Abstract: A deposition mask includes a silicon substrate including cell areas and a mask frame area excluding the cell areas, the mask frame area including a mask rip area partitioning the cell areas and an outer frame area disposed at an outermost portion of the silicon substrate, a mask rip disposed in the mask rip area, a mask membrane disposed in each of the cell areas, a first metal frame disposed in the outer frame area, and a second metal frame surrounding an outer portion of the silicon substrate and connected to the first metal frame.

Abstract: A method of fabricating a mask includes defining cell areas and a mask frame area on a silicon substrate, the mask frame area excluding the cell areas, the mask frame area may include a mask rib region partitioning the cell areas and an outer frame region disposed at an outermost position of the silicon substrate, forming a groove in the mask rib region, forming a metal mask rib by forming a metal in the groove, forming a photoresist pattern including openings in each of the cell areas, growing a plating film in each of the cell areas, forming a mask membrane formed of the plating film by removing the photoresist pattern, and etching a rear surface of the silicon substrate to form cell openings associated with the cell areas, respectively.

Abstract: A method of fabricating a deposition mask includes forming a wrinkle pattern in a mask rib region and including grooves by partially etching a front surface of a silicon substrate, forming a first photoresist pattern including first openings on a front surface of the silicon substrate in each of cell areas, growing a first plating film covering the grooves of the wrinkle pattern and a second plating film covering first openings of the first photoresist pattern, removing the first photoresist pattern, forming a second photoresist pattern in outer frame areas on a rear surface of the silicon substrate, and exposing a rear surface of metal mask ribs formed with the first plating film and a rear surface of a mask membrane formed with the second plating film by partially etching the rear surface of the silicon substrate using the second photoresist pattern.

Abstract: A method for manufacturing a deposition mask includes depositing a seed metal layer on a front surface of a silicon substrate, forming a first photoresist pattern defining first openings on the seed metal layer, growing a plating layer in the first openings of the first photoresist pattern, forming a mask membrane by removing the first photoresist pattern and leaving the plating layer, depositing a protection layer to cover a front surface of the mask membrane, forming a second photoresist pattern defining cell opening corresponding to unit masks, respectively, on a back surface of the silicon substrate, exposing the seed metal layer by etching the back surface of the silicon substrate using the second photoresist pattern as a mask, exposing a back surface of the mask membrane by etching the seed metal layer using the second photoresist pattern as a mask, and removing the protection layer.

Abstract: A deposition mask includes a mask body including a silicon substrate, where a plurality of holes is defined through the mask body, and the mask body further includes mask grids extending to define the holes. A cross section of each mask grid has a reverse tapered shape having a width increasing from a back surface to an upper surface of the deposition mask, and each side surface of each mask grid defining a hole includes a first concave curved surface.

Abstract: A deposition mask, method for manufacturing the same, and display device manufactured using the same. The deposition mask includes a mask substrate including an opening, and a mask pattern disposed on the mask substrate and including multiple hole patterns spaced apart from each other, wherein the mask pattern includes a first portion on the mask substrate, and a second portion protruding from the first portion in a direction opposite to the mask substrate, the second portion includes a first protruding portion and a second protruding portion disposed to be adjacent to the hole patterns, and a recessed portion disposed between the first protruding portion and the second protruding portion, and a height of the recessed portion may be smaller than heights of the first protruding portion and the second protruding portion.

Abstract: A mask includes a body frame defining at least one opening arranged on a plane, at least one sub-mask overlapping the opening, and defining holes through which a deposition material is able to pass, and an aligner between the sub-mask and the body frame, and configured to move the sub-mask within the opening in response to applied voltages.

Abstract: A block heater is disclosed. The block heater may include a heating element configured to supply predetermined heat to a gas line and a heat transfer unit disposed between the gas line and the heating element to transfer heat to the gas line, wherein the heat transfer unit may include a convex portion or a concave portion formed on at least one side thereof in a longitudinal direction of the gas line.

Abstract: The disclosure is related to a real-time analysis of social network service (SNS) data associated with a multimedia content service. Particularly, SNS users may be classified into active SNS users and non-active SNS users, based on an SNS activity amount. SNS data collection/analysis periods may be differently determined according to SNS user types. Furthermore, a statistical analysis result of the SNS data may be directly or indirectly provided to one or more user equipment such that the SNS data analysis result can be displayed along with a corresponding multimedia content.