Abstract: A method for manufacturing a semiconductor device includes providing a first pre-reticle including a first overlay mark and a first on-cell pattern. A second pre-reticle is provided that includes a second overlay mark and a second on-cell pattern. A first pattern is formed from the first pre-reticle using a first illumination system. A second pattern is formed from the second pre-reticle using a second illumination system. An overlay error is measured between the first pattern and the second pattern. A corrected reticle is formed based on the measured overlay error.

Abstract: A method for fabricating a semiconductor device using an overlay measurement and a semiconductor device fabricated by the method are provided. The method includes forming a lower pattern including a lower overlay key pattern having a first pitch, on a substrate, forming an upper pattern including an upper overlay key pattern having a second pitch different from the first pitch, on the lower pattern, measuring an overlay between the lower overlay key pattern and the upper overlay key pattern, removing the upper overlay key pattern, and after removing the upper overlay key pattern, performing an etching process using the upper pattern as an etching mask.

Abstract: A pulse-based flip flop circuit includes a pulse generator generating a pulse signal and an inverted pulse signal, a scan hold buffer holding a scan input signal for a delay time, and a latch circuit including an intermediate node receiving either a data signal or the scan input signal responsive to a scan enable signal, the pulse signal and the inverted pulse signal. The pulse generator circuit includes a direct path providing a clock signal as a direct path input to a NAND circuit; a delay path including a number of plural stages that delay the clock signal and provide a delayed clock signal as a delay path input to the NAND circuit that performs a NAND operation on the direct path and delay path inputs to generate the inverted pulse signal; and a feedback path providing the pulse signal to a first stage among the stages of the delay path.

Abstract: An image sensor includes a first semiconductor substrate, a photoelectric conversion region in the first semiconductor substrate, and a buried insulating film on the first semiconductor substrate. The buried insulating film covers a first region of the first semiconductor substrate and exposes a second region of the first semiconductor substrate. The sensor includes a second semiconductor substrate on the buried insulating film, an operating gate structure defining a first channel of a first conductive type in the second semiconductor substrate, and a transfer gate structure defining a second channel of a second conductive type different from the first conductive type in the second region of the first semiconductor substrate.

Abstract: A pulse-based flip flop circuit includes; a pulse generator generating a pulse signal and an inverted pulse signal, a scan hold buffer holding a scan input signal for a delay time, and a latch circuit including an intermediate node receiving one of a data signal and the scan input signal in response to a scan enable signal, the pulse signal and the inverted pulse signal. The pulse generator circuit includes; a direct path providing a clock signal as a direct path input to a NAND circuit, a delay path including a number of stages configured to delay the clock signal and provide a delayed clock signal as a delay path input to NAND circuit, wherein the NAND circuit performs a NAND operation on the direct path input and the delay path input to generate the inverted pulse signal, and a feedback path providing the pulse signal to a first stage among the number of stages of the delay path.

Abstract: Various embodiments of the present invention provide a method and apparatus for preventing a user's unintentional touch input in an electronic device. According to various embodiments of the present invention, an electronic device may comprise: a display for displaying a user interface; a memory; and a processor functionally connected to the display and the memory, wherein the processor is configured to set a touch blocking area in the edge area of the display, determine an exception area in the touch blocking area on the basis of the user interface, remove the determined exception area from the touch blocking area, so as to set a final touch blocking area, and process a touch event on the edge area on the basis of the final touch blocking area. Various embodiments are possible.

Abstract: An electronic device includes a display displaying an execution screen of an application, a touch pad receiving a user input associated with control of the execution screen, and a processor controlling scroll processing of the execution screen. The processor is configured to divide the touch pad into a plurality of virtual regions and to add a first threshold value of a minimum magnitude for determining that the continuous user input is a scroll control input of the execution screen to the second coordinates when the user input is continuous from first coordinates of a first virtual region to second coordinates of a second virtual region adjacent to the first virtual region at a specified speed or more.

Abstract: An electronic device is provided. The electronic device includes a touch input device, a touch control circuit configured to generate touch information about a touch input detected by the touch input device, at least one processor, and a memory. The memory stores instructions, when executed, causing the at least one processor to obtain touch information about a first touch input at least once from the touch control circuit after a first time when the first touch input begins to a second time when the first touch input is released, obtain at least one of an area of the first touch input or a pressure of the first touch input based on the obtained touch information, and execute a function corresponding to release of the first touch input if the at least one of the area of the first touch input or the pressure of the first touch input meets a specified condition.

Abstract: An electronic device includes a display displaying an execution screen of an application, a touch pad receiving a user input associated with control of the execution screen, and a processor controlling scroll processing of the execution screen. The processor is configured to divide the touch pad into a plurality of virtual regions and to add a first threshold value of a minimum magnitude for determining that the continuous user input is a scroll control input of the execution screen to the second coordinates when the user input is continuous from first coordinates of a first virtual region to second coordinates of a second virtual region adjacent to the first virtual region at a specified speed or more.

Abstract: An apparatus and method for processing a user input in an electronic device are provided. The electronic device includes a touch device detecting a touch input; a pressure device detecting a pressure input; and at least one processor. The at least one processor is configured to if the pressure input is detected, generate an event corresponding to the pressure input, determine if the touch input is detected while the pressure input is detected, if the touch input is detected while the pressure input is detected, update the event to correspond to the pressure input and the touch input, and process the updated event.

