Abstract: Provided are an ultrasound system and a method for operating the ultrasound system, which may calculate a direction of an ultrasonic beam in real time and may adjust the ultrasonic beam based on the calculation result. The ultrasound system may include a probe to emit an ultrasonic beam to an object, a processor to measure a first reflection angle of the ultrasonic beam at a predetermined point in the object, a mapping table to map the measured first reflection angle to the predetermined point and to record mapping data, and a controller to determine an emission angle of the ultrasonic beam to the predetermined point based on the first reflection angle recorded in the mapping table, and to control the probe to emit the ultrasonic beam at the determined emission angle.

Abstract: Provided are an ultrasound system and a method for operating the ultrasound system, which may irradiate an ultrasonic beam at various angles, may process a reflected ultrasonic echo signal to generate partial images, and may combine the partial images. The ultrasound system may include a beam irradiating unit to irradiate an ultrasonic beam onto an object at different irradiation angles for each frame, an image processing unit to process a reflected and returned ultrasonic echo signal to generate a partial image, and an image combining unit to combine and render the partial images generated at different irradiation angles for each frame to extend an angle of view of the object.

Abstract: Disclosed are a photosensitive compound containing oxime group which is directly decomposed by exposure to light, which is a molecular resist whose size is smaller than conventional polymer for photoresist, and a photoresist composition including the same. The photosensitive molecular compound has a structure represented by a following formula. In Formula, R1 is hydrogen atom or methyl group (CH3); Ra and Rb each is independently alkyl group of 1-6 carbon atoms, alkylcarbonyl group of 2-7 carbon atoms, aryl group of 6-10 carbon atoms or arylcarbonyl group of 7-11 carbon atoms, and Ra and Rb form one group as an united body, alkyl or cycloalkyl group of 1-20 carbon atoms or arylalkyl group of 7-20 carbon atoms which are doubly bonded to nitrogen atom.

Abstract: Disclosed are an ultrasound system of measuring a number of ribs of a fetus and a method thereof. The ultrasound system of measuring the number of ribs of the fetus in three dimensions may include a setting unit that is used by a user, to set a portion where the number of ribs is measured in an ultrasound image, as a region of interest (ROI), a measuring unit to measure the number of ribs in the set ROI by using an auto rib extracting algorithm, and a display unit to display the measured number of ribs.

Abstract: The present invention discloses a polypeptide having a function for delaying anthesis or suppressing growth, a polynucleotide encoding the same, and a use thereof. Specifically, the present invention discloses a polypeptide having a function of delaying anthesis or suppressing growth, a polynucleotide encoding the same, a method for manufacturing plants with a phenotype of anthesis delay, a method for manufacturing plants with a phenotype of growth suppression, a selecting transgenic plants, and a method for screening materials which delay anthesis or suppress growth of plants.

Abstract: A polymer which has siloxane group at a main chain thereof and a composition including the same, for forming an organic anti-reflective coating layer are disclosed. The polymer for forming an organic anti-reflective coating layer is represented by following Formula. In Formula, R is hydrogen atom, C1˜C20 alkyl group, C1˜C10 alcohol group or epoxy group, R1 is independently hydrogen atom, n is an integer of 1-50, R2 is C1˜C20 alkyl group, C3˜C20 cycloalkyl group, C6˜C20 aryl group or C7˜C12 arylalkyl group, R3 is hydrogen atom, C1˜C10 alcohol group or epoxy group and POSS is a polyhedral oligosilsesquioxane.

Abstract: Embodiments for spatially compounding ultrasound images for removing seam artifact in an ultrasound system are disclosed. In one embodiment, the ultrasound system includes: an ultrasound data acquisition unit configured to transmit ultrasound beams to a target object, receive ultrasound echoes reflected from the target object and provide a plurality of ultrasound frame data sets for a plurality of frames, said plurality of ultrasound frame data being acquired at different steering angles of scan lines; and a processing unit configured to form a plurality of ultrasound images and form a plurality of mask images corresponding to the respective ultrasound images based on the plurality of ultrasound frame data sets for removing seam artifact and spatially compound the plurality of ultrasound image based on the plurality of mask images to form an ultrasound spatial compound image.

