Abstract: A vacuum cleaner that includes a first cleaner module and a second cleaner module that is removably coupled to the first cleaner module. The first cleaner module includes a first body and a first dust collection unit, and the second cleaner module includes a second body and a second dust collection unit. Thus, when done in an upright mode, cleaning can be done with a sufficiently great suction force. When done in a handy mode after the second cleaner module is separated, cleaning can be easily done using the second cleaner module.

Abstract: A vacuum cleaner that includes an upright main body, an upright fan motor generating a suction force, and a wheel assembly that is mounted on the upright main body and guides movement and rotation of the upright main body. The upright main body includes a first housing that is installed on the wheel assembly so as to be rotatable in a leftward/rightward direction, and a second housing that is installed in the first housing so as to be rotatable in a forward/backward direction. The vacuum cleaner can be moved and rotated by freely moving an extension frame extending upward from the second housing in forward, backward, leftward, and rightward directions.

Abstract: Provided is a plasma generating device. The plasma generating device includes: an RF power supply providing an RF signal; a plasma chamber providing a space where gas is injected to generate plasma; a first electromagnetic inducer installed at one portion of the plasma chamber and inducing an electromagnetic field in the plasma chamber as the RF signal is applied; a second electromagnetic inducer installed at another portion of the plasma chamber and inducing an electromagnetic field in the plasma chamber as the RF signal is applied; a first load connected to the first electromagnetic inducer; a second load connected to the second electromagnetic inducer; and a controller controlling a power supplied to the first electromagnetic inducer and the second electromagnetic inducer by adjusting at least one impedance of the first load and the second load.

Abstract: A vacuum cleaner is provided that includes a cleaner body; a dust separating apparatus fixed to the cleaner body; a first dust receptacle detachably attached to the cleaner body on a bottom portion of the dust separating apparatus to collect large particle dust; a second dust receptacle detachably attached to the cleaner body on a bottom portion of the first dust receptacle to collect fine particle dust; and a locking device having a first position in which the dust separating apparatus is closely contacted to the first and second dust receptacles, and a second position in which the dust separating apparatus is spaced apart from the first and second dust receptacles at a predetermined interval. The second dust receptacle is detached from the first dust receptacle at the second position, and is detached from the cleaner body after the first dust receptacle is disengaged from the cleaner body.

Abstract: A vacuum cleaner having a dual locking structure is provided. The vacuum cleaner includes a brush assembly, a main body connected to the brush assembly, a dust bin arranged on the main body, a fastening unit to move the dust bin to a fastened or unfastened state, and a filter casing. The dust bin includes one or more first locking holes and the main body includes one or dust bin locking members to be engaged with the first locking holes so that the dust bin, in an unfastened state, is removably retained in the main body. The filter casing includes one or more filter casing locking portions and the main body includes one or more filter casing locking members to be engaged with the filter casing locking portions so that the filter casing in the unfastened state is removably retained in the main body.

Abstract: An upright-type vacuum cleaner is provided. The upright-type vacuum cleaner includes a cleaner body comprising a motor chamber in which a suction motor is mounted, a brush assembly connected to the cleaner body, a discharge filter unit mounted on a first surface of the cleaner body, to filter out impurities from an air stream discharged from the suction motor, and a cord reel assembly mounted on a second surface of the cleaner body and having a power cord. The discharge filter unit includes a filter member mountable and demountable to and from the cleaner body by a user outside the vacuum cleaner, and at least a part of an air stream filtered by the filter member shifts a direction to pass through the cord reel assembly.

Abstract: Provided is a photomask cleaning apparatus. The apparatus may include a photomask chuck, a cleaning arm and a nozzle set. The nozzle set may be installed in an end portion of the cleaning arm. The nozzle set may include a first nozzle and a second nozzle. The first nozzle and the second nozzle may be a bar-type shape and parallel to each other.

Abstract: A vacuum cleaner for use in both an upright form and a canister form, which can mount and dismount a cleaner body to and from a suction nozzle assembly is disclosed. The vacuum cleaner includes a suction nozzle assembly to draw in dust or dirt along with air while moving along a surface to be cleaned; a cleaner body having a dust separating unit to separate and collect the dust or dirt from the air drawn in from the surface to be cleaned; a supporting unit hingedly joined to the suction nozzle assembly to support a lower part of the cleaner body to communicate with the suction nozzle assembly; and a locking unit to detachably lock the lower part of the cleaner body to the supporting unit.

Abstract: An upright-type vacuum cleaner is provided. The upright-type vacuum cleaner includes a cleaner body comprising a motor chamber in which a suction motor is mounted, a brush assembly connected to the cleaner body, a discharge filter unit mounted on a first surface of the cleaner body, to filter out impurities from an air stream discharged from the suction motor, and a cord reel assembly mounted on a second surface of the cleaner body and having a power cord. The discharge filter unit includes a filter member mountable and demountable to and from the cleaner body by a user outside the vacuum cleaner, and at least a part of an air stream filtered by the filter member shifts a direction to pass through the cord reel assembly.

Abstract: A vacuum cleaner having a dual locking structure is provided. The vacuum cleaner includes a brush assembly, a main body connected to the brush assembly, a dust bin arranged on the main body, a fastening unit to move the dust bin to a fastened or unfastened state, and a filter casing. The dust bin includes one or more first locking holes and the main body includes one or dust bin locking members to be engaged with the first locking holes so that the dust bin, in an unfastened state, is removably retained in the main body. The filter casing includes one or more filter casing locking portions and the main body includes one or more filter casing locking members to be engaged with the filter casing locking portions so that the filter casing in the unfastened state is removably retained in the main body.

