies including a semiconductor substrate and an interconnect structure including a first connection line that is electrically connected to the interconnect structure of the first connection die. An angle formed between a plane of the first connection die and a plane of each stacked die ranges from about 45° to about 90°.
    Type: Grant
    Filed: September 16, 2021
    Date of Patent: June 11, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company Limited
    Inventors: Jen-Yuan Chang, Chia-Ping Lai
  • Publication number: 20240126327
    Abstract: The present disclosure provides an electronic wearable device. The electronic wearable device includes a first module having a first contact and a second module having a second contact. The first contact is configured to keep electrical connection with the second contact in moving with respect to each other during a wearing period.
    Type: Application
    Filed: October 14, 2022
    Publication date: April 18, 2024
    Applicant: Advanced Semiconductor Engineering, Inc.
    Inventors: Chao Wei LIU, Wei-Hao CHANG, Yung-I YEH, Jen-Chieh KAO, Tun-Ching PI, Ming-Hung CHEN, Hui-Ping JIAN, Shang-Lin WU
  • Patent number: 11940662
    Abstract: The semiconductor structure includes a die, a dielectric layer surrounding the die, a photoelectric device disposed adjacent to the die and surrounded by the dielectric layer, a first opening extending through the redistribution layer and configured to receive a light-conducting member, and a metallic shield extending at least partially through the redistribution layer and surrounding the first opening. A method for forming a semiconductor structure includes receiving a die; forming a dielectric layer to surround the die; and disposing a photoelectric device surrounded by the dielectric layer; forming a redistribution layer over the die, the dielectric layer and the photoelectric device; and removing a portion of the redistribution layer to form a first opening over the photoelectric device. A metallic shield extending at least partially through the redistribution layer and surrounding the first opening is formed during the formation of the redistribution layer.
    Type: Grant
    Filed: October 27, 2020
    Date of Patent: March 26, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Jen-Yuan Chang, Chia-Ping Lai
  • Publication number: 20240088102
    Abstract: An array of complementary die sets is attached to a carrier substrate. A continuous complementary-level molding compound layer is formed around the array of complementary die sets. An array of primary semiconductor dies is attached to the array of complementary die sets. A continuous primary-level molding compound layer is formed around the array of primary semiconductor dies. The bonded assembly is diced by cutting along directions that are parallel to edges of the primary semiconductor dies. The sidewalls of the complementary dies are azimuthally tilted relative to sidewalls of the primary semiconductor dies, or major crystallographic directions of a single crystalline material in the carrier substrate are azimuthally tilted relative to sidewalls of the primary semiconductor dies.
    Type: Application
    Filed: November 16, 2023
    Publication date: March 14, 2024
    Inventors: Jen-Yuan CHANG, Chia-Ping LAI
  • Publication number: 20080161702
    Abstract: An examining device for an aortic valve and a pulmonary valve competency has a cylinder and a liquid infusion catheter assembly. The cylinder has a proximal end, a distal end, a liquid channel and an air channel. The proximal end has a first opening and a transparent lens on the proximal end and sealing the first opening. The distal end has a second opening communicating with the first opening. The liquid channel has a liquid intake hole and a liquid outtake hole communicating with the liquid intake hole. The air channel has a first air intake hole and an air outtake hole communicating with the air intake hole. The liquid infusion catheter assembly connects with the proximal end of the cylinder. The examining device allows surgeons to immediately examine whether a surgery for valves is successful.
    Type: Application
    Filed: January 2, 2007
    Publication date: July 3, 2008
    Inventors: Jen-Ping CHANG, Chi-Nan TSENG, Yuh-Der LIAO