Abstract: Embodiments for providing an ultrasound spatial compound image are disclosed.

Abstract: Embodiments for forming an ultrasound spatial compound image by correcting refraction of ultrasound signals in an ultrasound system are disclosed herein. An ultrasound data acquisition unit forms a first set of ultrasound frame data and a second set of ultrasound frame data by using non-steered scan lines and steered scan lines, respectively. The processor, which is coupled to the ultrasound data acquisition unit, forms a plurality of sets of resampled ultrasound frame data based on the second set of ultrasound frame data, selects one particular set of ultrasound frame data from the group consisting of the second set of ultrasound frame data and the plurality of sets of resampled ultrasound frame data based on the first set of ultrasound frame data and spatially compounds the one particular set of ultrasound frame data and the first set of ultrasound frame data to form an ultrasound spatial compound image.

Abstract: An acid-amplifier having an acetal group and a photoresist composition including the same, are disclosed. The acid-amplifier produces an acid (second acid) during a post-exposure-bake (PEB), which is induced by an acid (first acid) generated from a photo-acid generator (PAG) at the exposure process so that a line edge roughness (LER) of the photoresist pattern and photoresist energy sensitivity are improved. The acid-amplifier has a structure of following Formula 1. in Formula 1, R is C4˜C20 mono-cyclic or multi-cyclic saturated hydrocarbon, R1 is C1˜C10 linear hydrocarbon, C1˜C10 perfluoro compound or C5˜C20 aromatic compound, Ra and Rb are independently hydrogen atom or C1˜C4 saturated hydrocarbon and A is independently oxygen atom (O) or sulfur atom (S).

Abstract: A polymer which has siloxane group at a main chain thereof and a composition including the same, for forming an organic anti-reflective coating layer are disclosed. The polymer for forming an organic anti-reflective coating layer is represented by following Formula. In Formula, R is hydrogen atom, C1˜C20 alkyl group, C1˜C10 alcohol group or epoxy group, R1 is independently hydrogen atom, n is an integer of 1-50, R2 is C1˜C20 alkyl group, C3˜C20 cycloalkyl group, C6˜C20 aryl group or C7˜C12 arylalkyl group, R3 is hydrogen atom, C1˜C10 alcohol group or epoxy group and POSS is a polyhedral oligosilsesquioxane.

Abstract: A method of providing a motion vector is disclosed. The method according to embodiments of the present disclosure comprises: acquiring ultrasound data corresponding to a region of interest within a brightness mode (B-mode) image of a target object; forming a color Doppler mode image of the target object based on the ultrasound data; forming a motion vector of the target object based on the ultrasound data and the color Doppler mode image; and setting the motion vector on the color Doppler mode image.

Abstract: A polymer which has siloxane group at a main chain thereof and a composition including the same, for forming an organic anti-reflective coating layer are disclosed. The polymer for forming an organic anti-reflective coating layer is represented by following Formula. In Formula, R is hydrogen atom, C1˜C20 alkyl group, C1˜C10 alcohol group or epoxy group, R1 is independently hydrogen atom, n is an integer of 1-50, R2 is C1˜C20 alkyl group, C3˜C20 cycloalkyl group, C6˜C20 aryl group or C7˜C12 arylalkyl group, R3 is hydrogen atom, C1˜C10 alcohol group or epoxy group and POSS is a polyhedral oligosilsesquioxane.

Abstract: Disclosed is a method for manufacturing fine patterns of semiconductor devices using a double exposure patterning process for manufacturing the second photoresist patterns by simply exposing without an exposure mask. The method comprises the steps of: forming a first photoresist pattern on a semiconductor substrate on which a layer to be etched is formed; coating a composition for a mirror interlayer on the first photoresist pattern to form a mirror interlayer; forming a photoresist layer on the resultant; and forming a second photoresist pattern which is made by a scattered reflection of the mirror-interlayer and positioned between the first photoresist patterns, by exposing the photoresist layer to a light having energy which is lower than a threshold energy (Eth) of the photoresist layer without an exposure mask, and then developing the same.

