Abstract: Driver laser systems for EUV radiation producing apparatuses are disclosed that include a beam source for producing laser radiation propagating in a first direction, an amplifier arrangement comprising at least one optical amplifier for amplifying the laser radiation propagating in the first direction, and at least one optical isolator. The optical isolator includes a chamber filled with a gas, through which chamber the laser radiation propagating in the first direction passes, and a plasma generating device configured for the pulsed ignition of a plasma in the gas of the chamber to suppress passage of laser radiation propagating in a second direction, opposite to the first direction, through the chamber. EUV radiation producing apparatuses that include such driver laser systems are also disclosed.

Abstract: Driver laser systems for EUV radiation producing apparatuses are disclosed that include a beam source for producing laser radiation propagating in a first direction, an amplifier arrangement comprising at least one optical amplifier for amplifying the laser radiation propagating in the first direction, and at least one optical isolator. The optical isolator includes a chamber filled with a gas, through which chamber the laser radiation propagating in the first direction passes, and a plasma generating device configured for the pulsed ignition of a plasma in the gas of the chamber to suppress passage of laser radiation propagating in a second direction, opposite to the first direction, through the chamber. EUV radiation producing apparatuses that include such driver laser systems are also disclosed.

Abstract: An optical element includes a structured carrier layer having a macrostructure at a main surface and a layer of cured material. The layer of cured material includes an optically smooth surface facing away from the main surface, a macrostructure surface of the surface being dependent on the macrostructure of the carrier layer and on a layer thickness profile of the layer.