Patents by Inventor Jeong Gil Kim

Jeong Gil Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210204210
    Abstract: A communication module in a vehicle according to an embodiment of the present invention comprises: a battery unit; a receiving unit for receiving power from the battery unit and operating by a predetermined period in a reception standby state; and a control unit configured to accumulatively calculate an amount of current consumed according to an operation time of the receiving unit, and generate a control message for controlling a turn-off of the communication module or controlling an operation period of the receiving unit when the accumulatively calculated value exceeds a predetermined value.
    Type: Application
    Filed: December 12, 2016
    Publication date: July 1, 2021
    Applicant: LG INNOTEK CO., LTD.
    Inventors: Jung Sik MOON, Jeong Gil KIM
  • Publication number: 20210098826
    Abstract: A lithium secondary battery including a positive electrode, a negative electrode, a separator interposed between the positive electrode and the negative electrode, and a sulfur dioxide-based inorganic electrolyte solution. The negative electrode includes a negative electrode active material which includes a carbon material having a coating comprising titanium oxide (TiOx, 0<x<2). The titanium oxide improves the wettability of the carbon material negative electrode to the inorganic electrolyte solution and the charge transfer reaction on the surface and minimizes the interfacial resistance of the carbon material/inorganic electrolyte solution, thereby improving the high-rate charge/discharge characteristics.
    Type: Application
    Filed: July 12, 2019
    Publication date: April 1, 2021
    Applicants: LG CHEM, LTD., IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY)
    Inventors: Seung-Hyun CHUNG, Jeong-Gil KIM, Bum-Young JUNG, Han-Su KIM, A-Young KIM, Ju-Hye SONG, Ho-Jae JUNG
  • Publication number: 20210092825
    Abstract: An extreme ultraviolet generation apparatus is provided. The extreme ultraviolet generation apparatus includes a chamber, a droplet generator configured to provide a droplet into the chamber, a shroud which extends along a movement path of the droplet inside the chamber and surrounds the movement path of the droplet, a charging unit configured to charge the droplet, a monitoring unit configured to measure a position of the charged droplet, an alignment unit including at least one electromagnet, the alignment unit configured to correct the position of the charged droplet within the shroud using the at least one electromagnet, and an acceleration unit configured to accelerate the charged droplet after the position of the charged droplet has been corrected.
    Type: Application
    Filed: April 29, 2020
    Publication date: March 25, 2021
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: In Ho CHOI, Min Seok Choi, Jeong-Gil Kim, Hyuck Shin, In Jae Lee, Sung Ho Jang
  • Publication number: 20210036307
    Abstract: Provided are a method for designing an electrode for a lithium secondary battery comprising measuring the electrical conductivity of an electrode with an alternating current to determine whether an electrical path in the electrode has been appropriately formed, and a method for manufacturing an electrode for a lithium secondary battery comprising the same. According to the present invention, it is possible to determine the content of a conductive agent in the electrode using the same.
    Type: Application
    Filed: September 18, 2018
    Publication date: February 4, 2021
    Applicant: LG Chem, Ltd.
    Inventors: Ji Hye Park, Song Taek Oh, Jeong Gil Kim
  • Publication number: 20200295414
    Abstract: Disclosed herein are a secondary battery configured to be prevented from catching fire or exploding in a critical situation such as overcharging and a method of preventing the secondary battery from catching fire or exploding. Since a separator including a low melting point material is used, a short circuit in the battery occurs when the battery is abnormally heated, and the resistance of an electrode is increased when the temperature of the battery increases to a predetermined temperature or higher. As a result, a positive temperature coefficient (PTC) material is operated at a stable State of Charge (SoC). Consequently, it is possible to prevent the occurrence of a thermal runaway phenomenon of the battery.
    Type: Application
    Filed: October 25, 2018
    Publication date: September 17, 2020
    Applicant: LG CHEM, LTD.
    Inventors: Jeong Gil KIM, Jung Seok CHOI, Song Taek OH
  • Publication number: 20190020036
    Abstract: The present disclosure provides an electrode for a secondary battery including a current collector having an electrode tab protruding outward to at least one outer peripheral side thereof, an electrode mixture layer formed on the current collector, and an electrode protecting layer applied on the electrode mixture layer, wherein the electrode protecting layer includes a conductive material and a binder to supplement conductivity of the electrode mixture layer and prevent separation of the electrode mixture layer from the current collector.
    Type: Application
    Filed: August 21, 2017
    Publication date: January 17, 2019
    Applicant: LG Chem, Ltd.
    Inventors: Jeong Gil Kim, Hyo Sik Kim, Jeong Ho Ha, Ji Eun Lee, Sol Nip Lee
  • Patent number: 9469083
    Abstract: Inverted Nanocone Structures and Its Fabrication Process. The method of fabricating nanotextured structures includes making a master mold having an array of tapered structures to be replicated. The master mold is pressed into a curable polymer supported on a substrate and the polymer is cured. Thereafter, the mold is detached from the cured polymer to form the nanotextured structure.
