Patents by Inventor Jeng-Shiuan Shih

Jeng-Shiuan Shih has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of preventing photoresist residue on metal lines
    Patent number: 5939241
    Abstract: A method of preventing photoresist residue on metal lines is disclosed herein. A strip recipe with a preheat step has been developed for use with the Applied Materials Mxp Centura. The preheat step is performed before the strip step. The preheat step can rapidly shorten the temperature balance time between the wafer and the strip chamber and make the photoresist flow to increase photoresist surface area. Therefore, the strip photoresist rate will be improved by higher wafer temperature in the first few strip cycles.
    Type: Grant
    Filed: October 17, 1997
    Date of Patent: August 17, 1999
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Jen-Shiang Leu, Jeng-Shiuan Shih