Patents by Inventor Jenn S. Shih

Jenn S. Shih has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4933463
    Abstract: What is described herein are polymerizable pyrrolidonyl 4,5-unsubstituted oxazoline monomers, homopolymers thereof, and copolymers with other monomers. A preferred polymerizable monomer compound is 2-(1-methyl-2-pyrrolidon-4-yl)-2-oxazoline. The polymers herein have excellent hydrotropic properties thus increasing the water solubility of organic compounds previously considered as water insoluble, and exhibit complexation with water soluble cosolutes.
    Type: Grant
    Filed: May 8, 1989
    Date of Patent: June 12, 1990
    Assignee: GAF Chemicals Corporation
    Inventors: Gary Dandreaux, Robert B. Login, John J. Merianos, Paul Garelick, Krystyna Plochocka, Max Negrin, Jenn S. Shih
  • Patent number: 4927667
    Abstract: An aqueous process is described for preparing water-resistant coatings of hydrophobic copolymers of a predetermined composition. The hydrophobic copolymers are made from hydrophilic comonomers such as a vinyl lactam and a polymerizable carboxylic acid. The hydrophobic copolymers are rendered water soluble with a volatile neutralizing agent, such as ammonium hydroxide, then coated onto a substrate and heated to provide the water-resistant coating, and, if desired, redissolved in an aqueous alkaline solution.
    Type: Grant
    Filed: June 22, 1989
    Date of Patent: May 22, 1990
    Assignee: GAF Chemicals Corporation
    Inventors: Jenn S. Shih, Terry E. Smith, Robert B. Login
  • Patent number: 4923694
    Abstract: The invention relates to a hydrolysis resistant, high molecular weight polymer represented by the formula ##STR1## wherein R is alkylene having from 3 to 8 carbon atoms which is optionally substituted with lower alkyl; R.sub.1 and R.sub.2 are each hydrogen or methyl; wherein R.sub.7 and R.sub.8 are each alkylene having from 1 to 18 carbon atoms and are optionally substituted with alkyl; the sum of r and t is one or two; R.sub.4 and R.sub.5 are each independently lower alkyl; R.sub.6 is alkyl, aralkyl or alkaryl having from 1 to 8 carbon atoms or N-alkylene lactam having from 3 to 8 carbon atoms; X.sup.- is an anion derived from the group of halogen, SO.sub.3, SO.sub.4, HSO.sub.4 and R.sub.6 SO.sub.
    Type: Grant
    Filed: August 25, 1988
    Date of Patent: May 8, 1990
    Assignee: GAF Chemicals Corporation
    Inventors: Jenn S. Shih, Terry E. Smith