    Type: Grant
    Filed: July 1, 2013
    Date of Patent: October 18, 2016
    Assignee: Massachusetts Institute of Technology
    Inventors: Hyungryul Choi, Jeong-gil Kim, Kyoo Chul Park, Robert E. Cohen, Gareth H. McKinley, George Barbastathis
  • Patent number: 9120669
    Abstract: Fabrication method. At least first and second hardmasks are deposited on a substrate, the thickness and materials of the first and second hardmask selected to provided etch selectivity with respect to the substrate. A nanoscale pattern of photoresist is created on the first hardmask and the hardmask is etched through to create the nanoscale pattern on a second hardmask. The second hardmask is etched through to create the desired taper nanocone structures in the substrate. Reactive ion etching is preferred. A glass manufacturing process using a roller imprint module is also disclosed.
    Type: Grant
    Filed: April 13, 2012
    Date of Patent: September 1, 2015
    Assignee: Massachusetts Institute of Technology
    Inventors: Hyungryul Choi, Chih-Hao Chang, Kyoo Chul Park, Gareth H McKinley, George Barbastathis, Jeong-gil Kim
  • Patent number: 8894406
    Abstract: Disclosed herein is a patterning mold configured to form a micropattern on a substrate or glass. The disclosed patterning mold includes a transfer body with a patterning part formed at one end of the transfer body to transfer a nanoparticle material to one surface of the substrate. The patterning mold further includes a fixing member coupled to an exterior of the transfer body, to prevent or reduce deformation of the exterior of the transfer body.
    Type: Grant
    Filed: September 9, 2011
    Date of Patent: November 25, 2014
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Eui Sun Choi, Eun Soo Hwang, Young Tae Cho, Dong Min Kim, Jeong Gil Kim, Jong Woo Lee, Eun Ah Park
  • Publication number: 20140010994
    Abstract: Inverted Nanocone Structures and Its Fabrication Process. The method of fabricating nanotextured structures includes making a master mold having an array of tapered structures to be replicated. The master mold is pressed into a curable polymer supported on a substrate and the polymer is cured. Thereafter, the mold is detached from the cured polymer to form the nanotextured structure.
    Type: Application
    Filed: July 1, 2013
    Publication date: January 9, 2014
    Applicant: Massachusetts Institute of Technology
    Inventors: Hyungryul Choi, Jeong-gil Kim, Kyoo Chul Park, Robert E. Cohen, Gareth H. McKinley, George Barbastathis
  • Patent number: 8557130
    Abstract: In forming a pattern on a substrate with reduced pattern error using a mold having an area smaller than an area of the substrate, a first resin pattern is formed on at least a first of a plurality of regions of an etching object layer by imprinting resin applied to the etching object layer using a first mold The etching object layer is then etched using the first resin pattern as an etching mask. A second resin pattern is formed on at least a second of the plurality of regions by imprinting resin applied to the etching object layer using a second mold. The etching object layer is again etched using the second resin pattern as an etching mask.
    Type: Grant
    Filed: December 8, 2009
    Date of Patent: October 15, 2013
    Assignee: Samsumg Electronics Co., Ltd.
    Inventors: Young Tae Cho, Suk Won Lee, Sin Kwon, Jung Woo Seo, Jeong Gil Kim
  • Patent number: 8424487
    Abstract: Disclosed herein is a roll-to-roll patterning apparatus and a patterning system using the same. The patterning system may include a supply roll to supply a film member, a recovery roll to recover the film member, and a roll-to-roll patterning apparatus forming a coating on the film member. The roll-to-roll patterning apparatus may include a pattern roller, a plurality of press rollers, and an alignment roller. The pattern roller may include an outer peripheral surface with a first pattern. The plurality of press rollers may press a film member against the pattern roller to form a second pattern on the film member. The alignment roller may be spaced apart from the pattern roller and may be arranged at an upstream position in a movement direction of the film member. The alignment roller may align the film member entering a region between the pattern roller and the plurality of press rollers.
    Type: Grant
    Filed: April 28, 2010
    Date of Patent: April 23, 2013
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Young Tae Cho, Sin Kwon, Ki Hyun Kim, Jung Woo Seo, Dong Min Kim, Jeong Gil Kim
  • Publication number: 20130025322
    Abstract: Fabrication method. At least first and second hardmasks are deposited on a substrate, the thickness and materials of the first and second hardmask selected to provided etch selectivity with respect to the substrate. A nanoscale pattern of photoresist is created on the first hardmask and the hardmask is etched through to create the nanoscale pattern on a second hardmask. The second hardmask is etched through to create the desired taper nanocone structures in the substrate. Reactive ion etching is preferred. A glass manufacturing process using a roller imprint module is also disclosed.
    Type: Application
    Filed: April 13, 2012
    Publication date: January 31, 2013
    Applicant: Massachusetts Institute of Technology
    Inventors: Hyungryul Choi, Chih-Hao Chang, Kyoo Chul Park, Gareth H. McKinley, George Barbastathis, Jeong-gil Kim
  • Publication number: 20120108717
    Abstract: An ink composition for flexo printing contains a dye type colorant in order to precisely print. The ink composition for flexo printing includes about 1 to 40 wt. % of a colorant, about 5 to 40 wt. % of a binder, about 20 to 95 wt. % of a solvent and a remainder of an additive, wherein the wt. % of the colorant, the binder, the solvent and the additive is based on a total weight of the ink composition.
