Abstract: A system for short pulse laser eye surgery and a short pulse laser system, in which a beam guidance device passes through a corresponding articulated arm, and through an applicator head and a microscope head of the system, which is movable in a three-dimensional volume both independently of one another as well as connected to each other. The system also includes an easy to use patient interface with a one-piece contact element, a computer program product for methods of the incision guidance and sequentially operating referencing methods with patient interfaces containing markings.

Abstract: A planning device for a scanning pattern of a closed structure in an eye, an ophthalmic laser treatment device and corresponding methods including a scanning pattern of a closed structure in a tissue of a patient's eye in a single-pass method for the control of an ophthalmic laser treatment device, in which a starting point of the macroscopic scanning pattern which contains the scanning pattern is arranged in a region in which the angle between a direction of progress of the macroscopic scanning pattern and a direction of a maximum offset caused by movements of the eye relative to the ophthalmic laser treatment device is minimal, or in a region of a minimum change in the macroscopic scanning pattern (n the z-direction per unit of time, or in a region in which a direction of progress of the macroscopic scanning pattern is parallel to a direction of maximum offset.

Abstract: A system for short pulse laser eye surgery and a short pulse laser system, in which a beam guidance device passes through a corresponding articulated arm, and through an applicator head and a microscope head of the system, which is movable in a three-dimensional volume both independently of one another as well as connected to each other. The system also includes, an easy-to-use patient interface with a one-piece contact element, a computer program product for methods of the incision guidance and sequentially operating referencing methods with patient interfaces containing markings.

Abstract: A system for short pulse laser eye surgery and a short pulse laser system, in which a beam guidance device passes through a corresponding articulated arm, and through an applicator head and a microscope head of the system, which is movable in a three-dimensional volume both independently of one another as well as connected to each other. The system also includes, an easy-to-use patient interface with a one-piece contact element, a computer program product for methods of the incision guidance and sequentially operating referencing methods with patient interfaces containing markings.

Abstract: A planning device for a scanning pattern of a closed structure in an eye, an ophthalmic laser treatment device and corresponding methods including a scanning pattern of a closed structure in a tissue of a patient's eye in a single-pass method for the control of an ophthalmic laser treatment device, in which a starting point of the macroscopic scanning pattern which contains the scanning pattern is arranged in a region in which the angle between a direction of progress of the macroscopic scanning pattern and a direction of a maximum offset caused by movements of the eye relative to the ophthalmic laser treatment device is minimal, or in a region of a minimum change in the macroscopic scanning pattern (n the z-direction per unit of time, or in a region in which a direction of progress of the macroscopic scanning pattern is parallel to a direction of maximum offset.

Abstract: The invention is directed to an arrangement for generating EUV radiation based on a gas discharge plasma with high radiation emission in the range between 12 nm and 14 nm. It is the object of the invention to find a novel possibility for plasma-based radiation generation with high radiation output in the EUV spectral region (between 12 nm and 14 nm) which makes it possible to use tin as a work medium in EUV gas discharge sources for industrial applications. This object is met, according to the invention, in that a gas preparation unit is provided for defined control of the temperature and pressure of a tin-containing work medium and the flow thereof into the vacuum chamber in gaseous state. At least one thermally insulated reservoir vessel and a thermally insulated supply line are provided for transferring the gaseous tin-containing work medium from the gas preparation unit to the pre-ionization unit located inside the electrode housing.

Abstract: The invention is directed to an arrangement for generating EUV radiation based on a gas discharge plasma with high radiation emission in the range between 12 nm and 14 nm. It is the object of the invention to find a novel possibility for plasma-based radiation generation with high radiation output in the EUV spectral region (between 12 nm and 14 nm) which makes it possible to use tin as a work medium in EUV gas discharge sources for industrial applications. This object is met, according to the invention, in that a gas preparation unit is provided for defined control of the temperature and pressure of a tin-containing work medium and the flow thereof into the vacuum chamber in gaseous state. At least one thermally insulated reservoir vessel and a thermally insulated supply line are provided for transferring the gaseous tin-containing work medium from the gas preparation unit to the pre-ionization unit located inside the electrode housing.