Abstract: The present disclosure provides an apparatus for a lithography process in accordance with some embodiments. The apparatus includes a pellicle membrane, a pellicle frame including a material selected from the group consisting of boron nitride (BN), boron carbide (BC), and a combination thereof, a mask, a first adhesive layer that secures the pellicle membrane to the pellicle frame, and a second adhesive layer that secures the pellicle frame to the mask.

Abstract: Disclosed herein is novel double-stranded short interfering ribonucleic acid (siRNA) capable of suppressing the translation of Aurora-A mRNA. Also disclosed are use of the novel siRNA as disclosed herein for manufacturing a medicament suitable for treating a cancer, which is mediated through epidermal growth factor receptor (EGFR) signaling. Accordingly, a pharmaceutical composition comprising the disclosed novel siRNA molecules is provided; as well as a method of treating a subject suffering from EGFR-mediated cancer via administering to the subject the disclosed novel siRNA molecule.

Abstract: Disclosed herein is novel double-stranded short interfering ribonucleic acid (siRNA) capable of suppressing the translation of Aurora-A mRNA. Also disclosed are use of the novel siRNA as disclosed herein for manufacturing a medicament suitable for treating a cancer, which is mediated through epidermal growth factor receptor (EGFR) signaling. Accordingly, a pharmaceutical composition comprising the disclosed novel siRNA molecules is provided; as well as a method of treating a subject suffering from EGFR-mediated cancer via administering to the subject the disclosed novel siRNA molecule.