Abstract: The present invention relates to a gas turbine blade having a shelf squealer tip, the gas turbine blade including an airfoil-shaped blade housing, and a squealer tip extending from an edge portion of a tip surface that is an end surface of the blade housing, in which the squealer tip is formed only on a part of the edge portion of the tip surface. According to the present invention, it is possible to maximize film-cooling performance on the tip surface and additionally reduce an aerodynamic loss by suppressing high-temperature main flow reattachment and swirl flow generation on the tip surface.

Abstract: An airfoil cooling structure, an airfoil having the airfoil cooling structure, and a turbine blade/vane element including the airfoil are disclosed. The airfoil cooling structure includes a cooling path formed inside the airfoil and having a first surface and a second surface opposite to the first surface, and an additive manufactured (AM) feature disposed in the cooling path, manufactured by additive manufacturing, and including a plurality of column parts intersecting with each other so as to abut against the first surface and the second surface.

Abstract: An airfoil cooling structure, an airfoil having the airfoil cooling structure, and a turbine blade/vane element including the airfoil are disclosed. The airfoil cooling structure includes a cooling path formed inside the airfoil and having a first surface and a second surface opposite to the first surface, and an additive manufactured (AM) feature disposed in the cooling path, manufactured by additive manufacturing, and including a plurality of column parts intersecting with each other so as to abut against the first surface and the second surface.

Abstract: Provided is a UV reaction apparatus for treating waste liquid caused by system decontamination in a nuclear power plant. The UV reaction apparatus comprises a UV irradiation unit for irradiating UV light as a bar-shaped body; and a transit unit accommodating the UV irradiation unit therein, and for passing organic waste liquid to be irradiated with the UV light, wherein the transit unit comprises, an input unit, into which the organic waste liquid is input a discharge unit, through which the organic waste liquid is discharged, and an intermediate unit located between the input unit and the discharge unit, and in which the UV irradiation unit is located.

Abstract: Provided is a device for monitoring degradation of wastewater from nuclear power plant decontamination. The device for monitoring degradation of wastewater from nuclear power plant decontamination comprises a UV reactor connected to a first flow path and for UV-treating introduced wastewater; a wastewater degradation flow path for supplying the wastewater discharged from the UV reactor to the first flow path; a wastewater degradation detecting unit for analyzing components of the wastewater supplied from the wastewater degradation flow path and detecting whether a set condition is satisfied; and a purification flow path for purifying and supplying the wastewater supplied from the UV reactor to the first flow path when the set condition is satisfied.

Abstract: Provided is a gas turbine vane and blade assembly in which lattice structures are installed between an impingement plate and an effusion plate. The gas turbine vane and blade assembly is capable of enhancing cooling efficiency in an impingement/effusion cooling technique. In addition, the gas turbine vane and blade assembly can be manufactured using an additive manufacturing technique, and the lattice structures are capable of replacing supports that are used during an additive manufacturing process, and improving not only structural rigidity and stability but also cooling performance.

Abstract: Provided is a gas turbine vane and blade assembly in which lattice structures are installed between an impingement plate and an effusion plate. The gas turbine vane and blade assembly is capable of enhancing cooling efficiency in an impingement/effusion cooling technique. In addition, the gas turbine vane and blade assembly can be manufactured using an additive manufacturing technique, and the lattice structures are capable of replacing supports that are used during an additive manufacturing process, and improving not only structural rigidity and stability but also cooling performance.

Abstract: A cooling structure for a trailing edge of a turbine blade is provided. The cooling structure for the trailing edge of the turbine blade comprising an airfoil shaped blade part including a leading edge, a trailing edge, a pressure surface and a suction surface connecting the leading edge and the trailing edge, and a cavity channel formed in the blade part and through which a cooling fluid flows, the cooling structure including slots and lands arranged alternately on the trailing edge along a span direction of the pressure surface by cutting a portion of the pressure surface, the slots communicating with the cavity channel and defined by adjacent lands where the pressure surface remains, wherein a pin-fin structure is disposed in the cavity channel on an upstream side of the slot, and wherein the cooling fluid is introduced through a micro-channel formed inside the pin-fin structure and is discharged through film cooling holes formed in the pressure surface.

Abstract: Provided is a semiconductor pressure sensor which includes: five connection pads having plate shapes and formed of conductive materials, respectively, and arranged in parallel with each other; and four semiconductor resistance units connecting a predetermined pair of the connection pads to each other among the connection pads and having resistance values varying in proportion to a variation of a length due to the external pressure, wherein the five connection pads include a power supply pad, a first output voltage pad, a first ground pad, a second output voltage pad, and a second ground pad.

