Patents by Inventor Jens Peltzer

Jens Peltzer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10222717
    Abstract: The invention relates to a hydrophobic silica powder which is unprecedentedly insensitive to environmental humidity with which electrophotographic toner can possess stable electro static charge that leads to stable quality of printed image. The hydrophobic silica powder has the following physicochemical properties; average primary particle size (D) is 30-2000 nm, B*D<430 nm, while B stands for weight % of adsorbed water vapor on silica (100 weight %) when the partial pressure of water to the equilibrium vapor pressure of water at 25° C. is 80% and D stands for average primary particle size (nm) of the silica powder, B/C<2.7, while C stands for weight % of adsorbed water vapor on silica (100 weight %) when the partial pressure of water to the equilibrium vapor pressure of water at 25° C. is 20%, and carbon content>0.30 wt.-%.
    Type: Grant
    Filed: November 23, 2016
    Date of Patent: March 5, 2019
    Assignee: Evonik Degussa GmbH
    Inventors: Masanobu Kaneeda, Rainer Lamann, Jens Peltzer, Farideh Yamchi, Jürgen Behnisch
  • Publication number: 20170168409
    Abstract: The invention relates to a hydrophobic silica powder which is unprecedentedly insensitive to environmental humidity with which electrophotographic toner can possess stable electro static charge that leads to stable quality of printed image. The hydrophobic silica powder has the following physicochemical properties; average primary particle size (D) is 30-2000 nm, B*D<430 nm, whilst B stands for weight % of adsorbed water vapor on silica (100 weight %) when the partial pressure of water to the equilibrium vapor pressure of water at 25° C. is 80% and D stands for average primary particle size (nm) of the silica powder, B/C<2.7, whilst C stands for weight % of adsorbed water vapor on silica (100 weight %) when the partial pressure of water to the equilibrium vapor pressure of water at 25° C. is 20%, and carbon content >0.30 wt.-%.
    Type: Application
    Filed: November 23, 2016
    Publication date: June 15, 2017
    Inventors: Masanobu Kaneeda, Rainer Lamann, Jens Peltzer, Farideh Yamchi, Jürgen Behnisch
  • Publication number: 20110244238
    Abstract: The invention relates to a novel method for producing high-purity SiO2 from silicate solutions, a novel high-purity SiO2 with a specific impurity profile and use thereof.
    Type: Application
    Filed: September 28, 2009
    Publication date: October 6, 2011
    Inventors: Christian Panz, Markus Ruf, Guido Titz, Florian Paulat, Hartwig Rauleder, Sven Müller, Jürgen Behnisch, Jens Peltzer
  • Publication number: 20110236288
    Abstract: The invention relates to a novel method for producing high-purity SiO2 from silicate solutions, a novel high-purity SiO2 having a specific impurity spectrum and use thereof.
    Type: Application
    Filed: September 28, 2009
    Publication date: September 29, 2011
    Inventors: Christian Panz, Markus Ruf, Guido Titz, Florian Paulat, Hartwig Rauleder, Sven Müller, Jürgen Behnish, Jens Peltzer