Patents by Inventor Jeng-Shie Chung

Jeng-Shie Chung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7090650
    Abstract: The continuous passive motion exercise system enables human's joints to recover speedily to original functioning after injuries or surgeries, and thus shortens the period of time needed for joint rehabilitation. The present invention provides a force or torque monitoring device attached onto a continuous passive motion exercise mechanism to measure the driving force of the repeated joint flexing and extending motion, so as to evaluate the change of the viscosity and the stiffness of the injured joints through different rehabilitation periods. This monitoring device also monitor degrees of joint muscle's active contraction and thus slows down or stops the repeated motions of exercise mechanisms to improve safety concerns.
    Type: Grant
    Filed: December 30, 2002
    Date of Patent: August 15, 2006
    Assignee: Industrial Technology Research Institute
    Inventors: Yeong-Jeong Ou, Jeng-Shie Chung, Meng-Kai Su, Jian-Je Jian
  • Patent number: 6910383
    Abstract: A micro pressure sensor comprising a glass substrate or a bulk silicon wafer with a rampart protruding from the surface and a plurality of first contacting pads, a thin membrane having a plurality of piezo-resistors, circuit patterns, and a plurality of second contact pads, and conducting lines, wherein the plurality of contact pads are partially exposed to outside. The rampart on the substrate has a cavity formed on the center of the top surface of the rampart. The top surface of the rampart is tightly bonded to the surface of the thin membrane. The piezo-resistors are sealed in the cavity. Preferably, the micro sensor further comprises a plurality of thermo sensors, and a plurality of temperature-controlling elements all enclosed inside the cavity, and additional protective layers formed on the exposure regions of all contact pads.
    Type: Grant
    Filed: December 23, 2002
    Date of Patent: June 28, 2005
    Assignee: Industrial Technology Research Institute
    Inventors: Yeong-Jeong Ou, TaiKang Shing, Justin Clark, Ke-Shieng Yang, Jeng-Shie Chung
  • Publication number: 20040127821
    Abstract: The continuous passive motion exercise system enables human's joints to recover speedily to original functioning after injuries or surgeries, and thus shortens the period of time needed for joint rehabilitation. The present invention provides a force or torque monitoring device attached onto a continuous passive motion exercise mechanism to measure the driving force of the repeated joint flexing and extending motion, so as to evaluate the change of the viscosity and the stiffness of the injured joints through different rehabilitation periods. This monitoring device also monitor degrees of joint muscle's active contraction and thus slows down or stops the repeated motions of exercise mechanisms to improve safety concerns.
    Type: Application
    Filed: December 30, 2002
    Publication date: July 1, 2004
    Applicant: Industrial Technology Research Institute
    Inventors: Yeong-Jeong Ou, Jeng-Shie Chung, Meng-Kai Su, Jian-Je Jian
  • Publication number: 20040118213
    Abstract: A method for producing an isolated micro pressure sensor and the process for producing the same are disclosed. The method for manufacturing the isolated micro pressure sensor includes: (A) etching one surface of a substrate to form a rampart with an open cavity on the center of its top surface and with plate portions surrounding the rampart; (B) forming a plurality of first contact pads on said plate portions of the substrate outside said rampart; (C) forming a plurality of second contact pads, a plurality of piezo-resistors, thermo sensors, temperature-controlling elements and circuit patterns on a bulk silicon wafer; (D) forming a plurality of grooves on the periphery of the bulk silicon wafer; (E) bonding the bulk silicon wafer and the substrate; and (F) thinning said bulk silicon wafer until said bulk silicon wafer forming a thin membrane.
    Type: Application
    Filed: December 23, 2002
    Publication date: June 24, 2004
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Yeong-Jeong Ou, TaiKang Shing, Justin Clark, Ke-Shieng Yang, Jeng-Shie Chung