Patents by Inventor Jeng-Cheng Yang

Jeng-Cheng Yang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7365135
    Abstract: The method of the present invention includes grafting a glycidyl alkylene trialkoxy silane to a novolac phenolic resin in an organic solvent to form a modified novolac phenolic resin; mixing a tetralkoxy silane, an acid and water with the resulting organic solution containing the modified novolac phenolic resin, wherein hydrolysis and condensation reactions are carried out to form a —Si—O—Si— bonding; adding a curing agent for novolac phenolic resin to the resulting reaction mixture; evaporating the organic solvent and acid from the resulting mixture and heating the resulting mixture to form a novolac phenolic resin/silica hybrid organic-inorganic nanocomposite.
    Type: Grant
    Filed: June 14, 2004
    Date of Patent: April 29, 2008
    Assignee: Chung-Shan Institute of Science & Technology
    Inventors: Jeng-Cheng Yang, Chen-Chi Martin Ma, Hon-Bin Chen, Chin-Yih Chen
  • Publication number: 20050284087
    Abstract: The method of the present invention includes grafting a glycidyl alkylene trialkoxy silane to a novolac phenolic resin in an organic solvent to form a modified novolac phenolic resin; mixing a tetralkoxy silane, an acid and water with the resulting organic solution containing the modified novolac phenolic resin, wherein hydrolysis and condensation reactions are carried out to form a —Si—O—Si— bonding; adding a curing agent for novolac phenolic resin to the resulting reaction mixture; evaporating the organic solvent and acid from the resulting mixture and heating the resulting mixture to form a novolac phenolic resin/silica hybrid organic-inorganic nanocomposite.
    Type: Application
    Filed: June 14, 2004
    Publication date: December 29, 2005
    Applicant: Chung-Shan Institute of Science & Technology
    Inventors: Jeng-Cheng Yang, Chen-Chi Ma, Hon-Bin Chen, Chin-Yih Chen
  • Patent number: 6841646
    Abstract: A poly(urea-ureathane) based on polydimethyl siloxane is prepared by reacting an amino-terminated polydimethyl siloxane with polyisocyanate to form a prepolymer of poly(urea-urethane), and reacting the prepolymer and a chain extender in the presence of a catalyst. The resulting poly(urea-urethane) contains about 5-65 wt % of hard segments, and has a surface resistance of about 10-150 M? at high relative humidity, so that it can be used in anti-static electricity and electrostatic discharge shielding.
    Type: Grant
    Filed: June 4, 2003
    Date of Patent: January 11, 2005
    Assignee: Chung-Shan Institute of Science & Technology
    Inventors: Jeng-Cheng Yang, Chen-Chi Martin Ma, Hon-Bin Chen, Chin-Yih Chen
  • Publication number: 20040097683
    Abstract: A poly(urea-ureathane) based on polydimethyl siloxane is prepared by reacting an amino-terminated polydimethyl siloxane with polyisocyanate to form a prepolymer of poly(urea-urethane), and reacting the prepolymer and a chain extender in the presence of a catalyst. The resulting poly(urea-urethane) contains about 5-65 wt % of hard segments, and has a surface resistance of about 10-150 M&OHgr; at high relative humidity, so that it can be used in anti-static electricity and electrostatic discharge shielding.
    Type: Application
    Filed: June 4, 2003
    Publication date: May 20, 2004
    Applicant: Chung-Shan Institute of Science & Technology
    Inventors: Jeng-Cheng Yang, Chen-Chi Martin Ma, Hon-Bin Chen, Chin-Yih Chen
  • Publication number: 20030187175
    Abstract: A hydroxyl-containing fluorinated poly(siloxane amideimide) is composed mainly of a hydroxyl-containing fluorinated polyamideimide portion formed by the reaction of a fluorinated dianhydride and a hydroxyl-containing fluorinated diamine, and a flexible siloxane-containing fluorinated polyimide portion formed by the reaction of a fluorinated dianhydride and a siloxane diamine. Said hydroxyl-containing fluorinated poly(siloxane amideimide) can be used as a surface acoustics wave (SAW) coating.
    Type: Application
    Filed: March 28, 2002
    Publication date: October 2, 2003
    Applicant: Chung-Shan Institute of Science & Technology,
    Inventors: Jeng-Cheng Yang, Hon-Bin Chen, Te-Chuan Chang, Gaw-Pying Wang
  • Patent number: 6566456
    Abstract: In the present invention, vinylimidazole and [3-(methacryloxy)propyl]trimethoxysilane are copolymerized to form a modified polyvinylimidazole, which then undergoes hydrolysis and condensation reactions with water and tetramethoxysilane to prepare a hybrid of polyvinylimidazole and silica. Experimental analyses show that covalent bondings exist between the modified polyvinylimidazole and silica in the hybrid.
    Type: Grant
    Filed: November 3, 2000
    Date of Patent: May 20, 2003
    Assignee: Chung-Shan Institute of Science & Technology
    Inventors: Jeng-Cheng Yang, Yaw-Shun Hong, Te-Chuan Chang, Yu-Tan Wang
  • Patent number: 6545114
    Abstract: A polysiloxane-urethane macromonomer having an unsaturated bond on one end thereof was co-polymerized with acrylic acid or acrylate monomers to form a copolymer having polysiloxane-urethane groups as a side chain thereof.
    Type: Grant
    Filed: August 9, 2001
    Date of Patent: April 8, 2003
    Assignee: Chung-Shan Institute of Science & Technology
    Inventors: Jeng-Cheng Yang, Chen-chi Martin Ma, Hon-Bin Chen
  • Patent number: 6291599
    Abstract: The invention provides a technique for improving the flexibility of a cured epoxy resin. An isocyanate terminated polydimethylsiloxane urethane as a modifier is grafted to an epoxy resin. The modified epoxy resin after being cured exhibits an improved flexibility.
    Type: Grant
    Filed: December 13, 1999
    Date of Patent: September 18, 2001
    Assignee: Chung-Shan Institute of Science & Technology
    Inventors: Jeng-Cheng Yang, Chen-Chi Martin Ma, Hon-Bin Chen