Abstract: Various embodiments of the present invention provide a method and apparatus for preventing a user's unintentional touch input in an electronic device. According to various embodiments of the present invention, an electronic device may comprise: a display for displaying a user interface; a memory; and a processor functionally connected to the display and the memory, wherein the processor is configured to set a touch blocking area in the edge area of the display, determine an exception area in the touch blocking area on the basis of the user interface, remove the determined exception area from the touch blocking area, so as to set a final touch blocking area, and process a touch event on the edge area on the basis of the final touch blocking area. Various embodiments are possible.

Abstract: A method for measuring wafer alignment is provided. The method includes providing a plurality of first mark patterns extending in a first direction on a wafer, providing at least one second mark pattern on the first mark patterns such that it overlaps and intersects the first mark patterns, irradiating an optical signal onto the first mark patterns and the second mark pattern and obtaining coordinates of the second mark pattern by detecting signals from the second mark pattern.

Abstract: An electronic device is provided. The electronic device includes a touch input device, a touch control circuit configured to generate touch information about a touch input detected by the touch input device, at least one processor, and a memory. The memory stores instructions, when executed, causing the at least one processor to obtain touch information about a first touch input at least once from the touch control circuit after a first time when the first touch input begins to a second time when the first touch input is released, obtain at least one of an area of the first touch input or a pressure of the first touch input based on the obtained touch information, and execute a function corresponding to release of the first touch input if the at least one of the area of the first touch input or the pressure of the first touch input meets a specified condition.

Abstract: An solder ball mounter includes a stage configured to support a substrate, a ball placer head configured to provide solder balls, and a solder ball mask configured to align the solder balls with the substrate. The solder ball mask includes an upper mask layer including an upper opening having a first diameter, a middle mask layer including a middle opening having a second diameter that is larger than the first diameter, and a lower mask layer.

Abstract: A method may include forming a first grating and a second grating, disposed in a region of vertical overlap of the first and second gratings on different levels, respectively, having substantially the same pitch, and inclined with respect to each other, such that a bias value between the first and second gratings is changed along a length direction of the first and second gratings, using a lithography process. A method may include emitting a beam to the first and second gratings; and obtaining trend information associated with a diffracted beam from an image pattern of a beam from the first and second gratings, using the emitted beam, in which the trend information may concern changes in the intensity of the diffracted beam according to the bias value. An overlay error in at least one grating may be determined based on the trend information and an intensity of a diffracted beam.

Abstract: An apparatus and method for processing a user input in an electronic device are provided. The electronic device includes a touch device detecting a touch input; a pressure device detecting a pressure input; and at least one processor. The at least one processor is configured to if the pressure input is detected, generate an event corresponding to the pressure input, determine if the touch input is detected while the pressure input is detected, if the touch input is detected while the pressure input is detected, update the event to correspond to the pressure input and the touch input, and process the updated event.

Abstract: A method may include forming a first grating and a second grating, disposed in a region of vertical overlap of the first and second gratings on different levels, respectively, having substantially the same pitch, and inclined with respect to each other, such that a bias value between the first and second gratings is changed along a length direction of the first and second gratings, using a lithography process. A method may include emitting a beam to the first and second gratings; and obtaining trend information associated with a diffracted beam from an image pattern of a beam from the first and second gratings, using the emitted beam, in which the trend information may concern changes in the intensity of the diffracted beam according to the bias value. An overlay error in at least one grating may be determined based on the trend information and an intensity of a diffracted beam.

Abstract: A method for measuring wafer alignment is provided. The method includes providing a plurality of first mark patterns extending in a first direction on a wafer, providing at least one second mark pattern on the first mark patterns such that it overlaps and intersects the first mark patterns, irradiating an optical signal onto the first mark patterns and the second mark pattern and obtaining coordinates of the second mark pattern by detecting signals from the second mark pattern.

Abstract: A method of controlling an activation area of a touch screen panel and an electronic device using the same. A method of operating an electronic device, according to an embodiment of the present disclosure, may include: setting a partial area of a touch screen panel, which corresponds to a view window of a cover that is mounted on the electronic device, as an effective touch area when the cover is closed; and when the cover mounted on the electronic device is closed, activating the partial area of the touch screen panel that corresponds to the set effective touch area. In addition, the various embodiments of the present disclosure also include other embodiments as well as the above-described embodiment.

Abstract: A method of detecting an asymmetric portion of an overlay mark includes forming a plurality of virtual overlay marks having a plurality of virtual asymmetric portions. The virtual asymmetric portions may have different sizes with respect to a reference model profile of a reference overlay mark. Virtual information with respect to each virtual overlay mark may be obtained. The virtual information of the virtual overlay marks may be compared with actual information of an actual overlay mark to identify virtual information of the virtual overlay mark corresponding to the actual information of the actual overlay mark. Thus, measuring the overlay of the actual overlay mark may be performed under than the actual asymmetric portion may be excluded from the actual overlay mark, so that the overlay may be accurately measured. As a result, errors may not be generated in a correcting process to a layer using the accurate overlay.