Abstract: The present invention relates to a mechanism for guiding airflows within an optical disc drive, in which the optical disc drive comprises a chassis having a side wall and a tray for loading or unloading a disc. The guide mechanism of the present invention includes at least one guide passage which is protruded outwardly from the side wall of the chassis and has two guiding oblique surfaces at its both ends. Further, the guide passage is positioned on an extended line of a diameter of the disc normal to the side wall of the chassis. The airflows produced by the revolving disc is guided to flow through the guide passage. According to the guide mechanism the shocks, jarring, and noise of the optical disc drive is minimized.

Abstract: Disclosed is a photomask having a wavelength-reducing material that may be used during photolithographic processing. In one example, the photomask includes a transparent substrate, an absorption layer having at least one opening, and a layer of wavelength-reducing material (WRM) placed into the opening. The thickness of the WRM may range from approximately a thickness of the absorption layer to approximately ten times the wavelength of light used during the photolithographic processing. In another example, the photomask includes at least one antireflection coating (ARC) layer.