Patents by Inventor Jentske D. Kooistra

Jentske D. Kooistra has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Illumination system for use in a stereolithography apparatus
    Patent number: 8873024
    Abstract: The invention concerns an illumination system for use in a stereolithography apparatus, comprising a planar support supporting a two-dimensional array of individually controllable wide-angle light-emitting diodes (LEDs); and a multilens projector array arranged relative to the array, and adapted to project a focused image of the LEDs onto a work area. The multilens projector array is arranged to project light from the LED array having a light emitting edge area image spot size which is smaller than or equal to a light emitting central area image spot size.
    Type: Grant
    Filed: March 8, 2010
    Date of Patent: October 28, 2014
    Assignee: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNO
    Inventors: Jacobus Hubertus Theodoor Jamar, Herman Hendrikus Maalderink, Andries Rijfers, Borgert Kruizinga, Jentske D. Kooistra
  • Illumination system for use in a stereolithography apparatus
    Patent number: 8836916
    Abstract: The invention concerns an illumination system for use in a stereolithography apparatus, comprising: a planar support; a multilens projector array mechanically supported on the planar support over the array on a plano side, and having a work surface arranged to receive a resin applying device for applying a resin layer, the projector array comprising a stack of optical elements, including a plurality of lenslets adapted to project the LEDs onto the work surface, and a two-dimensional array of individually controllable light-emitting diodes (LEDs) arranged between the planar support and the multilens projector. According to an aspect, the planar support and the plano side are supported on contact zones arranged over substantially the entire plano side; the illumination system thus forming a rigid body.
    Type: Grant
    Filed: March 8, 2010
    Date of Patent: September 16, 2014
    Assignees: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNO, DSM IP Assets B.V.
    Inventors: Jacobus Hubertus Theodoor Jamar, Andries Rijfers, Borgert Kruizinga, Jentske D. Kooistra, Mark Herman Else Vaes
  • Illumination System for Use in a Stereolithography Apparatus
    Publication number: 20120063131
    Abstract: The invention concerns an illumination system for use in a stereolithography apparatus, comprising a planar support supporting a two-dimensional array of individually controllable wide-angle light-emitting diodes (LEDs); and a multilens projector array arranged relative to the array, and adapted to project a focused image of the LEDs onto a work area. The multilens projector array is arranged to project light from the LED array having a light emitting edge area image spot size which is smaller than or equal to a light emitting central area image spot size.
    Type: Application
    Filed: March 8, 2010
    Publication date: March 15, 2012
    Inventors: Jacobus Hubertus Theodoor Jamar, Herman Hendrikus Maalderink, Andries Rijfers, Borgert Kruizinga, Jentske D. Kooistra
  • Illumination System for Use in a Stereolithography Apparatus
    Publication number: 20120057143
    Abstract: The invention concerns an illumination system for use in a stereolithography apparatus, comprising: a planar support; a multilens projector array mechanically supported on the planar support over the array on a plano side, and having a work surface arranged to receive a resin applying device for applying a resin layer, the projector array comprising a stack of optical elements, including a plurality of lenslets adapted to project the LEDs onto the work surface, and a two-dimensional array of individually controllable light-emitting diodes (LEDs) arranged between the planar support and the multilens projector. According to an aspect, the planar support and the plano side are supported on contact zones arranged over substantially the entire plano side; the illumination system thus forming a rigid body.
    Type: Application
    Filed: March 8, 2010
    Publication date: March 8, 2012
    Applicants: DSM IP ASSETS B.V., Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNO
    Inventors: Jacobus Hubertus Theodoor Jamar, Andries Rijfers, Borgert Kruizinga, Jentske D. Kooistra, Mark Herman Else Vaes