Patents by Inventor Jeong-Deuk Kim

Jeong-Deuk Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5703142
    Abstract: The present invention relates to a photo-curable prepolymer having the following formula (I): ##STR1## in which W represents ##STR2## R.sub.1 represents hydrogen or methyl; R.sub.1 ' represents ##STR3## wherein X represents chlorine or bromine atom, R.sub.2 represents methyl or ethyl, n, o and q independently of one another denote an integer of 1 to 6 and p denotes an integer of 0 to 6;R.sub.2 ' and R.sub.3 ' are identical to or different from each other and represent ##STR4## wherein L denotes an integer of 0 to 5, or ##STR5## wherein m denotes an integer of 1 to 6; a, b and c independently of one another represent a real number of 3 or less, provided that they satisfy the conditions of0<a.ltoreq.3, 0.ltoreq.b and/or c<3 and a+b+c=3.which shows permanent antistatic property by introducing therein an acrylate moiety having quaternary ammonium group and hydroxy group simultaneously, and to a process for preparing thereof.
    Type: Grant
    Filed: September 27, 1995
    Date of Patent: December 30, 1997
    Assignee: Hanwha Chemical Corporation
    Inventors: Sang-Keun Kim, Haeng-Woo Lee, Cheol-Kyu Choi, Jeong-Deuk Kim, Jin-Who Hong, Chang-Soo Kim, Kong-Hyun Whang
  • Patent number: 5703139
    Abstract: The present invention relates to a photo-curable resin composition which shows an excellent antistatic property and staining resistance by introducing aliphatic trifunctional urethane acrylate prepolymer therein and to a product coated with said resin composition. Specifically, the photo-curable resin composition according to the present invention are useful for coating a product made from metacrylate resin, vinylchloride resin, ABS resin or carbonate resin. The photo-curable resin composition according to the present invention can comprise reactive diluent, photoinitiator and additives in addition to said prepolymer.
    Type: Grant
    Filed: September 27, 1995
    Date of Patent: December 30, 1997
    Assignee: HANWHA Chemical Corporation
    Inventors: Sang-Keun Kim, Seoung-Ho Kim, Haeng-Woo Lee, Cheol-Kyu Choi, Jeong-Deuk Kim, Jin-Who Hong, Chang-Soo Kim, Kong-Hyun Whang