    Type: Application
    Filed: July 21, 2011
    Publication date: May 3, 2012
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Eun Ah Park, Jong Woo Lee, Eun Soo Hwang, Young Tae Cho, Jeong Gil Kim
  • Patent number: 8168107
    Abstract: Example embodiments relate to a method of forming a three-dimensional micro pattern or a multi-step pattern using a nano imprinting process and a method of manufacturing a mold to form such a pattern. A molding polymer may be patterned in a one-step shape on a substrate having UV barrier patterns, thereby easing the manufacture of a mold for multi-step imprinting and simplifying the formation of a multi-step pattern using the one-step shaped mold by avoiding the repetition of more complicated processes. Consequently, it may be possible to form a relatively large-area micro pattern, a relatively large-area pattern usable in flat panel displays, and a nano pattern having a size of several tens of nanometers in a semiconductor process, thereby contributing to the reduction of process costs, the reduction of process time, and the improvement of production yield.
    Type: Grant
    Filed: May 28, 2009
    Date of Patent: May 1, 2012
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Young Tae Cho, Young Suk Sim, Jeong Gil Kim
  • Publication number: 20120082745
    Abstract: Disclosed herein is a patterning mold configured to form a micropattern on a substrate or glass. The disclosed patterning mold includes a transfer body with a patterning part formed at one end of the transfer body to transfer a nanoparticle material to one surface of the substrate. The patterning mold further includes a fixing member coupled to an exterior of the transfer body, to prevent or reduce deformation of the exterior of the transfer body.
    Type: Application
    Filed: September 9, 2011
    Publication date: April 5, 2012
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Eui Sun Choi, Eun Soo Hwang, Young Tae Cho, Dong Min Kim, Jeong Gil Kim, Jong Woo Lee, Eun Ah Park
  • Publication number: 20120080819
    Abstract: Disclosed herein is a patterning mold to form a micropattern on a substrate or glass. The disclosed patterning mold includes a body having a patterning part formed at one end of the body. The patterning part may be configured to contact a surface of the substrate, to form a channel. In example embodiments, an ink supply passage communicating with the channel may be formed in the patterning mold, to supply an ink to the channel. In example embodiments, a fixing member is coupled to an exterior of the transfer body, to prevent or reduce deformation of the exterior of the transfer body.
    Type: Application
    Filed: August 30, 2011
    Publication date: April 5, 2012
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Eui Son Choi, Eun Soo Hwang, Young Tae Cho, Dong Min Kim, Jeong Gil Kim, Jong Woo Lee, Eun Ah Park
  • Publication number: 20110300345
    Abstract: According to an example embodiment, a patterned surface includes a micro-structural surface with a micro or nano pattern on a substrate, wherein the micro-structural surface has superhydrophobic regions and superhydrophilic regions.
    Type: Application
    Filed: June 1, 2011
    Publication date: December 8, 2011
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Aleksandr Bessonov, Jung Woo Seo, Jeong Gil Kim, Suk Won Lee, Jong Woo Lee, Eun Soo Hwang, Young-Tae Cho
  • Publication number: 20100290143
    Abstract: Disclosed herein are a color filter having a black matrix and an apparatus and method of manufacturing the same. The method may include applying an organic film to a substrate, forming a pattern on the organic film by applying pressure to the organic film with a mold having prominences and depressions, and forming a black matrix by applying an ink to the pattern of the organic film. The formation of the black matrix may be achieved by a roll to roll method. The black matrix is easily formed by carrying out imprinting and printing on the organic film applied to the substrate. The black matrix may have a fine line width of a nano level by imprinting and printing. Further, since the black matrix is formed by the roll to roll method, material costs may be reduced and the color filter may be manufactured at a relatively high speed.
    Type: Application
    Filed: April 20, 2010
    Publication date: November 18, 2010
    Inventors: Jeong Gil Kim, Young Tae Cho, Suk Won Lee, Sin Kwon, Ki Hyun Kim, Jung Woo Seo
  • Publication number: 20100282162
    Abstract: Disclosed herein is a roll-to-roll patterning apparatus and a patterning system using the same. The patterning system may include a supply roll to supply a film member, a recovery roll to recover the film member, and a roll-to-roll patterning apparatus forming a coating on the film member. The roll-to-roll patterning apparatus may include a pattern roller, a plurality of press rollers, and an alignment roller. The pattern roller may include an outer peripheral surface with a first pattern. The plurality of press rollers may press a film member against the pattern roller to form a second pattern on the film member. The alignment roller may be spaced apart from the pattern roller and may be arranged at an upstream position in a movement direction of the film member. The alignment roller may align the film member entering a region between the pattern roller and the plurality of press rollers.
    Type: Application
    Filed: April 28, 2010
    Publication date: November 11, 2010
    Inventors: Young Tae Cho, Sin Kwon, Ki Hyun Kim, Jung Woo Seo, Dong Min Kim, Jeong Gil Kim