Patents by Inventor Jeng-Yueh Shieh

Jeng-Yueh Shieh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7446160
    Abstract: A series of novel phosphorus-containing cured benzoxazine resins, which are synthesized from dihydrobenzoxazine resins with reactive phosphorus-containing compounds. The cured benzoxazine resins have desired flame retardancy and high glass transition temperature, and are suitable for the fabrication of printed circuit board and the semiconductor encapsulant applications.
    Type: Grant
    Filed: April 13, 2005
    Date of Patent: November 4, 2008
    Assignee: National Cheng Kung University
    Inventors: Chun Shan Wang, Jeng Yueh Shieh, Chi Yi Lin, Wan Jung Hsieh
  • Patent number: 6992151
    Abstract: The present invention discloses an active-hydrogen-containing curing agent having a phosphorus group, and a flame retardant cured epoxy resin which can be prepared via an addition reaction between the active hydrogen and the epoxide group of an epoxy resin. The cured flame retardant epoxy resin is environmentally friendly and is suitable for printed circuit board and semiconductor encapsulation applications. The phosphorus group of the curing agent has a chemical structure as follows: wherein Ar is a substituted or un-substituted phenyl or phenoxy.
    Type: Grant
    Filed: July 14, 2003
    Date of Patent: January 31, 2006
    Assignee: National Science Council
    Inventors: Chun-Shan Wang, Jeng-Yueh Shieh
  • Publication number: 20050004339
    Abstract: The present invention discloses an active-hydrogen-containing phosphorus compound for cross-linking a resin and for imparting flame-retardancy to the cured resin, and in particular to a cured frame-retardant epoxy resin prepared by reacting the hardener with a di- or poly-functional epoxy resin via an addition reaction between the active hydrogen and the epoxide group. The present invention also discloses an epoxy resin made from the active-hydrogen-containing phosphorus compound and epihalohydrin.
    Type: Application
    Filed: July 22, 2004
    Publication date: January 6, 2005
    Inventors: Chun-Shan Wang, Jeng-Yueh Shieh, Ching Lin
  • Patent number: 6797821
    Abstract: The present invention discloses an active-hydrogen-containing phosphorus compound for cross-linking a resin and for imparting flame-retardancy to the cured resin, and in particular to a cured frame-retardant epoxy resin prepared by reacting the hardener with a di- or poly-functional epoxy resin via an addition reaction between the active hydrogen and the epoxide group. The present invention also discloses an epoxy resin made from the active-hydrogen-containing phosphorus compound and epihalohydrin.
    Type: Grant
    Filed: January 30, 2002
    Date of Patent: September 28, 2004
    Inventors: Chun-Shan Wang, Jeng-Yueh Shieh, Ching Hsuan Lin
  • Publication number: 20040024255
    Abstract: The present invention discloses an active-hydrogen-containing curing agent having a phosphorus group, and a flame retardant cured epoxy resin which can be prepared via an addition reaction between the active hydrogen and the epoxide group of an epoxy resin. The cured flame retardant epoxy resin is environmentally friendly and is suitable for printed circuit board and semiconductor encapsulation applications.
    Type: Application
    Filed: July 14, 2003
    Publication date: February 5, 2004
    Applicant: National Science Council
    Inventors: Chun-Shan Wang, Jeng-Yueh Shieh
  • Patent number: 6646064
    Abstract: A method for imparting flame retardance to an epoxy resin comprises reacting an epoxy resin with a phosphorus-containing dihydric phenol or naphthol derived from the reaction of 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide (i.e., DOPO) with a benzoquinone or naphthoquinone.
    Type: Grant
    Filed: September 10, 2001
    Date of Patent: November 11, 2003
    Assignee: National Science Council
    Inventors: Chun-Shan Wang, Jeng-Yueh Shieh
  • Patent number: 6613848
    Abstract: A hardener for an epoxy resin comprises a phenolic, thiophenolic, aminophenyl, tris-phenolic, tris-thiophenolic, tris-aminophenyl, tetrakis-phenolic, tetrakis-thiophenolic, or tetrakis-aminophenyl compounds; or phenol-formaldehyde or phenol-formaldehyde/melamine-formaldehyde resins wherein the phenyl rings are substituted with at least one of the structures wherein R1 and R2 independently are H, C1-C18 alkyl, C6-C18 aryl, C6-C18 substituted aryl, C6-C18 aryl methylene, or C6-C18 substituted aryl methylene; X is O, S or NH and Ar is wherein R is C1-C4 alkyl and n=0-5.
    Type: Grant
    Filed: May 16, 2000
    Date of Patent: September 2, 2003
    Assignee: National Science Council
    Inventors: Chun-Shan Wang, Jeng-Yueh Shieh
  • Publication number: 20030120021
    Abstract: The present invention discloses an active-hydrogen-containing phosphorus compound for cross-linking a resin and for imparting flame-retardancy to the cured resin, and in particular to a cured frame-retardant epoxy resin prepared by reacting the hardener with a di- or poly-functional epoxy resin via an addition reaction between the active hydrogen and the epoxide group. The present invention also discloses an epoxy resin made from the active-hydrogen-containing phosphorus compound and epihalohydrin.
    Type: Application
    Filed: January 30, 2002
    Publication date: June 26, 2003
    Applicant: Chun-Shan WANG
    Inventors: Chun-Shan Wang, Jeng-Yueh Shieh, Ching Hsuan Lin
  • Publication number: 20020035233
    Abstract: Flame-retardant advanced epoxy resins and cured epoxy resins which contain a rigid phosphorus group and thus provide better thermal and flame-retardant properties than the conventional epoxy resins prepared from tetrabromobisphenol A. The advanced epoxy resins are suitable for making a fiber-reinforced epoxy resin composite which is useful in the fabrication of printed circuit boards. The cured epoxy resins can be used in semiconductor encapsulation applications.
    Type: Application
    Filed: September 10, 2001
    Publication date: March 21, 2002
    Applicant: National Science Council
    Inventors: Chun-Shan Wang, Jeng-Yueh Shieh
  • Patent number: 6291626
    Abstract: Flame-retardant advanced epoxy resins and cured epoxy resins contain a rigid phosphorus group emanating from a dihydric phenol or naphthol which provides thermal and flame retardant properties. The advanced epoxy resins are suitable for making a fiber-reinforced epoxy resin composite which is useful in the fabrication of printed circuit boards. The cured epoxy resins can be used in semiconductor encapsulation applications.
    Type: Grant
    Filed: March 3, 1999
    Date of Patent: September 18, 2001
    Assignee: National Science Council
    Inventors: Chun-Shan Wang, Jeng-Yueh Shieh