Abstract: Provided is a semiconductor pressure sensor which includes: five connection pads having plate shapes and formed of conductive materials, respectively, and arranged in parallel with each other; and four semiconductor resistance units connecting a predetermined pair of the connection pads to each other among the connection pads and having resistance values varying in proportion to a variation of a length due to the external pressure, wherein the five connection pads include a power supply pad, a first output voltage pad, a first ground pad, a second output voltage pad, and a second ground pad.

Abstract: Disclosed are a compound which works as electronic materials such as a molecular memory, a molecular switch, a molecular rectifier, a molecular wire, and so on, and a molecular electronic device including the same. The compound for molecular electronic device has the structure of following Formula 1, (MnRM)n??<Formula 1> wherein, R is a single molecule having an electrical conductivity, M is independently a repeating unit constituting a polymer having an electrical conductivity, and n is independently an integer ranging from 100 to 500.

Abstract: Disclosed are a compound which works as electronic materials such as a molecular memory, a molecular switch, a molecular rectifier, a molecular wire, and so on, and a molecular electronic device including the same. The compound for molecular electronic device has the structure of following Formula 1, (MnRM)n??<Formula 1> wherein, R is a single molecule having an electrical conductivity, M is independently a repeating unit constituting a polymer having an electrical conductivity, and n is independently an integer ranging from 100 to 500.

Abstract: A method and apparatus for uniformly supplying a gas into a chamber through a dispersion head. The gas is introduced through an inlet of the dispersion head, and flows in a flow direction toward a first diffuser arranged in the dispersion head. The gas is diffused a first time within the dispersion head by dispersing the gas along side directions different than the flow direction by contacting the gas and the first diffuser. A portion of the first diffused gas is guided through an outlet of the dispersion head and toward a work piece arranged in a chamber. A remaining portion of the first diffused gas is diffused a second time by contacting the gas and a second diffuser disposed between the first diffuser and the work piece, by dispersing the gas along side directions different than the flow direction. A portion of the twice diffused gas is guided through the outlet of the dispersion head and toward the work piece arranged in the chamber.

Abstract: A method and apparatus for uniformly supplying a gas into a chamber through a dispersion head. The gas is introduced through an inlet of the dispersion head, and flows in a flow direction toward a first diffuser arranged in the dispersion head. The gas is diffused a first time within the dispersion head by dispersing the gas along side directions different than the flow direction by contacting the gas and the first diffuser. A portion of the first diffused gas is guided through an outlet of the dispersion head and toward a work piece arranged in a chamber. A remaining portion of the first diffused gas is diffused a second time by contacting the gas and a second diffuser disposed between the first diffuser and the work piece, by dispersing the gas along side directions different than the flow direction. A portion of the twice diffused gas is guided through the outlet of the dispersion head and toward the work piece arranged in the chamber.

Abstract: A method and apparatus for uniformly supplying a gas into a chamber through a dispersion head. The gas is introduced through an inlet of the dispersion head, and flows in a flow direction toward a first diffuser arranged in the dispersion head. The gas is diffused a first time within the dispersion head by dispersing the gas along side directions different than the flow direction by contacting the gas and the first diffuser. A portion of the first diffused gas is guided through an outlet of the dispersion head and toward a work piece arranged in a chamber. A remaining portion of the first diffused gas is diffused a second time by contacting the gas and a second diffuser disposed between the first diffuser and the work piece, by dispersing the gas along side directions different than the flow direction. A portion of the twice diffused gas is guided through the outlet of the dispersion head and toward the work piece arranged in the chamber.

Abstract: A method and apparatus for uniformly supplying a gas into a chamber through a dispersion head. The gas is introduced through an inlet of the dispersion head, and flows in a flow direction toward a first diffuser arranged in the dispersion head. The gas is diffused a first time within the dispersion head by dispersing the gas along side directions different than the flow direction by contacting the gas and the first diffuser. A portion of the first diffused gas is guided through an outlet of the dispersion head and toward a work piece arranged in a chamber. A remaining portion of the first diffused gas is diffused a second time by contacting the gas and a second diffuser disposed between the first diffuser and the work piece, by dispersing the gas along side directions different than the flow direction. A portion of the twice diffused gas is guided through the outlet of the dispersion head and toward the work piece arranged in the chamber.