Abstract: Disclosed are a photo-sensitive compound and a photoresist composition containing the same, for forming ultra-fine photoresist patterns. The photo-sensitive compound is resented by following Formula 1, wherein x is an integer of 1 to 5, y is an integer of 2 to 6, R is a C2˜C20 hydrocarbon group. The photoresist composition comprises 1˜85 weight % of a photo-sensitive compound represented by following Formula 1, 1˜55 weight % of a compound which reacts with a hydroxyl group (—OH) of the compound represented by Formula 1 to combine with the photo-sensitive compound represented by Formula 1; 1˜15 weight % of a photo-acid generator; and 12˜97 weight % of an organic solvent.

Abstract: A monomer for forming an organic anti-reflective coating layer, a polymer thereof and a composition including the same are disclosed. In a photolithography process, the organic anti-reflective coating layer absorbs an exposed light between a layer to be etched and a photoresist layer, and prevents a photoresist pattern from collapsing due to a standing wave generated under the photoresist layer. The polymer for forming an organic anti-reflective coating layer includes a repeating unit represented by Formula wherein, R1 is a hydrogen atom, a methyl group or an ethyl group, R2 is a C1˜C20 alkylene group, a C3˜C20 cycloalkylene group or a C6˜C20 aromatic hydrocarbon group, POSS is a polyhedral-oligomeric-silsesquioxane, and m is an integer of 2 to 110.

Abstract: Disclosed are a photosensitive compound containing oxime group which is directly decomposed by exposure to light, which is a molecular resist whose size is smaller than conventional polymer for photoresist, and a photoresist composition including the same. The photosensitive molecular compound has a structure represented by a following formula. In Formula, R1 is hydrogen atom or methyl group (CH3); Ra and Rb each is independently alkyl group of 1-6 carbon atoms, alkylcarbonyl group of 2-7 carbon atoms, aryl group of 6-10 carbon atoms or arylcarbonyl group of 7-11 carbon atoms, and Ra and Rb form one group as an united body, alkyl or cycloalkyl group of 1-20 carbon atoms or arylalkyl group of 7-20 carbon atoms which are doubly bonded to nitrogen atom.

Abstract: In the formation of a fine pattern using a photolithography process, a dissolution promoter which can increase the difference of solubility between exposed region and unexposed region, and a photoresist composition including the same are disclosed. The dissolution promoter has the structure of the following formula (wherein, R is a hydrocarbon group of 1 to 40 carbon atoms, A is an alkyl group of 1 to 10 carbon atoms, p is 0 or 1, and q is an integer of 1 to 20). Moreover, the photoresist composition comprises 3 to 30 wt % (weight %) of the photosensitive compound; 1 to 30 weight parts of a dissolution promoter represented by the formula, with respect to 100 weight parts of the photosensitive compound; 0.05 to weight parts of a photo-acid generator with respect to 100 weight parts of the photosensitive compound; and a remaining organic solvent.

Abstract: An acid-amplifier having an acetal group and a photoresist composition including the same, are disclosed. The acid-amplifier produces an acid (second acid) during a post-exposure-bake (PEB), which is induced by an acid (first acid) generated from a photo-acid generator (PAG) at the exposure process so that a line edge roughness (LER) of the photoresist pattern and photoresist energy sensitivity are improved. The acid-amplifier has a structure of following Formula 1. in Formula 1, R is C4˜C20 mono-cyclic or multi-cyclic saturated hydrocarbon, R1 is C1˜C10 linear hydrocarbon, C1˜C10 perfluoro compound or C5˜C20 aromatic compound, Ra and Rb are independently hydrogen atom or C1˜C4 saturated hydrocarbon and A is independently oxygen atom (0) or sulfur atom (S).

Abstract: Disclosed are a photo-sensitive compound and a photoresist composition containing the same, for forming ultra-fine photoresist patterns. The photo-sensitive compound is resented by following Formula 1, wherein x is an integer of 1 to 5, y is an integer of 2 to 6, R is a C2˜C20 hydrocarbon group. The photoresist composition comprises 1˜85 weight % of a photo-sensitive compound represented by following Formula 1, 1˜55 weight % of a compound which reacts with a hydroxyl group (—OH) of the compound represented by Formula 1 to combine with the photo-sensitive compound represented by Formula 1; 1˜15 weight % of a photo-acid generator; and 12˜97 weight % of an organic solvent.