Abstract: The present disclosure relates to a suction brush for a vacuum cleaner, which is connected to a suction extension pipe connected to a main body of the vacuum cleaner and draws in foreign materials using a suction force generated in the main body. The suction brush includes a bottom housing with a dust entering port; a top housing connected to the bottom housing so as to cover the bottom housing; a connector disposed between the top housing and the bottom housing, the connector connected to the suction extension pipe; and a flow rate controller disposed at the connector, the flow rate controller controlling a volume of the air entering through the dust entering port so as to control a suction force.

Abstract: A method for measuring critical dimensions of a pattern using an overlay measuring apparatus is provided. The method includes setting a first scan range, inputting a step pitch for the overlay measuring apparatus, inputting X and Y coordinates of a point on a reticle, and inputting a size of the reference pattern. The method further includes inputting a position of the reference pattern, inputting a second scan range, measuring the size of the reference pattern, and inputting an ideal pattern size. The method still further includes measuring a size and a first Z-axial focus position of a top region of the reference pattern, storing the first Z-axial focus position, measuring a size of the selected pattern of the first wafer using stored reference information, and determining whether the size of the selected pattern is suitable relative to the ideal pattern size.

Abstract: A vacuum cleaner is provided that includes a cleaner body; a dust separating apparatus fixed to the cleaner body; a first dust receptacle detachably attached to the cleaner body on a bottom portion of the dust separating apparatus to collect large particle dust; a second dust receptacle detachably attached to the cleaner body on a bottom portion of the first dust receptacle to collect fine particle dust; and a locking device having a first position in which the dust separating apparatus is closely contacted to the first and second dust receptacles, and a second position in which the dust separating apparatus is spaced apart from the first and second dust receptacles at a predetermined interval. The second dust receptacle is detached from the first dust receptacle at the second position, and is detached from the cleaner body after the first dust receptacle is disengaged from the cleaner body.

Abstract: An apparatus for adjusting a height of a suction brush for use in a vacuum cleaner includes a height adjusting knob rotatably disposed in an inserting recess formed in the suction brush, and having an inclined part formed thereon, so that a height of the suction brush from a surface to be cleaned is varied as a position of the height adjusting knob rotated, a supporting member to support the suction brush in contact with the inclined part thus to allow the suction brush to be ascended and descended by the inclined part, and a passage disposed between an inner circumferential surface of the inserting recess and an outer circumferential surface of the height adjusting knob to pass fine dirt therethrough. With the passage, the fine dirt is not tied up between the inner circumferential surface of the inserting recess and the outer circumferential surface of the height adjusting knob. Accordingly, the rotation of the height adjusting knob is not restricted or obstructed due to the fine dirt.

Abstract: A vacuum cleaner for use in both an upright form and a canister form, which can mount and dismount a cleaner body to and from a suction nozzle assembly is disclosed. The vacuum cleaner includes a suction nozzle assembly to draw in dust or dirt along with air while moving along a surface to be cleaned; a cleaner body having a dust separating unit to separate and collect the dust or dirt from the air drawn in from the surface to be cleaned; a supporting unit hingedly joined to the suction nozzle assembly to support a lower part of the cleaner body to communicate with the suction nozzle assembly; and a locking unit to detachably lock the lower part of the cleaner body to the supporting unit.

Abstract: A vacuum cleaner including a sterilizing unit is provided. The sterilizing unit includes a hot air circulating duct and an air passage switching part. The hot air circulating duct is disposed between a motor chamber and an air inflow part of the dust separating unit to guide air from the motor chamber to the air inflow part of the dust separating unit. The air passage switching part is disposed at a place where the air inflow part, the suction hose and the hot air circulating duct intersect. The air passage switching part is movable between a cleaning position and a sterilizing position to switch a flow of air, the cleaning position being a position that blocks off between the air inflow part and the hot air circulating duct and the sterilizing position being a position that blocks off between the air inflow part and the suction hose.

Abstract: An overlay measurement method and related apparatus are provided in which overlay measurement data is calculated on the basis of distances measured in disparate manners in relation to whether the current process is an initial process or a subsequent process. Related overlay marks are also described.

Abstract: Provided are an overlay mark of a semiconductor device and a semiconductor device including the overlay mark. The overlay mark includes: reference marks formed in rectangular shapes comprising sides in which fine patterns are formed; and comparison marks formed as rectangular shapes which are smaller than the rectangular shapes of the reference marks and formed of fine patterns, wherein the number of comparison marks is equal to the number of reference marks, wherein the reference marks and the comparison marks are formed on different thin films formed on a semiconductor substrate to be used to inspect alignment states of the different thin films, and the overlay mark reflects an effect of aberration of patterns of memory cells through the fine patterns during a calculation of MR (mis-registration).

Abstract: The present disclosure relates to a handle unit for a vacuum cleaner. The handle unit for the vacuum cleaner for controlling a cleaner body of the vacuum cleaner includes a handle body of the vacuum cleaner; and a supporting unit projected from one side of the handle body, the supporting unit holding an accessory brush, wherein the supporting unit and the handle body is molded in a single piece by the injection molding process.

Abstract: A method for measuring critical dimensions of a pattern using an overlay measuring apparatus is provided. The method includes setting a first scan range, inputting a step pitch for the overlay measuring apparatus, inputting X and Y coordinates of a point on a reticle, and inputting a size of the reference pattern. The method further includes inputting a position of the reference pattern, inputting a second scan range, measuring the size of the reference pattern, and inputting an ideal pattern size. The method still further includes measuring a size and a first Z-axial focus position of a top region of the reference pattern, storing the first Z-axial focus position, measuring a size of the selected pattern of the first wafer using stored reference information, and determining whether the size of the selected pattern is suitable relative to the ideal pattern size.