Patents by Inventor Jennifer M. Rieker

Jennifer M. Rieker has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Aqueous Buffered Fluoride-Containing Etch Residue Removers and Cleaners
    Publication number: 20110015108
    Abstract: The invention relates to aqueous, buffered, fluoride containing compositions having a pH of greater than 7.0 to about 11.0. In certain embodiments, the buffered compositions have an extended worklife because pH dependent attributes such as oxide and metal etch rates are stable so long as the pH remains stable.
    Type: Application
    Filed: September 29, 2010
    Publication date: January 20, 2011
    Applicant: AIR PRODUCTS AND CHEMICALS, INC.
    Inventors: Roberto J. Rovito, Jennifer M. Rieker, Darryl W. Peters
  • Aqueous buffered fluoride-containing etch residue removers and cleaners
    Patent number: 7807613
    Abstract: The invention relates to aqueous, buffered, fluoride containing compositions having a pH of greater than 7.0 to about 11.0. In certain embodiments, the buffered compositions have an extended worklife because pH dependent attributes such as oxide and metal etch rates are stable so long as the pH remains stable.
    Type: Grant
    Filed: June 25, 2004
    Date of Patent: October 5, 2010
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Roberto J. Rovito, Jennifer M. Rieker, Darryl W. Peters
  • Compositions for the removal of organic and inorganic residues
    Patent number: 7361631
    Abstract: A composition and method using same for removing photoresist and/or processing residue from a substrate are described herein. In one aspect, there is provided a composition for removing residue consisting essentially of: an acidic buffer solution having an acid selected from a carboxylic acid or a polybasic acid and an ammonium salt of the acid in a molar ratio of acid to ammonium salt ranging from 10:1 to 1:10; an organic polar solvent that is miscible in all proportions in water; a fluoride, and water wherein the composition has a pH ranging from about 3 to about 7.
    Type: Grant
    Filed: September 15, 2004
    Date of Patent: April 22, 2008
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Matthew I. Egbe, Jennifer M. Rieker, Darryl W. Peters, Irl E. Ward
  • Compositions suitable for removing photoresist, photoresist byproducts and etching residue, and use thereof
    Patent number: 6951710
    Abstract: Compositions containing certain amines and/or quaternary ammonium compounds, hydroxylamine, corrosion inhibitor, organic diluent and optionally water are capable of removing photoresist, photoresist byproducts and residue and etching residues from a substrate.
    Type: Grant
    Filed: May 23, 2003
    Date of Patent: October 4, 2005
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Jennifer M. Rieker, Thomas Wieder, Dana L. Durham
  • Aqueous buffered fluoride-containing etch residue removers and cleaners
    Publication number: 20040266637
    Abstract: The invention relates to aqueous, buffered, fluoride containing compositions having a pH of greater than 7.0 to about 11.0. In certain embodiments, the buffered compositions have an extended worklife because pH dependent attributes such as oxide and metal etch rates are stable so long as the pH remains stable.
    Type: Application
    Filed: June 25, 2004
    Publication date: December 30, 2004
    Inventors: Roberto J. Rovito, Jennifer M. Rieker, Darryl W. Peters
  • Compositions suitable for removing photoresist, photoresist byproducts and etching residue, and use thereof
    Publication number: 20040234904
    Abstract: Compositions containing certain amines and/or quaternary ammonium compounds, hydroxylamine, corrosion inhibitor, organic diluent and optionally water are capable of removing photoresist, photoresist byproducts and residue and etching residues from a substrate.
    Type: Application
    Filed: May 23, 2003
    Publication date: November 25, 2004
    Inventors: Jennifer M. Rieker, Thomas Wieder, Dana L. Durham
  • Aqueous buffered fluoride-containing etch residue removers and cleaners
    Publication number: 20030022800
    Abstract: The invention relates to aqueous, buffered, fluoride containing compositions having a pH of greater than 7.0 to about 11.0. The buffered compositions have an extended worklife because pH dependent attributes such as oxide and metal etch rates are stable so long as the pH remains stable.
    Type: Application
    Filed: June 14, 2001
    Publication date: January 30, 2003
    Inventors: Darryl W. Peters, Roberto J. Rovito, Jennifer M. Rieker