Abstract: Systems and methods for testing semiconductor wafers using a wafer translator are disclosed herein. In one embodiment, an apparatus for adjusting a wafer translator for testing semiconductor dies includes the semiconductor wafer translator having a wafer translator substrate with a wafer-side configured to face the dies. A plurality of wafer-side contact structures is carried by the wafer-side of the wafer translator. The apparatus also includes a shaping wafer having a shaping wafer substrate, and a plurality of cavities in the shaping wafer substrate. The wafer-side contact structures are shaped by contacting surfaces of the cavities of the shaping wafer substrate.

Abstract: Methods are provided for removing an oxide layer from a metal pad on an integrated circuit in order to reduce contact resistance. In one embodiment, aluminum oxide, on the surface of a bond pad substantially comprised of aluminum, is reacted with a first chemical agent to form an inorganic salt, and the inorganic salt is then reacted with a second chemical agent leaving a substantially bare, that is, unoxidized, aluminum surface.

Abstract: Methods are provided for removing an oxide layer from a metal pad on an integrated circuit in order to reduce contact resistance. In one embodiment, aluminum oxide, on the surface of a bond pad substantially comprised of aluminum, is reacted with a first chemical agent to form an inorganic salt, and the inorganic salt is then reacted with a second chemical agent leaving a substantially bare, that is, unoxidized, aluminum surface.